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Universal Equation for Argon Gas Cluster Sputtering Yields

Journal of physical chemistry. C, 2013-06, Vol.117 (24), p.12622-12632

Seah, M. P

2013

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SIMS of Delta Layers in Organic Materials: Amount of Substance, Secondary Ion Species, Matrix Effects, and Anomalous Structures in Argon Gas Cluster Depth Profiles

Journal of physical chemistry. C, 2016-11, Vol.120 (46), p.26328-26335

2016

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Measurement of the roughness of nano-scale surfaces, both unannealed and with limited anneal, by atomic force microscopy

Measurement science & technology, 2014-10, Vol.25 (10), p.105001-12

Seah, M P

2014

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SIMS of Organic Materials—Interface Location in Argon Gas Cluster Depth Profiles Using Negative Secondary Ions

Journal of the American Society for Mass Spectrometry, 2018-04, Vol.29 (4), p.774-785

2018

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Nanoscale roughness and bias in step height measurements by atomic force microscopy

Measurement science & technology, 2013-03, Vol.24 (3), p.35004-1-12

Seah, M P

2013

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Modelling of nanomechanical nanoindentation measurements using an AFM or nanoindenter for compliant layers on stiffer substrates

Nanotechnology, 2006-11, Vol.17 (21), p.5283-5292

2006

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TOF-SIMS: Accurate Mass Scale Calibration

Journal of the American Society for Mass Spectrometry, 2006-04, Vol.17 (4), p.514-523

2006

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Cluster Primary Ion Sputtering: Secondary Ion Intensities in Static SIMS of Organic Materials

Journal of physical chemistry. C, 2010-04, Vol.114 (12), p.5351-5359

2010

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Electron flood gun damage in the analysis of polymers and organics in time-of-flight SIMS

Applied surface science, 2002-02, Vol.187 (1-2), p.89-100

2002

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Topography and field effects in the quantitative analysis of conductive surfaces using ToF-SIMS

Applied surface science, 2008-12, Vol.255 (4), p.1560-1563

2008

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The matrix effect in secondary ion mass spectrometry

Applied surface science, 2018-05, Vol.439, p.605-611

2018

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An accurate semi-empirical equation for sputtering yields, II: for neon, argon and xenon ions

Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 2005-04, Vol.229 (3-4), p.348-358

Seah, M.P.

2005

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CCQM-K32 key comparison and P84 pilot study: Amount of silicon oxide as a thickness of SiO2 on Si

Metrologia, 2008-01, Vol.45, p.08013-08013

Seah, M P

2008

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Static SIMS: towards unfragmented mass spectra — the G-SIMS procedure

Applied surface science, 2000-07, Vol.161 (3), p.465-480

2000

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Ultrathin SiO2 on Si. I. Quantifying and removing carbonaceous contamination

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2003-03, Vol.21 (2), p.345-352

2003

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Energy dependence of the electron attenuation length in silicon dioxide

Measurement science & technology, 2011-11, Vol.22 (11), p.115602

2011

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Intercomparison of silicon dioxide thickness measurements made by multiple techniques: The route to accuracy

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2004-07, Vol.22 (4), p.1564-1571

Seah, M. P.

2004

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G-SIMS and SMILES: Simulated fragmentation pathways for identification of complex molecules, amino acids and peptides

Applied surface science, 2008-12, Vol.255 (4), p.852-855

2008

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G-SIMS-FPM: Molecular structure at surfaces—a combined positive and negative secondary ion study

Applied surface science, 2006-07, Vol.252 (19), p.6601-6604

2006

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Approaches to analyzing insulators with Auger electron spectroscopy: Update and overview

Journal of electron spectroscopy and related phenomena, 2010, Vol.176 (1), p.80-94

2010

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Organic molecule characterization—G-SIMS

Applied surface science, 2004-06, Vol.231, p.224-229

2004

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Quantitative XPS: I. Analysis of X-ray photoelectron intensities from elemental data in a digital photoelectron database

Journal of electron spectroscopy and related phenomena, 2001-10, Vol.120 (1), p.93-111

2001

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Comparison of the accuracies of two methods for the determination of the surface normal for x-ray photoelectron spectroscopy

Metrologia, 2007-06, Vol.44 (3), p.242-245

Seah, M P

2007

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Mass accuracy—TOF-SIMS

Applied surface science, 2006-07, Vol.252 (19), p.6591-6593

2006

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Ion detection efficiency in SIMS:: Dependencies on energy, mass and composition for microchannel plates used in mass spectrometry

International journal of mass spectrometry, 2000-10, Vol.202 (1), p.217-229

2000

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Universal Equation for Argon Gas Cluster Sputtering Yields

SIMS of Delta Layers in Organic Materials: Amount of Substance, Secondary Ion Species, Matrix Effects, and Anomalous Structures in Argon Gas Cluster Depth Profiles

Measurement of the roughness of nano-scale surfaces, both unannealed and with limited anneal, by atomic force microscopy

SIMS of Organic Materials—Interface Location in Argon Gas Cluster Depth Profiles Using Negative Secondary Ions

Nanoscale roughness and bias in step height measurements by atomic force microscopy

Modelling of nanomechanical nanoindentation measurements using an AFM or nanoindenter for compliant layers on stiffer substrates

TOF-SIMS: Accurate Mass Scale Calibration

Cluster Primary Ion Sputtering: Secondary Ion Intensities in Static SIMS of Organic Materials

Electron flood gun damage in the analysis of polymers and organics in time-of-flight SIMS

Topography and field effects in the quantitative analysis of conductive surfaces using ToF-SIMS

The matrix effect in secondary ion mass spectrometry

An accurate semi-empirical equation for sputtering yields, II: for neon, argon and xenon ions

CCQM-K32 key comparison and P84 pilot study: Amount of silicon oxide as a thickness of SiO2 on Si

Static SIMS: towards unfragmented mass spectra — the G-SIMS procedure

Ultrathin SiO2 on Si. I. Quantifying and removing carbonaceous contamination

Energy dependence of the electron attenuation length in silicon dioxide

Intercomparison of silicon dioxide thickness measurements made by multiple techniques: The route to accuracy

G-SIMS and SMILES: Simulated fragmentation pathways for identification of complex molecules, amino acids and peptides

G-SIMS-FPM: Molecular structure at surfaces—a combined positive and negative secondary ion study

Approaches to analyzing insulators with Auger electron spectroscopy: Update and overview

Organic molecule characterization—G-SIMS

Quantitative XPS: I. Analysis of X-ray photoelectron intensities from elemental data in a digital photoelectron database

Comparison of the accuracies of two methods for the determination of the surface normal for x-ray photoelectron spectroscopy

Mass accuracy—TOF-SIMS

Ion detection efficiency in SIMS:: Dependencies on energy, mass and composition for microchannel plates used in mass spectrometry

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