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Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism

Applied surface science, 2001-03, Vol.172 (1-2), p.148-158

2001

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Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films

Thin solid films, 1999-02, Vol.340 (1-2), p.110-116

1999

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Gas sensing properties of epitaxial SnO2 thin films prepared by atomic layer deposition

Sensors and actuators. B, Chemical, 2003-08, Vol.93 (1-3), p.552-555

2003

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Influence of single and double deposition temperatures on the interface quality of atomic layer deposited Al2O3 dielectric thin films on silicon

Journal of applied physics, 2006-03, Vol.99 (5)

2006

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Transmission electron microscopy studies of HfO2 thin films grown by chloride-based atomic layer deposition

Applied surface science, 2006-11, Vol.253 (2), p.606-617

2006

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Transmission electron microscopy studies of HfO 2 thin films grown by chloride-based atomic layer deposition

Applied surface science, 2006-11, Vol.253 (2), p.606-617

2006

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Atomic layer deposition of polycrystalline HfO2 films by the HfI4-O2 precursor combination

Thin solid films, 2003-03, Vol.427 (1-2), p.147-151

2003

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High-permittivity metal-insulator-metal capacitors with TiO2 rutile dielectric and RuO2 bottom electrode

IOP conference series. Materials Science and Engineering, 2010-01, Vol.8 (1), p.012024-012024

2010

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Ti 2p and O 1s X-ray absorption of TiO2 polymorphs

Solid state communications, 1997-10, Vol.104 (4), p.199-203

1997

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The electrical-interface quality of as-grown atomic-layer-deposited disordered HfO2 on p- and n-type silicon

Semiconductor science and technology, 2004-09, Vol.19 (9), p.1141-1148

2004

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THEY ONLY TEACH US WORD AND EXCEL

Trames (Tallinn), 2020-03, Vol.24 (1), p.53-69

2020

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New routes to SnO2 heteroepitaxy

Vacuum, 2002-09, Vol.67 (3-4), p.571-575

2002

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Atomic Layer Deposition of Tantalum Oxide Thin Films from Iodide Precursor

Chemistry of materials, 2001-01, Vol.13 (1), p.122-128

2001

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Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

Applied surface science, 2000-07, Vol.161 (3), p.385-395

2000

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Composition and thickness determination of thin oxide films : comparison of different programs and methods

Journal of analytical atomic spectrometry, 1999, Vol.14 (3), p.523-527

1999

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Anomalous effect of temperature on atomic layer deposition of titanium dioxide

Journal of crystal growth, 2000-12, Vol.220 (4), p.531-537

2000

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Atomic layer deposition of high capacitance density Ta2O5-ZrO2 based dielectrics for metal-insulator-metal structures

Microelectronic engineering, 2010-02, Vol.87 (2), p.144-149

2010

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Effect of crystal structure on optical properties of TiO2 films grown by atomic layer deposition

Thin solid films, 1997-08, Vol.305 (1-2), p.270-273

1997

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Texture development in nanocrystalline hafnium dioxide thin films grown by atomic layer deposition

Journal of crystal growth, 2000-11, Vol.220 (1), p.105-113

2000

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Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films

Journal of applied physics, 2004-11, Vol.96 (9), p.5298-5307

2004

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Nanostructured solar cell by spray pyrolysis: Effect of titania barrier layer on the cell performance

Thin solid films, 2009-02, Vol.517 (7), p.2443-2447

2009

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Growth kinetics and structure formation of ZrO2 thin films in chloride-based atomic layer deposition process

Thin solid films, 2002-04, Vol.408 (1-2), p.97-103

2002

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Morphology and structure of TiO2 thin films grown by atomic layer deposition

Journal of crystal growth, 1995-03, Vol.148 (3), p.268-275

1995

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Atomic layer growth of epitaxial TiO2 thin films from TiCl4 and H2O on α-Al2O3 substrates

Journal of crystal growth, 2002-07, Vol.242 (1-2), p.189-198

2002

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Atomic layer deposition of TiO2 thin films from TiI4 and H2O

Applied surface science, 2002-06, Vol.193 (1-4), p.277-286

2002

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Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism

Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films

Gas sensing properties of epitaxial SnO2 thin films prepared by atomic layer deposition

Influence of single and double deposition temperatures on the interface quality of atomic layer deposited Al2O3 dielectric thin films on silicon

Transmission electron microscopy studies of HfO2 thin films grown by chloride-based atomic layer deposition

Transmission electron microscopy studies of HfO 2 thin films grown by chloride-based atomic layer deposition

Atomic layer deposition of polycrystalline HfO2 films by the HfI4-O2 precursor combination

High-permittivity metal-insulator-metal capacitors with TiO2 rutile dielectric and RuO2 bottom electrode

Ti 2p and O 1s X-ray absorption of TiO2 polymorphs

The electrical-interface quality of as-grown atomic-layer-deposited disordered HfO2 on p- and n-type silicon

THEY ONLY TEACH US WORD AND EXCEL

New routes to SnO2 heteroepitaxy

Atomic Layer Deposition of Tantalum Oxide Thin Films from Iodide Precursor

Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

Composition and thickness determination of thin oxide films : comparison of different programs and methods

Anomalous effect of temperature on atomic layer deposition of titanium dioxide

Atomic layer deposition of high capacitance density Ta2O5-ZrO2 based dielectrics for metal-insulator-metal structures

Effect of crystal structure on optical properties of TiO2 films grown by atomic layer deposition

Texture development in nanocrystalline hafnium dioxide thin films grown by atomic layer deposition

Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films

Nanostructured solar cell by spray pyrolysis: Effect of titania barrier layer on the cell performance

Growth kinetics and structure formation of ZrO2 thin films in chloride-based atomic layer deposition process

Morphology and structure of TiO2 thin films grown by atomic layer deposition

Atomic layer growth of epitaxial TiO2 thin films from TiCl4 and H2O on α-Al2O3 substrates

Atomic layer deposition of TiO2 thin films from TiI4 and H2O

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