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The role of two-stage phase formation for the solid-state runaway reaction in Al/Ni reactive multilayers

Applied physics letters, 2020-07, Vol.117 (1)

2020

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Ignition in ternary Ru/Al-based reactive multilayers—Effects of chemistry and stacking sequence

Journal of applied physics, 2018-11, Vol.124 (19)

2018

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Development of thin film cathodes for lithium-ion batteries in the material system Li–Mn–O by r.f. magnetron sputtering

Thin solid films, 2013-01, Vol.528, p.217-223

2013

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Ion bombardment-induced nanocrystallization of magnetron-sputtered chromium carbide thin films

Surface & coatings technology, 2011-07, Vol.205 (20), p.4844-4849

2011

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Stress reduction of cubic boron nitride films by oxygen addition

Thin solid films, 2008-12, Vol.517 (3), p.1151-1155

2008

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Wettability and protein adsorption on ultrananocrystalline diamond/amorphous carbon composite films

Diamond and related materials, 2009-05, Vol.18 (5), p.895-898

2009

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Interfaces and temperature stability of stepwise graded DLC films studied by nanoindentation and Raman spectroscopy

Surface & coatings technology, 2005-10, Vol.200 (1-4), p.1127-1131

2005

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On the origin of a third spectral component of C1s XPS-spectra for nc-TiC/a-C nanocomposite thin films

Surface & coatings technology, 2008-04, Vol.202 (15), p.3563-3570

2008

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Growth effects in carbon coatings deposited by magnetron sputtering

Surface & coatings technology, 2003-05, Vol.168 (2), p.169-178

2003

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Influence of argon gas pressure and target power on magnetron plasma parameters

Diamond and related materials, 2009-05, Vol.18 (5), p.995-998

2009

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Characterisation of the interface region in stepwise bias-graded layers of DLC films by a high-resolution depth profiling method

Thin solid films, 2005-06, Vol.482 (1), p.63-68

2005

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Microstructure of Al-containing magnetron sputtered TiB2 thin films

Thin solid films, 2019-10, Vol.688, p.137361, Article 137361

2019

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Microstructure and properties of low friction TiCC nanocomposite coatings deposited by magnetron sputtering

Surface & coatings technology, 2002-02, Vol.150 (2), p.218-226

2002

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Magnetron sputtering of hard Cr–Al–N–O thin films

Surface & coatings technology, 2008-12, Vol.203 (5), p.661-665

2008

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Constitution of thick oxygen-containing cubic boron nitride films

Surface & coatings technology, 2006-06, Vol.200 (22), p.6465-6468

2006

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Mechanical properties and performance of magnetron-sputtered graded diamond-like carbon films with and without metal additions

Diamond and related materials, 2002-03, Vol.11 (3-6), p.1139-1142

2002

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Nano-scale, multi-functional coatings in the material system B–C–N–H

Surface & coatings technology, 2005-10, Vol.200 (1-4), p.7-13

2005

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Graded layer design for stress-reduced and strongly adherent superhard amorphous carbon films

Surface & coatings technology, 1999-09, Vol.116-119, p.591-598

1999

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Correlation between plasma particle fluxes, microstructure and properties of titanium diboride thin films

Surface & coatings technology, 2003-09, Vol.174, p.959-963

2003

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Influence of low energy ion implantation on mechanical properties of magnetron sputtered metastable (Cr,Al)N thin films

Thin solid films, 2003-08, Vol.437 (1), p.164-169

2003

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Characterisation of silicon carbide and silicon nitride thin films and Si3N4/SiC multilayers

Diamond and related materials, 2002-03, Vol.11 (3-6), p.1248-1253

2002

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Epitaxially stabilized TiN/(Ti,Fe,Co)N multilayer thin films in (pseudo-)fcc crystal structure by sequential magnetron sputter deposition

Journal of physics. D, Applied physics, 2010-10, Vol.43 (39), p.395406-395406

2010

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Alloyed and hydrogenated diamond-like carbon thin films deposited by a new high performance microwave low pressure plasma source

Surface & coatings technology, 2003-09, Vol.174, p.708-712

2003

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Magnetron sputtered nanocrystalline metastable (V,Al)(C,N) hard coatings

Surface & coatings technology, 2011-11, Vol.206 (4), p.610-616

2011

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Magnetron sputtered nanocrystalline metastable (V,Al)(C,N) hard coatings: Special Issue on Carbon-Based Nanostructured Coatings and Composite Films

Surface & coatings technology, 2011, Vol.206 (4), p.610-616

2011

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The role of two-stage phase formation for the solid-state runaway reaction in Al/Ni reactive multilayers

Ignition in ternary Ru/Al-based reactive multilayers—Effects of chemistry and stacking sequence

Development of thin film cathodes for lithium-ion batteries in the material system Li–Mn–O by r.f. magnetron sputtering

Ion bombardment-induced nanocrystallization of magnetron-sputtered chromium carbide thin films

Stress reduction of cubic boron nitride films by oxygen addition

Wettability and protein adsorption on ultrananocrystalline diamond/amorphous carbon composite films

Interfaces and temperature stability of stepwise graded DLC films studied by nanoindentation and Raman spectroscopy

On the origin of a third spectral component of C1s XPS-spectra for nc-TiC/a-C nanocomposite thin films

Growth effects in carbon coatings deposited by magnetron sputtering

Influence of argon gas pressure and target power on magnetron plasma parameters

Characterisation of the interface region in stepwise bias-graded layers of DLC films by a high-resolution depth profiling method

Microstructure of Al-containing magnetron sputtered TiB2 thin films

Microstructure and properties of low friction TiCC nanocomposite coatings deposited by magnetron sputtering

Magnetron sputtering of hard Cr–Al–N–O thin films

Constitution of thick oxygen-containing cubic boron nitride films

Mechanical properties and performance of magnetron-sputtered graded diamond-like carbon films with and without metal additions

Nano-scale, multi-functional coatings in the material system B–C–N–H

Graded layer design for stress-reduced and strongly adherent superhard amorphous carbon films

Correlation between plasma particle fluxes, microstructure and properties of titanium diboride thin films

Influence of low energy ion implantation on mechanical properties of magnetron sputtered metastable (Cr,Al)N thin films

Characterisation of silicon carbide and silicon nitride thin films and Si3N4/SiC multilayers

Epitaxially stabilized TiN/(Ti,Fe,Co)N multilayer thin films in (pseudo-)fcc crystal structure by sequential magnetron sputter deposition

Alloyed and hydrogenated diamond-like carbon thin films deposited by a new high performance microwave low pressure plasma source

Magnetron sputtered nanocrystalline metastable (V,Al)(C,N) hard coatings

Magnetron sputtered nanocrystalline metastable (V,Al)(C,N) hard coatings: Special Issue on Carbon-Based Nanostructured Coatings and Composite Films

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