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Atomic layer deposition of epitaxial HfO2 thin films on r-cut sapphire

Journal of materials research, 2013-07, Vol.28 (13), p.1680-1686

2013

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Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

Applied surface science, 2000-07, Vol.161 (3), p.385-395

2000

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Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen

Thin solid films, 2012-01, Vol.520 (7), p.2756-2763

2012

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Anomalous effect of temperature on atomic layer deposition of titanium dioxide

Journal of crystal growth, 2000-12, Vol.220 (4), p.531-537

2000

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Atomic layer deposition of high capacitance density Ta2O5-ZrO2 based dielectrics for metal-insulator-metal structures

Microelectronic engineering, 2010-02, Vol.87 (2), p.144-149

2010

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Effect of crystal structure on optical properties of TiO2 films grown by atomic layer deposition

Thin solid films, 1997-08, Vol.305 (1-2), p.270-273

1997

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Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films

Journal of applied physics, 2004-11, Vol.96 (9), p.5298-5307

2004

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Structure and morphology of Ru films grown by atomic layer deposition from 1-ethyl-1’-methyl-ruthenocene

Journal of crystal growth, 2010-06, Vol.312 (12), p.2025-2032

2010

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Growth kinetics and structure formation of ZrO2 thin films in chloride-based atomic layer deposition process

Thin solid films, 2002-04, Vol.408 (1-2), p.97-103

2002

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Morphology and structure of TiO2 thin films grown by atomic layer deposition

Journal of crystal growth, 1995-03, Vol.148 (3), p.268-275

1995

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Atomic layer deposition of TiO2 thin films from TiI4 and H2O

Applied surface science, 2002-06, Vol.193 (1-4), p.277-286

2002

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Atomic layer deposition of HfO2 on graphene from HfCl4 and H2O

Central European journal of physics, 2011-04, Vol.9 (2), p.319-324

2011

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Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide

Journal of crystal growth, 2001-09, Vol.231 (1), p.262-272

2001

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Properties of tantalum oxide thin films grown by atomic layer deposition

Thin solid films, 1995-05, Vol.260 (2), p.135-142

1995

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Chemical resistance of thin film materials based on metal oxides grown by atomic layer deposition

Thin solid films, 2013-09, Vol.542, p.219-224

2013

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Effect of growth conditions on formation of TiO2-II thin films in atomic layer deposition process

Journal of crystal growth, 1997-11, Vol.181 (3), p.259-264

1997

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Control of thin film structure by reactant pressure in atomic layer deposition of TiO2

Journal of crystal growth, 1996-12, Vol.169 (3), p.496-502

1996

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Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen

Journal of the Electrochemical Society, 2011, Vol.158 (3), p.D158

2011

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Mechanisms of suboxide growth and etching in atomic layer deposition of tantalum oxide from TaCl5 and H2O

Applied surface science, 1996-12, Vol.103 (4), p.331-341

1996

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Atomic layer deposition of epitaxial HfO 2 thin films on r -cut sapphire

Journal of materials research, 2013-07, Vol.28 (13), p.1680-1686

2013

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Atomic layer deposition of epitaxial HfO sub(2) thin films on r-cut sapphire

Journal of materials research, 2013-07, Vol.28 (13), p.1680-1686

2013

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Conformity and structure of titanium oxide films grown by atomic layer deposition on silicon substrates

Thin solid films, 2008-06, Vol.516 (15), p.4855-4862

2008

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Atomic layer deposition of ferromagnetic iron oxide films on three-dimensional substrates with tin oxide nanoparticles

Journal of crystal growth, 2012-03, Vol.343 (1), p.21-27

2012

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Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)3 and H2O

Thin solid films, 2014-08, Vol.565, p.37-44

2014

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Texture development in nanocrystalline hafnium dioxide thin films grown by atomic layer deposition

Journal of crystal growth, 2000-11, Vol.220 (1), p.105-113

2000

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Atomic layer deposition of epitaxial HfO2 thin films on r-cut sapphire

Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen

Anomalous effect of temperature on atomic layer deposition of titanium dioxide

Atomic layer deposition of high capacitance density Ta2O5-ZrO2 based dielectrics for metal-insulator-metal structures

Effect of crystal structure on optical properties of TiO2 films grown by atomic layer deposition

Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films

Structure and morphology of Ru films grown by atomic layer deposition from 1-ethyl-1’-methyl-ruthenocene

Growth kinetics and structure formation of ZrO2 thin films in chloride-based atomic layer deposition process

Morphology and structure of TiO2 thin films grown by atomic layer deposition

Atomic layer deposition of TiO2 thin films from TiI4 and H2O

Atomic layer deposition of HfO2 on graphene from HfCl4 and H2O

Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide

Properties of tantalum oxide thin films grown by atomic layer deposition

Chemical resistance of thin film materials based on metal oxides grown by atomic layer deposition

Effect of growth conditions on formation of TiO2-II thin films in atomic layer deposition process

Control of thin film structure by reactant pressure in atomic layer deposition of TiO2

Atomic Layer Deposition of Ruthenium Films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and Oxygen

Mechanisms of suboxide growth and etching in atomic layer deposition of tantalum oxide from TaCl5 and H2O

Atomic layer deposition of epitaxial HfO 2 thin films on r -cut sapphire

Atomic layer deposition of epitaxial HfO sub(2) thin films on r-cut sapphire

Conformity and structure of titanium oxide films grown by atomic layer deposition on silicon substrates

Atomic layer deposition of ferromagnetic iron oxide films on three-dimensional substrates with tin oxide nanoparticles

Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)3 and H2O

Texture development in nanocrystalline hafnium dioxide thin films grown by atomic layer deposition

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