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A revised model of silicon oxidation during the dissolution of silicon in HF/HNO 3 mixtures

Physical chemistry chemical physics : PCCP, 2019-10, Vol.21 (39), p.22002-22013

2019

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Lattice strain enhanced acidic etching on as cut sawn silicon wafer

Materials science in semiconductor processing, 2021-03, Vol.123, p.105575, Article 105575

2021

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Raman spectroscopic determination of the degree of dissociation of nitric acid in binary and ternary mixtures with HF and H2SiF6

Journal of Raman spectroscopy, 2020-02, Vol.51 (2), p.366-372

2020

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Chemical analysis of acidic silicon etch solutionsI. Titrimetric determination of HNO3, HF, and H2SiF6

Talanta (Oxford), 2007-09, Vol.73 (2), p.220-226

2007

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Raman spectroscopic determination of the degree of dissociation of nitric acid in binary and ternary mixtures with HF and H 2 SiF 6

Journal of Raman spectroscopy, 2020-02, Vol.51 (2), p.366-372

2020

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New insights into boron species in acidic digestion solutions of boron-doped silicon

Journal of analytical atomic spectrometry, 2021-11, Vol.36 (11), p.2492-25

2021

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Saw damage as an etch mask for the acidic texturization of multicrystalline silicon wafers

Materials science in semiconductor processing, 2018-02, Vol.74, p.238-248

2018

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Spectrometric analysis of process etching solutions of the photovoltaic industry—Determination of HNO3, HF, and H2SiF6 using high-resolution continuum source absorption spectrometry of diatomic molecules and atoms

Talanta (Oxford), 2012-05, Vol.94, p.335-341

2012

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Impact of the chemical form of different fluorine sources on the formation of AlF molecules in a C2H2/N2O flame

2016-04

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Sulfur incorporation in electroplated Cu(Ag) thin films

Mikrochimica acta (1966), 2006-11, Vol.156 (1-2), p.167-172

2006

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Glass–ceramic route of BSCCO superconductors – Fabrication of amorphous precursor

Physica. C, Superconductivity, 2007-09, Vol.460 (2), p.1331-1332

2007

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Impact of the chemical form of different fluorine sources on the formation of AlF molecules in a C 2 H 2 /N 2 O flame

Journal of analytical atomic spectrometry, 2016, Vol.31 (4), p.902-911

2016

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Segregation of organic impurities in thin electroplated Cu metallizations

Mikrochimica acta (1966), 2006-11, Vol.156 (1-2), p.159-162

2006

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Mass and Electron Balance for the Oxidation of Silicon during the Wet Chemical Etching in HF/HNO 3 Mixtures

Journal of physical chemistry. C, 2012-09, Vol.116 (38), p.20380-20388

2012

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Thermodynamic assessment of the copper catalyzed direct synthesis of methylchlorosilanes

Journal of organometallic chemistry, 2008-07, Vol.693 (15), p.2483-2493

2008

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HF/HNO3 Etching of the Saw Damage

Energy procedia, 2013, Vol.38, p.223-233

2013

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Chemical analysis of acidic silicon etch solutions II. Determination of HNO3, HF, and H2SiF6 by ion chromatography

Talanta (Oxford), 2007-06, Vol.72 (4), p.1540-1545

2007

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Determination of Fluorine by Molecular Absorption Spectrometry of AlF Using a High-Resolution Continuum Source Spectrometer and a C 2 H 2 /N 2 O Flame

Current analytical chemistry, 2014-07, Vol.10 (3), p.426-434

2014

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The Formation of AlF Molecules and Al Atoms in a C 2 H 2 /N 2 O Flame Studied by Absorption and Emission Spectrometry of Molecules and Atoms

Current analytical chemistry, 2014-07, Vol.10 (3), p.418-425

2014

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Chemical analysis of acidic silicon etch solutions

Talanta (Oxford), 2007, Vol.73 (2), p.220-226

2007

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Chemical analysis of acidic silicon etch solutions

Talanta (Oxford), 2007, Vol.72 (4), p.1540-1545

2007

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Chemical analysis of acidic silicon etch solutions. I. Titrimetric determination of HNO3, HF, and H2SiF6

Talanta (Oxford), 2007-09, Vol.73 (2), p.220-226

2007

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Titrimetric determination of silicon dissolved in concentrated HF–HNO 3-etching solutions

Talanta (Oxford), 2006-01, Vol.68 (3), p.581-585

2006

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Method for precisely analyzing the stoichiometry of Na(x)CoO2-type superconductor material

Analytical and bioanalytical chemistry, 2005-12, Vol.383 (7-8), p.1075-1081

2005

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NMR investigation of boron impurities in refined metallurgical grade silicon: NMR investigation of B impurities in refined metallurgical grade Si

Physica status solidi. A, Applications and materials science, 2015-09, Vol.212 (9), p.2031-2036

2015

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A revised model of silicon oxidation during the dissolution of silicon in HF/HNO 3 mixtures

Lattice strain enhanced acidic etching on as cut sawn silicon wafer

Raman spectroscopic determination of the degree of dissociation of nitric acid in binary and ternary mixtures with HF and H2SiF6

Chemical analysis of acidic silicon etch solutionsI. Titrimetric determination of HNO3, HF, and H2SiF6

Raman spectroscopic determination of the degree of dissociation of nitric acid in binary and ternary mixtures with HF and H 2 SiF 6

New insights into boron species in acidic digestion solutions of boron-doped silicon

Saw damage as an etch mask for the acidic texturization of multicrystalline silicon wafers

Spectrometric analysis of process etching solutions of the photovoltaic industry—Determination of HNO3, HF, and H2SiF6 using high-resolution continuum source absorption spectrometry of diatomic molecules and atoms

Impact of the chemical form of different fluorine sources on the formation of AlF molecules in a C2H2/N2O flame

Sulfur incorporation in electroplated Cu(Ag) thin films

Glass–ceramic route of BSCCO superconductors – Fabrication of amorphous precursor

Impact of the chemical form of different fluorine sources on the formation of AlF molecules in a C 2 H 2 /N 2 O flame

Segregation of organic impurities in thin electroplated Cu metallizations

Mass and Electron Balance for the Oxidation of Silicon during the Wet Chemical Etching in HF/HNO 3 Mixtures

Thermodynamic assessment of the copper catalyzed direct synthesis of methylchlorosilanes

HF/HNO3 Etching of the Saw Damage

Chemical analysis of acidic silicon etch solutions II. Determination of HNO3, HF, and H2SiF6 by ion chromatography

Determination of Fluorine by Molecular Absorption Spectrometry of AlF Using a High-Resolution Continuum Source Spectrometer and a C 2 H 2 /N 2 O Flame

The Formation of AlF Molecules and Al Atoms in a C 2 H 2 /N 2 O Flame Studied by Absorption and Emission Spectrometry of Molecules and Atoms

Chemical analysis of acidic silicon etch solutions

Chemical analysis of acidic silicon etch solutions

Chemical analysis of acidic silicon etch solutions. I. Titrimetric determination of HNO3, HF, and H2SiF6

Titrimetric determination of silicon dissolved in concentrated HF–HNO 3-etching solutions

Method for precisely analyzing the stoichiometry of Na(x)CoO2-type superconductor material

NMR investigation of boron impurities in refined metallurgical grade silicon: NMR investigation of B impurities in refined metallurgical grade Si

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