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Determining instantaneous removal rates in metal chemical mechanical planarization

Japanese Journal of Applied Physics, 2020-07, Vol.59 (SL), p.SL0803

2020

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Surface action mechanism and planarization effect of sarcosine as an auxiliary complexing agent in copper film chemical mechanical polishing

Applied surface science, 2020-11, Vol.529, p.147109, Article 147109

2020

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Dispersion stabilization of carbonyl iron particles and its applications in chemical mechanical planarization

Colloids and surfaces. A, Physicochemical and engineering aspects, 2024-02, Vol.683, p.133003, Article 133003

2024

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Effect of conditioner disc wear on frictional, thermal, kinetic and pad micro-textural attributes of interlayer dielectric and tungsten chemical mechanical planarization

Japanese Journal of Applied Physics, 2020-07, Vol.59 (SL), p.SLLA02

2020

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Coordination-driven reversible supramolecular assembly formation at biological pH: Trace-level detection of Hg2+ and I− ions in real life samples

Spectrochimica acta. Part A, Molecular and biomolecular spectroscopy, 2022-02, Vol.267, p.120447, Article 120447

Dey, Nilanjan

2022

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Chemical mechanical planarization for microelectronics applications

Materials science & engineering. R, Reports : a review journal, 2004-10, Vol.45 (3), p.89-220

2004

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Removal mechanism of sapphire substrates (0001, 112¯0 and 101¯0) in mechanical planarization machining

Ceramics international, 2017-12, Vol.43 (18), p.16178-16184

2017

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24% Single-Junction GaAs Solar Cell Grown Directly on Growth-Planarized Facets Using Hydride Vapor Phase Epitaxy

Advanced energy materials, 2023-12, Vol.14 (3)

2023

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Synergy between Twisted Conformation and Effective Intermolecular Interactions: Strategy for Efficient Mechanochromic Luminogens with High Contrast

Advanced materials (Weinheim), 2013-05, Vol.25 (20), p.2837-2843

2013

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Novel Strategy for Constructing High Efficiency OLED Emitters with Excited State Quinone‐Conformation Induced Planarization Process

Advanced optical materials, 2019-09, Vol.7 (18), p.n/a

2019

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One-step sorting of nearly single-chiral carbon nanotubes with (10,9) chirality of 1.3 nm diameter by backbone planarization of polydioctylfluorenes

Carbon (New York), 2024-02, Vol.219, p.118791, Article 118791

2024

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Chemical–Mechanically Planarized Cross-Type Josephson Junctions in Nb-Al-AlOx-Nb Technology

IEEE transactions on applied superconductivity, 2017-08, Vol.27 (5), p.1-4

2017

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プラナリゼーションCMPとその応用技術専門委員会　設立25周年を機にさらなる飛躍を目指して

精密工学会誌, 2020/10/05, Vol.86(10), pp.741-745

2020

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For Further Leap on the Occasion of 25th Anniversary

Journal of the Japan Society for Precision Engineering, 2020/10/05, Vol.86(10), pp.741-745

2020

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Cetyltrimethylammonium bromide reformed ceria nanocomposites of chemical mechanical planarization for silica wafers

Journal of the Taiwan Institute of Chemical Engineers, 2023-09, Vol.150, p.105079, Article 105079

2023

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Nanoscratching of copper surface by CeO2

Acta materialia, 2017-02, Vol.124, p.343-350

2017

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Rapid planarization of polycrystalline diamond by laser with response surface methodology

Optics and laser technology, 2025-01, Vol.180, p.111509, Article 111509

2025

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Selective acceleration of disfavored enolate addition reactions by anion-π interactions

Chemical science (Cambridge), 2015-11, Vol.6 (11), p.6219-6223

2015

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Run-to-Run Control of Chemical Mechanical Polishing Process Based on Deep Reinforcement Learning

