UB Paderborn / Katalog / Suche / in CDI

Real-time optical studies in the UV range of the annealing of zirconium-oxide thin films in vacuum

Journal of the Korean Physical Society, 2015, 66(1), , pp.128-132

2015

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Application of imaging ellipsometry to the detection of latent fingermarks

Forensic science international, 2015-08, Vol.253, p.28-32

An, Ilsin

2015

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Polarization errors associated with reflective objectives in a micro-spot spectroscopic ellipsometer

Japanese Journal of Applied Physics, 2019-05, Vol.58 (5), p.58003

2019

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Rotating-compensator multichannel ellipsometry: Applications for real time Stokes vector spectroscopy of thin film growth

Review of scientific instruments, 1998-04, Vol.69 (4), p.1800-1810

1998

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Multichannel mueller matrix ellipsometry for simultaneous real-time measurement of bulk isotropic and surface anisotropic complex dielectric functions of semiconductors

Physical review letters, 2003-05, Vol.90 (21), p.217402-217402, Article 217402

2003

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Comparison imaging ellipsometry and its application to crystallization of indium oxide thin films

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2019-11, Vol.37 (6)

2019

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Comparison null imaging ellipsometry using polarization rotator

Japanese Journal of Applied Physics, 2018-05, Vol.57 (5), p.52501

2018

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Regulation of Interfacial Anchoring Orientation of Anisotropic Nanodumbbells

ACS macro letters, 2023-10, Vol.12 (10), p.1298-1305

2023

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Conduction mechanism of leakage current due to the traps in ZrO2 thin film

Semiconductor science and technology, 2009-11, Vol.24 (11), p.115016-115016 (5)

2009

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Calibration and data reduction for a UV-extended rotating-compensator multichannel ellipsometer

Thin solid films, 2004-05, Vol.455, p.132-137

2004

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Impact of the Parameters for a Chemically-amplified Resist on theLine-edge-roughness by Using a Molecular-scale LithographySimulation

Journal of the Korean Physical Society, 2009-08, Vol.55 (2), p.675-680

2009

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Modeling of the Cross-linking and the Diffusion Processes in aNegative Chemically Amplified Resist

Journal of the Korean Physical Society, 2009-08, Vol.55 (2), p.661-665

2009

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Impact of Polarization Inside a Resist for ArF Immersion Lithography

Journal of the Korean Physical Society, 2009, 54(4), , pp.1685-1691

2009

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Photoinduced Patterning of Gold Thin Film

Japanese Journal of Applied Physics, 2004-08, Vol.43 (8B), p.L1078

2004

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Single Anti-Reflection Coating Optimization with Different Polarizations for Hyper Numerical Aperture Immersion Lithography

Japanese Journal of Applied Physics, 2006-12, Vol.45 (12R), p.9280

2006

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Rubbed Polyimide Layers Studied by Rotating Sample and Compensator Spectroscopic Ellipsometry

Japanese Journal of Applied Physics, 2005-10, Vol.44 (10R), p.7667

2005

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Chromeless Phase Lithography Using Scattering Bars and Zebra Patterns

Japanese Journal of Applied Physics, 2006-11, Vol.45 (11R), p.8967

2006

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Monitoring photodeposition of polymer films from diacetylene monomer solutions using in situ real-time spectroscopic ellipsometry

Thin solid films, 2003-08, Vol.437 (1), p.127-134

2003

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A Single Zone Azimuth Calibration for Rotating Compensator Multichannel Ellipsometry

Japanese Journal of Applied Physics, 2003, Vol.42 (Part 1, No. 5A), p.2872-2875

2003

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Characterization of Free-Standing Nano-Membranes by Using Ellipsometry

Journal of the Korean Physical Society, 2018, 72(8), , pp.868-872

2018

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Rotating-compensator multichannel ellipsometry for characterization of the evolution of nonuniformities in diamond thin-film growth

Applied physics letters, 1998-02, Vol.72 (8), p.900-902

1998

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Resist Pattern Collapse with Top Rounding Resist Profile

Japanese Journal of Applied Physics, 2003-06, Vol.42 (Part 1, No. 6B), p.3922-3927

2003

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The Extraction of Develop Parameters by Using Cross-Sectional Critical Shape Error Method

Japanese Journal of Applied Physics, 2004-06, Vol.43 (6S), p.3692

2004

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Conduction mechanism of leakage current due to the traps in ZrO 2 thin film

Semiconductor science and technology, 2009-11, Vol.24 (11), p.115016

2009

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Simultaneous real‐time spectroscopic ellipsometry and reflectance for monitoring thin‐film preparation

Review of scientific instruments, 1994-11, Vol.65 (11), p.3489-3500

1994

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Real-time optical studies in the UV range of the annealing of zirconium-oxide thin films in vacuum

Application of imaging ellipsometry to the detection of latent fingermarks

Polarization errors associated with reflective objectives in a micro-spot spectroscopic ellipsometer

Rotating-compensator multichannel ellipsometry: Applications for real time Stokes vector spectroscopy of thin film growth

Multichannel mueller matrix ellipsometry for simultaneous real-time measurement of bulk isotropic and surface anisotropic complex dielectric functions of semiconductors

Comparison imaging ellipsometry and its application to crystallization of indium oxide thin films

Comparison null imaging ellipsometry using polarization rotator

Regulation of Interfacial Anchoring Orientation of Anisotropic Nanodumbbells

Conduction mechanism of leakage current due to the traps in ZrO2 thin film

Calibration and data reduction for a UV-extended rotating-compensator multichannel ellipsometer

Impact of the Parameters for a Chemically-amplified Resist on theLine-edge-roughness by Using a Molecular-scale LithographySimulation

Modeling of the Cross-linking and the Diffusion Processes in aNegative Chemically Amplified Resist

Impact of Polarization Inside a Resist for ArF Immersion Lithography

Photoinduced Patterning of Gold Thin Film

Single Anti-Reflection Coating Optimization with Different Polarizations for Hyper Numerical Aperture Immersion Lithography

Rubbed Polyimide Layers Studied by Rotating Sample and Compensator Spectroscopic Ellipsometry

Chromeless Phase Lithography Using Scattering Bars and Zebra Patterns

Monitoring photodeposition of polymer films from diacetylene monomer solutions using in situ real-time spectroscopic ellipsometry

A Single Zone Azimuth Calibration for Rotating Compensator Multichannel Ellipsometry

Characterization of Free-Standing Nano-Membranes by Using Ellipsometry

Rotating-compensator multichannel ellipsometry for characterization of the evolution of nonuniformities in diamond thin-film growth

Resist Pattern Collapse with Top Rounding Resist Profile

The Extraction of Develop Parameters by Using Cross-Sectional Critical Shape Error Method

Conduction mechanism of leakage current due to the traps in ZrO 2 thin film

Simultaneous real‐time spectroscopic ellipsometry and reflectance for monitoring thin‐film preparation

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