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Fabrication of a Bilayer Wire Grid Polarizer in the Near Infrared Wavelength Region by Using a UV Curing Nanoimprinting Method

Journal of the Korean Physical Society, 2012-11, p.1714-1719

2012

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Design of Binary Masks for Extreme Ultraviolet Lithography with Deep Ultraviolet Inspection by Using a Simple Method

Journal of the Korean Physical Society, 2012-04, p.1305-1309

2012

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Characterization of the Optical and Structural Properties for Low-EmissivityFilters with Ti, TiOx, and ITO Barrier Layers

Journal of the Korean Physical Society, 2005, 46(2), , pp.154-158

2005

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Helical SiO_2 Film for Indiscriminatively Circular Polarization Handedness Inversion

Journal of the Korean Physical Society, 2011, 58(41), , pp.915-919

2011

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Polarization Conversion of Anisotropic SiO_2 Columnar Thin Films Prepared by Using Oblique Angle Deposition

Journal of the Korean Physical Society, 2011, 58(42), , pp.1026-1030

2011

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Surface plasmon resonances at a [Ag/SiO2 helical thin-film] interface

Journal of the Korean Physical Society, 2012-04, p.1249-1252

2012

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Design of Hybrid Attenuated Phase-Shift Masks with Indium-Tin-Oxide Absorbers for Extreme Ultraviolet Lithography

Journal of the Korean Physical Society, 2008-09, p.1638-1641

2008

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Influence of Deposition Angle on the Properties of ZrO2 Thin Films Fabricated by Using Oblique Angle Deposition

Journal of the Korean Physical Society, 2010-04, p.1282-1286

2010

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Optical Anisotropy of TiO2 and MgF2 Thin Films Prepared by Glancing Angle Deposition

Journal of the Korean Physical Society, 2006, 49(5I), , pp.2136-2142

2006

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Determination of an Optimized Alq3 Layer Thickness in Organic Light-Emitting Diodes by Using Microcavity Effects

Journal of the Korean Physical Society, 2006, 48(6), , pp.1281-1285

2006

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Optical Anisotropy of Microstructure-Controlled TiO2 Films Fabricated by Glancing-Angle Deposition (GLAD)

Journal of the Korean Physical Society, 2006, 48(6), , pp.1199-1204

2006

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Helical SiO_2 Film for Indiscriminatively Circular Polarization Handedness Inversion

Journal of the Korean Physical Society, 2011-04, p.915-919

2011

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Resonant Wavelength Tuning of Localized Plasmons in Silver-aluminum Nanoparticles

Journal of the Korean Physical Society, 2013-12, p.2098-2101

2013

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Design of binary masks for extreme ultraviolet lithography with deep ultraviolet inspection by using a simple method

Journal of the Korean Physical Society, 2012, 60(8), , pp.1305-1309

2012

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Optical and Structural Properties of ZrO2 Thin Films Fabricated by Using Glancing Angle Deposition

Journal of the Korean Physical Society, 2008-11, p.2544-2548

2008

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Optical Humidity Sensor Using a Narrow Band-Pass Filter Prepared by Glancing Angle Deposition

Journal of the Korean Physical Society, 2008-11, p.2700-2704

2008

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Optical Properties of TiO2 Zigzag Films Prepared by Using Oblique Angle Deposition

Journal of the Korean Physical Society, 2010-04, p.1378-1381

2010

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Characterization of the Optical and Structural Properties for Low-EmissivityFilters with Ti, TiOx, and ITO Barrier Layers

Journal of the Korean Physical Society, 2005-02, p.154-158

2005

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Antireflection Coatings with Helical SiO2 Films Prepared by Using Glancing Angle Deposition

Journal of the Korean Physical Society, 2009-12, p.2634-2637

2009

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Fabrication of a bilayer wire grid polarizer in the near infrared wavelength region by using a UV curing nanoimprinting method

Journal of the Korean Physical Society, 2012, 61(10), , pp.1714-1719

2012

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Polarization Conversion of Anisotropic SiO_2 Columnar Thin Films Prepared by Using Oblique Angle Deposition

Journal of the Korean Physical Society, 2011-04, p.1026-1030

2011

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Optical and Structural Properties of ZnO Thin Films Fabricated by Using Oblique Angle Deposition

Journal of the Korean Physical Society, 2010-12, p.1657-1660

2010

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Surface plasmon resonances at a [Ag/SiO2 helical thin-film] interface

Journal of the Korean Physical Society, 2012, 60(8), , pp.1249-1252

2012

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Resonant wavelength tuning of localized plasmons in silver-aluminum nanoparticles

Journal of the Korean Physical Society, 2013, 63(11), , pp.2098-2101

2013

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Antireflection Coatings with Helical SiO2 Films Prepared by Using Glancing Angle Deposition

Journal of the Korean Physical Society, 2009, 55(6), , pp.2634-2637

2009

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Absorber Stack
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Fabrication of a Bilayer Wire Grid Polarizer in the Near Infrared Wavelength Region by Using a UV Curing Nanoimprinting Method

Design of Binary Masks for Extreme Ultraviolet Lithography with Deep Ultraviolet Inspection by Using a Simple Method

Characterization of the Optical and Structural Properties for Low-EmissivityFilters with Ti, TiOx, and ITO Barrier Layers

Helical SiO_2 Film for Indiscriminatively Circular Polarization Handedness Inversion

Polarization Conversion of Anisotropic SiO_2 Columnar Thin Films Prepared by Using Oblique Angle Deposition

Surface plasmon resonances at a [Ag/SiO2 helical thin-film] interface

Design of Hybrid Attenuated Phase-Shift Masks with Indium-Tin-Oxide Absorbers for Extreme Ultraviolet Lithography

Influence of Deposition Angle on the Properties of ZrO2 Thin Films Fabricated by Using Oblique Angle Deposition

Optical Anisotropy of TiO2 and MgF2 Thin Films Prepared by Glancing Angle Deposition

Determination of an Optimized Alq3 Layer Thickness in Organic Light-Emitting Diodes by Using Microcavity Effects

Optical Anisotropy of Microstructure-Controlled TiO2 Films Fabricated by Glancing-Angle Deposition (GLAD)

Helical SiO_2 Film for Indiscriminatively Circular Polarization Handedness Inversion

Resonant Wavelength Tuning of Localized Plasmons in Silver-aluminum Nanoparticles

Design of binary masks for extreme ultraviolet lithography with deep ultraviolet inspection by using a simple method

Optical and Structural Properties of ZrO2 Thin Films Fabricated by Using Glancing Angle Deposition

Optical Humidity Sensor Using a Narrow Band-Pass Filter Prepared by Glancing Angle Deposition

Optical Properties of TiO2 Zigzag Films Prepared by Using Oblique Angle Deposition

Characterization of the Optical and Structural Properties for Low-EmissivityFilters with Ti, TiOx, and ITO Barrier Layers

Antireflection Coatings with Helical SiO2 Films Prepared by Using Glancing Angle Deposition

Fabrication of a bilayer wire grid polarizer in the near infrared wavelength region by using a UV curing nanoimprinting method

Polarization Conversion of Anisotropic SiO_2 Columnar Thin Films Prepared by Using Oblique Angle Deposition

Optical and Structural Properties of ZnO Thin Films Fabricated by Using Oblique Angle Deposition

Surface plasmon resonances at a [Ag/SiO2 helical thin-film] interface

Resonant wavelength tuning of localized plasmons in silver-aluminum nanoparticles

Antireflection Coatings with Helical SiO2 Films Prepared by Using Glancing Angle Deposition

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