IEEE transactions on semiconductor manufacturing, 2020-08, Vol.33 (3), p.454-465

2020

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Systematic root cause analysis of ceria-induced defects during chemical mechanical planarization and cleaning

Journal of manufacturing processes, 2024-10, Vol.127, p.27-34

2024

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Prediction of Material Removal Rate for Chemical Mechanical Planarization Using Decision Tree-Based Ensemble Learning

Journal of manufacturing science and engineering, 2019-03, Vol.141 (3)

2019

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Electrochemistry of copper post-CMP cleaning examined in combination with brush-scrubbing in a malonic acid solution

Journal of electroanalytical chemistry (Lausanne, Switzerland), 2024-01, Vol.953, p.118016, Article 118016

2024

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Vector-based 3D graphic statics: A framework for the design of spatial structures based on the relation between form and forces

International journal of solids and structures, 2019-08, Vol.167, p.58-70

2019

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A computational implementation of Vector-based 3D Graphic Statics (VGS) for interactive and real-time structural design

Computer aided design, 2024-06, Vol.171, p.103695, Article 103695

2024

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Copper-incorporated dendritic mesoporous silica nanospheres and enhanced chemical mechanical polishing (CMP) performance via Cu2+/H2O2 heterogeneous Fenton-like system

Applied surface science, 2022-11, Vol.601, p.154262, Article 154262

2022

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Determining instantaneous removal rates in metal chemical mechanical planarization

Surface action mechanism and planarization effect of sarcosine as an auxiliary complexing agent in copper film chemical mechanical polishing

Dispersion stabilization of carbonyl iron particles and its applications in chemical mechanical planarization

Effect of conditioner disc wear on frictional, thermal, kinetic and pad micro-textural attributes of interlayer dielectric and tungsten chemical mechanical planarization

Coordination-driven reversible supramolecular assembly formation at biological pH: Trace-level detection of Hg2+ and I− ions in real life samples

Chemical mechanical planarization for microelectronics applications

Removal mechanism of sapphire substrates (0001, 112¯0 and 101¯0) in mechanical planarization machining

24% Single-Junction GaAs Solar Cell Grown Directly on Growth-Planarized Facets Using Hydride Vapor Phase Epitaxy

Synergy between Twisted Conformation and Effective Intermolecular Interactions: Strategy for Efficient Mechanochromic Luminogens with High Contrast

Novel Strategy for Constructing High Efficiency OLED Emitters with Excited State Quinone‐Conformation Induced Planarization Process

One-step sorting of nearly single-chiral carbon nanotubes with (10,9) chirality of 1.3 nm diameter by backbone planarization of polydioctylfluorenes

Chemical–Mechanically Planarized Cross-Type Josephson Junctions in Nb-Al-AlOx-Nb Technology

プラナリゼーションCMPとその応用技術専門委員会　設立25周年を機にさらなる飛躍を目指して

For Further Leap on the Occasion of 25th Anniversary

Cetyltrimethylammonium bromide reformed ceria nanocomposites of chemical mechanical planarization for silica wafers

Nanoscratching of copper surface by CeO2

Rapid planarization of polycrystalline diamond by laser with response surface methodology

Selective acceleration of disfavored enolate addition reactions by anion-π interactions

Run-to-Run Control of Chemical Mechanical Polishing Process Based on Deep Reinforcement Learning

Systematic root cause analysis of ceria-induced defects during chemical mechanical planarization and cleaning

Prediction of Material Removal Rate for Chemical Mechanical Planarization Using Decision Tree-Based Ensemble Learning

Electrochemistry of copper post-CMP cleaning examined in combination with brush-scrubbing in a malonic acid solution

Vector-based 3D graphic statics: A framework for the design of spatial structures based on the relation between form and forces

A computational implementation of Vector-based 3D Graphic Statics (VGS) for interactive and real-time structural design

Copper-incorporated dendritic mesoporous silica nanospheres and enhanced chemical mechanical polishing (CMP) performance via Cu2+/H2O2 heterogeneous Fenton-like system

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