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Effects of water flow on growth and energetics of the scleractinian coral Agaricia tenuifolia in Belize

Coral reefs, 2003-04, Vol.22 (1), p.35-47

2003

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Effects of post-deposition annealing in O2 on the electrical characteristics of LaAlO3 films on Si

Applied physics letters, 2005-07, Vol.87 (2)

2005

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Structural and electrical properties of the interfacial layer in sputter deposited LaAlO3/Si thin films

Thin solid films, 2007-07, Vol.515 (20-21), p.7782-7789

2007

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Investigation of lanthanum and hafnium-based dielectric films by X-ray reflectivity, spectroscopic ellipsometry and X-ray photoelectron spectroscopy

Thin solid films, 2008-09, Vol.516 (22), p.7974-7978

2008

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TaSiN diffusion barriers deposited by reactive magnetron sputtering

Thin solid films, 2006-08, Vol.513 (1), p.118-124

2006

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Effects of sputter deposition parameters and post-deposition annealing on the electrical characteristics of LaAlO3 dielectric films on Si

Applied physics. A, Materials science & processing, 2006-05, Vol.83 (2), p.289-293

2006

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Spatial and temporal effects of pre-seeding plates with invasive ascidians: Growth, recruitment and community composition

Journal of experimental marine biology and ecology, 2007-03, Vol.342 (1), p.30-39

Agius, Brad P.

2007

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New type of plasma reactor for thin film deposition: magnetron plasma process assisted by microwaves to ionise sputtered vapour

Surface & coatings technology, 2004-02, Vol.179 (2), p.176-181

2004

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Oxygen transport during annealing of Pb(Zr,Ti)O 3 thin films in O 2 gas and its effect on their conductivity

Journal of materials research, 2001-10, Vol.16 (10), p.3005-3008

2001

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Oxygen transport during annealing of Pb(Zr,Ti)O3 thin films in O2 gas and its effect on their conductivity

Journal of materials research, 2001-10, Vol.16 (10), p.3005-3008

2001

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Electrical properties of metal–insulator–semiconductor structures with silicon nitride dielectrics deposited by low temperature plasma enhanced chemical vapor deposition distributed electron cyclotron resonance

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1997-11, Vol.15 (6), p.3143-3153

1997

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Low temperature deposition of silicon nitride films by distributed electron cyclotron resonance plasma-enhanced chemical vapor deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1995-11, Vol.13 (6), p.2900-2907

1995

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EFFECTS OF NITROGEN INCORPORATION IN LANTHANUM-BASED DIELECTRIC FILMS

Integrated ferroelectrics, 2008-01, Vol.97 (1), p.129-142

2008

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Narrow resonance profiling study of the oxidation of reactively sputtered Ti1−xAlxN thin films

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2000-03, Vol.161-163, p.578-583

2000

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Langmuir probe analysis of distributed electron cyclotron resonance silicon nitride deposition plasma

Applied physics letters, 1998-03, Vol.72 (12), p.1448-1450

1998

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Growth and characterization of radio-frequency magnetron sputtered lead zirconate titanate thin films deposited on 〈111〉 Pt electrodes

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 1998-09, Vol.16 (5), p.2876-2884

1998

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Plasma enhanced chemical vapour deposition of silica thin films in an integrated distributed electron cyclotron resonance reactor

Thin solid films, 1997-10, Vol.308, p.63-67

1997

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Low Temperature Deposition of SiO2 by Distributed Electron Cyclotron Resonance Plasma‐Enhanced Chemical Vapor Deposition

Journal of the Electrochemical Society, 1992-05, Vol.139 (5), p.1489-1495

1992

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Electrochromism in anodic WO3 films. I: Preparation and physicochemical properties of films in the virgin and coloured states

Thin solid films, 1988-07, Vol.161 (1-2), p.35-46

1988

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Electrical characteristics and interface structure of HfAlO∕SiON∕Si(001) stacks

Applied physics letters, 2007-03, Vol.90 (12)

2007

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Electrical properties of distributed electron cyclotron resonance plasma-deposited SiO2-InP diodes

Applied physics letters, 1991-08, Vol.59 (7), p.837-839

1991

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Structural and electrical properties of the interfacial layer in sputter deposited LaAlO 3/Si thin films

Thin solid films, 2007, Vol.515 (20), p.7782-7789

2007

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Oxidation resistance of TaSiN diffusion barriers

Integrated ferroelectrics, 2000-11, Vol.31 (1-4), p.315-322

2000

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Highly stable sputtered NiInW refractory ohmic contact to n -type GaAs

Journal of applied physics, 1992-10, Vol.72 (8), p.3570-3577

1992

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Pt electrode investigation and electrical properties of RF magnetron sputtered Pb(Zr,Ti)O3

Microelectronic engineering, 1995-12, Vol.29 (1-4), p.231-234

1995

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Effects of water flow on growth and energetics of the scleractinian coral Agaricia tenuifolia in Belize

Effects of post-deposition annealing in O2 on the electrical characteristics of LaAlO3 films on Si

Structural and electrical properties of the interfacial layer in sputter deposited LaAlO3/Si thin films

Investigation of lanthanum and hafnium-based dielectric films by X-ray reflectivity, spectroscopic ellipsometry and X-ray photoelectron spectroscopy

TaSiN diffusion barriers deposited by reactive magnetron sputtering

Effects of sputter deposition parameters and post-deposition annealing on the electrical characteristics of LaAlO3 dielectric films on Si

Spatial and temporal effects of pre-seeding plates with invasive ascidians: Growth, recruitment and community composition

New type of plasma reactor for thin film deposition: magnetron plasma process assisted by microwaves to ionise sputtered vapour

Oxygen transport during annealing of Pb(Zr,Ti)O 3 thin films in O 2 gas and its effect on their conductivity

Oxygen transport during annealing of Pb(Zr,Ti)O3 thin films in O2 gas and its effect on their conductivity

Electrical properties of metal–insulator–semiconductor structures with silicon nitride dielectrics deposited by low temperature plasma enhanced chemical vapor deposition distributed electron cyclotron resonance

Low temperature deposition of silicon nitride films by distributed electron cyclotron resonance plasma-enhanced chemical vapor deposition

EFFECTS OF NITROGEN INCORPORATION IN LANTHANUM-BASED DIELECTRIC FILMS

Narrow resonance profiling study of the oxidation of reactively sputtered Ti1−xAlxN thin films

Langmuir probe analysis of distributed electron cyclotron resonance silicon nitride deposition plasma

Growth and characterization of radio-frequency magnetron sputtered lead zirconate titanate thin films deposited on 〈111〉 Pt electrodes

Plasma enhanced chemical vapour deposition of silica thin films in an integrated distributed electron cyclotron resonance reactor

Low Temperature Deposition of SiO2 by Distributed Electron Cyclotron Resonance Plasma‐Enhanced Chemical Vapor Deposition

Electrochromism in anodic WO3 films. I: Preparation and physicochemical properties of films in the virgin and coloured states

Electrical characteristics and interface structure of HfAlO∕SiON∕Si(001) stacks

Electrical properties of distributed electron cyclotron resonance plasma-deposited SiO2-InP diodes

Structural and electrical properties of the interfacial layer in sputter deposited LaAlO 3/Si thin films

Oxidation resistance of TaSiN diffusion barriers

Highly stable sputtered NiInW refractory ohmic contact to n -type GaAs

Pt electrode investigation and electrical properties of RF magnetron sputtered Pb(Zr,Ti)O3

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