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Tuning high power impulse magnetron sputtering discharge and substrate bias conditions to reduce the intrinsic stress of TiN thin films

Thin solid films, 2019-10, Vol.688, p.137335, Article 137335

2019

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Structural and mechanical properties of NbN and Nb-Si-N films: Experiment and molecular dynamics simulations

Ceramics international, 2016-08, Vol.42 (10), p.11743-11756

2016

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Structure, electrical, and optical properties of reactively sputter-deposited Ta—Al—N thin films

Journal of applied physics, 2022-03, Vol.131 (10)

2022

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Epitaxial growth of Cu(001) thin films onto Si(001) using a single-step HiPIMS process

Scientific reports, 2017-05, Vol.7 (1), p.1655-10, Article 1655

2017

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Novel Class of Crystal/Glass Ultrafine Nanolaminates with Large and Tunable Mechanical Properties

ACS applied materials & interfaces, 2024-06, Vol.16 (27), p.35686-35696

2024

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Review Article: Stress in thin films and coatings: Current status, challenges, and prospects

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2018-03, Vol.36 (2)

2018

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Direct Observation of the Thickness-Induced Crystallization and Stress Build-Up during Sputter-Deposition of Nanoscale Silicide Films

ACS applied materials & interfaces, 2016-12, Vol.8 (50), p.34888-34895

2016

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Interfacial Silicide Formation and Stress Evolution during Sputter Deposition of Ultrathin Pd Layers on a‑Si

ACS applied materials & interfaces, 2019-10, Vol.11 (42), p.39315-39323

2019

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In Situ and Real-Time Nanoscale Monitoring of Ultra-Thin Metal Film Growth Using Optical and Electrical Diagnostic Tools

Nanomaterials (Basel, Switzerland), 2020-11, Vol.10 (11), p.2225

2020

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Texture and Stress Evolution in HfN Films Sputter-Deposited at Oblique Angles

Coatings (Basel), 2019-11, Vol.9 (11), p.712

2019

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On the origin of the metastable β-Ta phase stabilization in tantalum sputtered thin films

Acta materialia, 2017-03, Vol.126, p.481-493

2017

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Liveschaltung zum Dünnschichtwachstum

Vakuum in Forschung und Praxis : Zeitschrift für Vakuumtechnologie, Oberflèachen und Dünne Schichten, 2020-12, Vol.32 (6), p.26-31

2020

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Liveschaltung zum Dünnschichtwachstum: Ein Echtzeit‐Einblick in das Wechselspiel zwischen Struktur und Eigenspannung während der Sputterdeposition

Vakuum in Forschung und Praxis : Zeitschrift für Vakuumtechnologie, Oberflèachen und Dünne Schichten, 2020-12, Vol.32 (6), p.26-31

2020

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Nanocolumnar TiN thin film growth by oblique angle sputter-deposition: Experiments vs. simulations

Materials & Design, 2018-12, Vol.160, p.338-349

2018

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Large influence of vacancies on the elastic constants of cubic epitaxial tantalum nitride layers grown by reactive magnetron sputtering

Acta materialia, 2020-02, Vol.184, p.254-266

2020

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Effect of temperature on the growth of TiN thin films by oblique angle sputter-deposition: A three-dimensional atomistic computational study

Computational materials science, 2021-09, Vol.197, p.110662, Article 110662

2021

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ICMCTF 2023 - International Conference on Metallurgical Coatings and Thin Films - Preface

Thin solid films, 2024-08, p.140487, Article 140487

2024

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Study of columnar growth, texture development and wettability of reactively sputter-deposited TiN, ZrN and HfN thin films at glancing angle incidence

Surface & coatings technology, 2020-10, Vol.399, p.126130, Article 126130

2020

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Liveschaltung zum Dünnschichtwachstum

Vakuum in Forschung und Praxis : Zeitschrift für Vakuumtechnologie, Oberflèachen und Dünne Schichten, 2020-12, Vol.32 (6), p.26-31

2020

Volltextzugriff (PDF)

Liveschaltung zum Dünnschichtwachstum: Ein Echtzeit‐Einblick in das Wechselspiel zwischen Struktur und Eigenspannung während der Sputterdeposition

Vakuum in Forschung und Praxis : Zeitschrift für Vakuumtechnologie, Oberflèachen und Dünne Schichten, 2020-12, Vol.32 (6), p.26-31

2020

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Manipulation of thin metal film morphology on weakly interacting substrates via selective deployment of alloying species

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2022-05, Vol.40 (3)

2022

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Benefits of energetic ion bombardment for tailoring stress and microstructural evolution during growth of Cu thin films

Acta materialia, 2017-12, Vol.141, p.120-130

2017

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Preface

Surface & coatings technology, 2020, Vol.404

2020

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International conference on metallurgical coatings and thin films–ICMCTF 2022–Preface

Thin solid films, 2024-04, Vol.794, p.140308, Article 140308

2024

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A kinetic model for stress generation in thin films grown from energetic vapor fluxes

Journal of applied physics, 2016-04, Vol.119 (14)

2016

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Tuning high power impulse magnetron sputtering discharge and substrate bias conditions to reduce the intrinsic stress of TiN thin films

Structural and mechanical properties of NbN and Nb-Si-N films: Experiment and molecular dynamics simulations

Structure, electrical, and optical properties of reactively sputter-deposited Ta—Al—N thin films

Epitaxial growth of Cu(001) thin films onto Si(001) using a single-step HiPIMS process

Novel Class of Crystal/Glass Ultrafine Nanolaminates with Large and Tunable Mechanical Properties

Review Article: Stress in thin films and coatings: Current status, challenges, and prospects

Direct Observation of the Thickness-Induced Crystallization and Stress Build-Up during Sputter-Deposition of Nanoscale Silicide Films

Interfacial Silicide Formation and Stress Evolution during Sputter Deposition of Ultrathin Pd Layers on a‑Si

In Situ and Real-Time Nanoscale Monitoring of Ultra-Thin Metal Film Growth Using Optical and Electrical Diagnostic Tools

Texture and Stress Evolution in HfN Films Sputter-Deposited at Oblique Angles

On the origin of the metastable β-Ta phase stabilization in tantalum sputtered thin films

Liveschaltung zum Dünnschichtwachstum

Liveschaltung zum Dünnschichtwachstum: Ein Echtzeit‐Einblick in das Wechselspiel zwischen Struktur und Eigenspannung während der Sputterdeposition

Nanocolumnar TiN thin film growth by oblique angle sputter-deposition: Experiments vs. simulations

Large influence of vacancies on the elastic constants of cubic epitaxial tantalum nitride layers grown by reactive magnetron sputtering

Effect of temperature on the growth of TiN thin films by oblique angle sputter-deposition: A three-dimensional atomistic computational study

ICMCTF 2023 - International Conference on Metallurgical Coatings and Thin Films - Preface

Study of columnar growth, texture development and wettability of reactively sputter-deposited TiN, ZrN and HfN thin films at glancing angle incidence

Liveschaltung zum Dünnschichtwachstum

Liveschaltung zum Dünnschichtwachstum: Ein Echtzeit‐Einblick in das Wechselspiel zwischen Struktur und Eigenspannung während der Sputterdeposition

Manipulation of thin metal film morphology on weakly interacting substrates via selective deployment of alloying species

Benefits of energetic ion bombardment for tailoring stress and microstructural evolution during growth of Cu thin films

Preface

International conference on metallurgical coatings and thin films–ICMCTF 2022–Preface

A kinetic model for stress generation in thin films grown from energetic vapor fluxes

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