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Advanced Oxidation Processes in the Removal of Organics From Silicon Surfaces in IC Manufacturing: Theoretical Concepts

Ozone : science & engineering, 2003-10, Vol.25 (5), p.445-451

2003

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The effect of UF on the efficiency of O 3/H 2O 2 for the removal of organics from surface water

Desalination, 2010, Vol.260 (1), p.39-42

2010

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Determination of the Pd content in Pd-doped SnO2 films

Sensors and actuators. B, Chemical, 2000-06, Vol.65 (1-3), p.193-194

2000

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Effect of Additives on the Removal Efficiency of Photoresist by Ozone/DI-Water Processes: Experimental Study

Solid state phenomena, 2003-05, Vol.92, p.101-104

2003

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Evaluating the Activation Barriers for Transition Metal N2O Reactions

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2001-06, Vol.105 (22), p.5479-5485

2001

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Determination of Photoresist Degradation Products in O3/DI Processing

Ozone: science & engineering, 2002-01, Vol.24 (5), p.391-398

2002

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A Force Study in Brush Scrubbing

Solid state phenomena, 2005-04, Vol.103-104, p.279-282

2005

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VPD-DC-TXRF for Metallic Contamination Analysis of Ge Wafers

Solid state phenomena, 2005-04, Vol.103-104, p.213-216

2005

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A Wet chemical Method for the Determination of Thickness of SiO2 Layers below the Nanometer Level

Journal of the Electrochemical Society, 1999-05, Vol.146 (5), p.1873-1878

1999

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Determination of Photoresist Degradation Products in O 3 /DI Processing

Ozone: science & engineering, 2002-10, Vol.24 (5), p.391-398

2002

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Theoretical Study on the Group 2 Atoms + N2O Reactions

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2005-07, Vol.109 (27), p.6099-6103

2005

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Study of the carbonyl products of terpene/OH radical reactions: detection of the 2,4-DNPH derivatives by HPLC-MS

Analytical and bioanalytical chemistry, 2004-06, Vol.379 (3), p.484-494

2004

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Oxidation of Alkali-Metal Atoms with Nitrous Oxide: Molecular Mechanisms from First Principles Calculations

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2004-02, Vol.108 (7), p.1268-1274

2004

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The Ozone Solubility and its Decay in Aqueous Solutions: Crucial Issues in Ozonated Chemistries for Semiconductor Cleaning

Solid state phenomena, 2001-01, Vol.76-77, p.211-214

2001

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Saturation effects in TXRF on micro-droplet residue samples

Journal of analytical atomic spectrometry, 2004-01, Vol.19 (12), p.1517

2004

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Decomposition kinetics of erythromycin A in acidic aqueous solutions

International journal of pharmaceutics, 1989-10, Vol.55 (1), p.59-65

1989

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Materials Compatibility and Organic Build-Up during Ozone-Based Cleaning of Semiconductor Devices

Solid state phenomena, 2001-01, Vol.76-77, p.63-66

2001

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Generation of Iron Atoms in the Gas Phase by Microwave-Induced Plasma Afterglows

Chemphyschem, 2003-12, Vol.4 (12), p.1323-1327

2003

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Efficient combination of surface and bulk passivation schemes of high-efficiency multicrystalline silicon solar cells

Journal of applied physics, 1995-09, Vol.78 (5), p.3457-3461

1995

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HfO[sub 2] Atomic Layer Deposition Using HfCl[sub 4]∕H[sub 2]O: The First Reaction Cycle

Journal of the Electrochemical Society, 2008, Vol.155 (12), p.G269

2008

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Yields of the Plasma Oxidation of Silicon by Neutral Oxygen Atoms and Negative Oxygen Atom Ions

Journal of the Electrochemical Society, 1990-02, Vol.137 (2), p.628-631

1990

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Decomposition Mechanism of the Anions Generated by Atmospheric Pressure Chemical Ionization of Nitroanilines

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 2005-12, Vol.109 (48), p.10954-10960

2005

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Production of carbon dioxide in a fattening pig house under field conditions. II. Release from the manure

Atmospheric environment (1994), 1999-09, Vol.33 (22), p.3697-3703

1999

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HfO2 Atomic Layer Deposition Using HfCl4/H2O: The First Reaction Cycle

ECS transactions, 2008, Vol.16 (4), p.257-267

2008

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A new mechanism for the decomposition of erythromycin A in acidic aqueous solutions

International journal of pharmaceutics, 1989-10, Vol.55 (1), p.67-76

1989

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Advanced Oxidation Processes in the Removal of Organics From Silicon Surfaces in IC Manufacturing: Theoretical Concepts

The effect of UF on the efficiency of O 3/H 2O 2 for the removal of organics from surface water

Determination of the Pd content in Pd-doped SnO2 films

Effect of Additives on the Removal Efficiency of Photoresist by Ozone/DI-Water Processes: Experimental Study

Evaluating the Activation Barriers for Transition Metal N2O Reactions

Determination of Photoresist Degradation Products in O3/DI Processing

A Force Study in Brush Scrubbing

VPD-DC-TXRF for Metallic Contamination Analysis of Ge Wafers

A Wet chemical Method for the Determination of Thickness of SiO2 Layers below the Nanometer Level

Determination of Photoresist Degradation Products in O 3 /DI Processing

Theoretical Study on the Group 2 Atoms + N2O Reactions

Study of the carbonyl products of terpene/OH radical reactions: detection of the 2,4-DNPH derivatives by HPLC-MS

Oxidation of Alkali-Metal Atoms with Nitrous Oxide: Molecular Mechanisms from First Principles Calculations

The Ozone Solubility and its Decay in Aqueous Solutions: Crucial Issues in Ozonated Chemistries for Semiconductor Cleaning

Saturation effects in TXRF on micro-droplet residue samples

Decomposition kinetics of erythromycin A in acidic aqueous solutions

Materials Compatibility and Organic Build-Up during Ozone-Based Cleaning of Semiconductor Devices

Generation of Iron Atoms in the Gas Phase by Microwave-Induced Plasma Afterglows

Efficient combination of surface and bulk passivation schemes of high-efficiency multicrystalline silicon solar cells

HfO[sub 2] Atomic Layer Deposition Using HfCl[sub 4]∕H[sub 2]O: The First Reaction Cycle

Yields of the Plasma Oxidation of Silicon by Neutral Oxygen Atoms and Negative Oxygen Atom Ions

Decomposition Mechanism of the Anions Generated by Atmospheric Pressure Chemical Ionization of Nitroanilines

Production of carbon dioxide in a fattening pig house under field conditions. II. Release from the manure

HfO2 Atomic Layer Deposition Using HfCl4/H2O: The First Reaction Cycle

A new mechanism for the decomposition of erythromycin A in acidic aqueous solutions

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