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The effect of composition on the bond structure and refractive index of silicon nitride deposited by HWCVD and PECVD

Thin solid films, 2009-04, Vol.517 (12), p.3499-3502

2009

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Influence of the high-temperature “firing” step on high-rate plasma deposited silicon nitride films used as bulk passivating antireflection coatings on silicon solar cells

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2003-09, Vol.21 (5), p.2123-2132

2003

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Electronic sputtering of thin SiO2 films by MeV heavy ions

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2003-04, Vol.203 (Complete), p.151-157

2003

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Electronic sputtering of silicon suboxide films by swift heavy ions

Physical review letters, 2005-06, Vol.94 (24), p.245504.1-245504.4, Article 245504

2005

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On-line characterisation of radiofrequency magnetron sputter deposition of SiOx using elastic recoil detection

Thin solid films, 2006-01, Vol.494 (1-2), p.13-17

2006

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Thickness determination of thin (∼20 nm) microcrystalline silicon layers

Solar energy materials and solar cells, 2005-05, Vol.87 (1), p.445-455

2005

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Characterization of the plasma in a radio-frequency magnetron sputtering system

Journal of applied physics, 2004-06, Vol.95 (12), p.7611-7618

2004

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Stress reduction in a-C:H coatings through the addition of nitrogen to the feed gas

Diamond and related materials, 2004-09, Vol.13 (9), p.1645-1657

2004

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Experimental characterization of the deposition of silicon suboxide films in a radiofrequency magnetron reactive sputtering system

Surface & coatings technology, 2004-11, Vol.188, p.399-403

2004

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Argon plasma modelling in a RF magnetron sputtering system

Surface & coatings technology, 2004-11, Vol.188, p.392-398

2004

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Deuterium retention in co-deposition with lithium in Magnum-PSI: experimental analysis and comparison with SOLPS-ITER

Nuclear fusion, 2024-07, Vol.64 (7), p.76019

2024

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Deuterium retention and removal in liquid lithium determined by in situ NRA in Magnum-PSI

Nuclear fusion, 2022-07, Vol.62 (7), p.76010

2022

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Reduction of Tin Oxide by Hydrogen Radicals

The journal of physical chemistry. B, 1998-08, Vol.102 (32), p.6219-6224

1998

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Study of the a-Si/a-SiO2 interface deposited by r.f. magnetron sputtering

Thin solid films, 2004-01, Vol.447-448 (Complete), p.306-310

2004

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Silicon nitride at high deposition rate by Hot Wire Chemical Vapor Deposition as passivating and antireflection layer on multicrystalline silicon solar cells

Thin solid films, 2006-04, Vol.501 (1), p.51-54

2006

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On the argon and oxygen incorporation into SiOx through ion implantation during reactive plasma magnetron sputter deposition

Applied surface science, 2008-12, Vol.255 (5), p.3079-3084

2008

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Shaping of Au nanoparticles embedded in various layered structures by swift heavy ion beam irradiation

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2016-10, Vol.384, p.86-92

2016

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Study of magnetic multilayers by RBS with nanometer resolution

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2001-07, Vol.183 (1), p.140-145

2001

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Unambiguous determination of Fourier-transform infrared spectroscopy proportionality factors: The case of silicon nitride

Physical review. B, Condensed matter and materials physics, 2006-05, Vol.73 (19), Article 195333

2006

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Improving the control of the electroless plating synthesis of Pd/Ag membranes for hydrogen separation using Rutherford backscattering

Journal of membrane science, 2005-06, Vol.254 (1), p.241-248

2005

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Deuteron implantation into hexagonal silicon carbide: defects and deuterium behaviour

European physical journal. Applied physics, 2003-07, Vol.23 (1), p.11-18

2003

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Comparison of SiOx structure in RF sputtered samples

Physica status solidi. C, 2004-08, Vol.1 (9), p.2286-2291

2004

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Nitrogen diffusion and nitride formation during and after implantation in Ni/Fe bilayers

Surface & coatings technology, 1996-09, Vol.83 (1), p.65-69

1996

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Structure of sputtered silicon suboxide single- and multi-layers

Thin solid films, 2002-12, Vol.420, p.382-385

2002

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Electrochemical Growth of Micrometer-Thick Oxide on SiC in Acidic Fluoride Solution

Chemistry of materials, 2009-07, Vol.21 (14), p.3297-3305

2009

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The effect of composition on the bond structure and refractive index of silicon nitride deposited by HWCVD and PECVD

Influence of the high-temperature “firing” step on high-rate plasma deposited silicon nitride films used as bulk passivating antireflection coatings on silicon solar cells

Electronic sputtering of thin SiO2 films by MeV heavy ions

Electronic sputtering of silicon suboxide films by swift heavy ions

On-line characterisation of radiofrequency magnetron sputter deposition of SiOx using elastic recoil detection

Thickness determination of thin (∼20 nm) microcrystalline silicon layers

Characterization of the plasma in a radio-frequency magnetron sputtering system

Stress reduction in a-C:H coatings through the addition of nitrogen to the feed gas

Experimental characterization of the deposition of silicon suboxide films in a radiofrequency magnetron reactive sputtering system

Argon plasma modelling in a RF magnetron sputtering system

Deuterium retention in co-deposition with lithium in Magnum-PSI: experimental analysis and comparison with SOLPS-ITER

Deuterium retention and removal in liquid lithium determined by in situ NRA in Magnum-PSI

Reduction of Tin Oxide by Hydrogen Radicals

Study of the a-Si/a-SiO2 interface deposited by r.f. magnetron sputtering

Silicon nitride at high deposition rate by Hot Wire Chemical Vapor Deposition as passivating and antireflection layer on multicrystalline silicon solar cells

On the argon and oxygen incorporation into SiOx through ion implantation during reactive plasma magnetron sputter deposition

Shaping of Au nanoparticles embedded in various layered structures by swift heavy ion beam irradiation

Study of magnetic multilayers by RBS with nanometer resolution

Unambiguous determination of Fourier-transform infrared spectroscopy proportionality factors: The case of silicon nitride

Improving the control of the electroless plating synthesis of Pd/Ag membranes for hydrogen separation using Rutherford backscattering

Deuteron implantation into hexagonal silicon carbide: defects and deuterium behaviour

Comparison of SiOx structure in RF sputtered samples

Nitrogen diffusion and nitride formation during and after implantation in Ni/Fe bilayers

Structure of sputtered silicon suboxide single- and multi-layers

Electrochemical Growth of Micrometer-Thick Oxide on SiC in Acidic Fluoride Solution

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