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Carbon nanotube growth mechanism switches from tip- to base-growth with decreasing catalyst particle size

Carbon (New York), 2008-08, Vol.46 (10), p.1331-1338

2008

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Target ion and neutral spread in high power impulse magnetron sputtering

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2023-01, Vol.41 (1)

2023

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Plasma investigations and deposition of Me-DLC (Me = Al, Ti or Nb) obtained by a magnetron sputtering-RFPECVD hybrid process

Surface & coatings technology, 2018-11, Vol.354, p.351-359

2018

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Kinetics of plasma species and their ionization in short-HiPIMS by particle modeling

Surface & coatings technology, 2014-09, Vol.255, p.52-61

2014

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Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields

Plasma sources science & technology, 2012-04, Vol.21 (2), p.25005-1-9

2012

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Self-consistent Monte Carlo model for ECRIS plasma simulation

Journal of physics. Conference series, 2022, Vol.2244 (1), p.12027

2022

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H- beam formation simulation in negative ion source for CERN's Linac4 accelerator

Journal of instrumentation, 2023-08, Vol.18 (8), p.C08001

2023

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Simulation of Beam Formation in the CERN Negative Ion Source for the Linac4 Accelerator

Journal of physics. Conference series, 2022, Vol.2244 (1), p.12042

2022

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Improving HiPIMS deposition rates by hybrid RF/HiPIMS co-sputtering, and its relevance for NbSi films

Surface & coatings technology, 2014-07, Vol.250, p.32-36

2014

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The role of oxygen in magnetron-sputtered Ta3N5 thin films for the photoelectrolysis of water

Surface & coatings technology, 2017-09, Vol.324, p.620-625

2017

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Beam Formation Studies on the CERN IS03b H Source

Journal of physics. Conference series, 2022, Vol.2244 (1), p.12036

2022

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Role of Electron–Ion Dissociative Recombination in CH4 Microwave Plasma on Basis of Simulations and Measurements of Electron Energy

Plasma chemistry and plasma processing, 2019-09, Vol.39 (5), p.1275-1289

2019

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Interface study between nanostructured tantalum nitride films and carbon nanotubes grown by chemical vapour deposition

Applied surface science, 2014-10, Vol.315, p.510-515

2014

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Microstructure and properties of the compound layer obtained by pulsed plasma nitriding in steel gears

Surface & coatings technology, 2009-02, Vol.203 (10), p.1457-1461

2009

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Experimental realization and numerical simulation of wavelength-modulated fibre optic sensor based on surface plasmon resonance

Sensors and actuators. B, Chemical, 2007-09, Vol.126 (1), p.198-203

2007

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The European contribution to the development of the ITER NB injector

Fusion engineering and design, 2011-10, Vol.86 (6), p.860-863

2011

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Nanostructured tantalum nitride films as buffer-layer for carbon nanotube growth

Thin solid films, 2011-04, Vol.519 (12), p.4097-4100

2011

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Single chamber PVD/PECVD process for in situ control of the catalyst activity on carbon nanotubes growth

Surface & coatings technology, 2005-10, Vol.200 (1-4), p.1101-1105

2005

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Recent Advances in Nanoparticles Enhanced Oil Recovery: Rheology, Interfacial Tension, Oil Recovery, and Wettability Alteration

Journal of nanomaterials, 2017-01, Vol.2017, p.1-15

2017

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Early stages of the carbon nanotube growth by low pressure CVD and PE-CVD

Diamond and related materials, 2009, Vol.18 (1), p.61-65

2009

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Effect of tantalum nitride supporting layer on growth and morphology of carbon nanotubes by thermal chemical vapor deposition

Diamond and related materials, 2011-07, Vol.20 (7), p.999-1004

2011

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Temperature effect on the nitrogen insertion in carbon nitride films deposited by ECR

Diamond and related materials, 2009-09, Vol.18 (9), p.1091-1097

2009

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Tantalum based coated substrates for controlling the diameter of carbon nanotubes

Carbon (New York), 2009-12, Vol.47 (15), p.3424-3426

2009

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Comparative study of the structure of a-CNx and a-CNx:H films using NEXAFS, XPS and FT-IR analysis

Thin solid films, 2005-06, Vol.482 (1-2), p.156-166

2005

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Comparative study of different process steps for the near-field optical probes manufacturing

Ultramicroscopy, 2007-10, Vol.107 (10), p.1042-1047

2007

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Carbon nanotube growth mechanism switches from tip- to base-growth with decreasing catalyst particle size

Target ion and neutral spread in high power impulse magnetron sputtering

Plasma investigations and deposition of Me-DLC (Me = Al, Ti or Nb) obtained by a magnetron sputtering-RFPECVD hybrid process

Kinetics of plasma species and their ionization in short-HiPIMS by particle modeling

Understanding deposition rate loss in high power impulse magnetron sputtering: I. Ionization-driven electric fields

Self-consistent Monte Carlo model for ECRIS plasma simulation

H- beam formation simulation in negative ion source for CERN's Linac4 accelerator

Simulation of Beam Formation in the CERN Negative Ion Source for the Linac4 Accelerator

Improving HiPIMS deposition rates by hybrid RF/HiPIMS co-sputtering, and its relevance for NbSi films

The role of oxygen in magnetron-sputtered Ta3N5 thin films for the photoelectrolysis of water

Beam Formation Studies on the CERN IS03b H Source

Role of Electron–Ion Dissociative Recombination in CH4 Microwave Plasma on Basis of Simulations and Measurements of Electron Energy

Interface study between nanostructured tantalum nitride films and carbon nanotubes grown by chemical vapour deposition

Microstructure and properties of the compound layer obtained by pulsed plasma nitriding in steel gears

Experimental realization and numerical simulation of wavelength-modulated fibre optic sensor based on surface plasmon resonance

The European contribution to the development of the ITER NB injector

Nanostructured tantalum nitride films as buffer-layer for carbon nanotube growth

Single chamber PVD/PECVD process for in situ control of the catalyst activity on carbon nanotubes growth

Recent Advances in Nanoparticles Enhanced Oil Recovery: Rheology, Interfacial Tension, Oil Recovery, and Wettability Alteration

Early stages of the carbon nanotube growth by low pressure CVD and PE-CVD

Effect of tantalum nitride supporting layer on growth and morphology of carbon nanotubes by thermal chemical vapor deposition

Temperature effect on the nitrogen insertion in carbon nitride films deposited by ECR

Tantalum based coated substrates for controlling the diameter of carbon nanotubes

Comparative study of the structure of a-CNx and a-CNx:H films using NEXAFS, XPS and FT-IR analysis

Comparative study of different process steps for the near-field optical probes manufacturing

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