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Water‐Stable Chemical‐Protective Textiles via Euhedral Surface‐Oriented 2D Cu–TCPP Metal‐Organic Frameworks

Small (Weinheim an der Bergstrasse, Germany), 2019-03, Vol.15 (10), p.e1805133-n/a

2019

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Progress and future directions for atomic layer deposition and ALD-based chemistry

MRS bulletin, 2011-11, Vol.36 (11), p.865-871

2011

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Unexpectedly large remanent polarization of Hf0.5Zr0.5O2 metal–ferroelectric–metal capacitor fabricated without breaking vacuum

Applied physics letters, 2021-01, Vol.118 (1)

2021

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Density dependence of the room temperature thermal conductivity of atomic layer deposition-grown amorphous alumina (Al2O3)

Applied physics letters, 2014-06, Vol.104 (25)

2014

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Stabilizing Small Molecules on Metal Oxide Surfaces Using Atomic Layer Deposition

Nano letters, 2013-10, Vol.13 (10), p.4802-4809

2013

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Investigation of the Corrosion Behavior of Atomic Layer Deposited Al₂O₃/TiO₂ Nanolaminate Thin Films on Copper in 0.1 M NaCl

Materials, 2019-02, Vol.12 (4), p.672

2019

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An Advanced Dual‐Function MnO2‐Fabric Air Filter Combining Catalytic Oxidation of Formaldehyde and High‐Efficiency Fine Particulate Matter Removal

Advanced functional materials, 2020-10, Vol.30 (42), p.n/a

2020

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Temperature-dependent reaction between trimethylaluminum and poly(methyl methacrylate) during sequential vapor infiltration: experimental and ab initio analysis

Journal of materials chemistry. C, Materials for optical and electronic devices, , Vol.2 (44), p.9416-9424

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Thermal atomic layer etching of metallic tungsten via oxidation and etch reaction mechanism using O2 or O3 for oxidation and WCl6 as the chlorinating etchant

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2020-03, Vol.38 (2)

2020

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Understanding inherent substrate selectivity during atomic layer deposition: Effect of surface preparation, hydroxyl density, and metal oxide composition on nucleation mechanisms during tungsten ALD

The Journal of chemical physics, 2017-02, Vol.146 (5), p.052811-052811

2017

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Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition

Applied physics letters, 2022-08, Vol.121 (8)

2022

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Highly Breathable Chemically Protective MOF‐Fiber Catalysts

Advanced functional materials, 2022-02, Vol.32 (6), p.n/a

2022

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Many routes to ferroelectric HfO2: A review of current deposition methods

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2022-01, Vol.40 (1)

2022

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Atomic layer deposition on polymer fibers and fabrics for multifunctional and electronic textiles

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2016-01, Vol.34 (1)

2016

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Reduced fatigue and leakage of ferroelectric TiN/Hf0.5Zr0.5O2/TiN capacitors by thin alumina interlayers at the top or bottom interface

Nanotechnology, 2023-03, Vol.34 (12)

2023

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Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2012-01, Vol.30 (1), p.010802-010802-11

2012

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Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition

Journal of applied physics, 2023-06, Vol.133 (22)

2023

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The influence of crystallographic texture on structural and electrical properties in ferroelectric Hf0.5Zr0.5O2

Journal of applied physics, 2022-12, Vol.132 (24)

2022

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Atomic Layer Deposition of TiO2 on Mesoporous nanolTO: Conductive Core-Shell Photoanodes for Dye-Sensitized Solar Cells

Nano letters, 2014-06, Vol.14 (6), p.3255-3261

2014

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Effect of Al2O3 ALD coating and vapor infusion on the bulk mechanical response of elastic and viscoelastic polymers

Surface & coatings technology, 2015-01, Vol.261, p.411-417

2015

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Functional model for analysis of ALD nucleation and quantification of area-selective deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2019-03, Vol.37 (2)

Parsons, Gregory N.

2019

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Solution-Processed, Antimony-Doped Tin Oxide Colloid Films Enable High-Performance TiO2 Photoanodes for Water Splitting

Nano letters, 2013-04, Vol.13 (4), p.1481-1488

2013

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Ordered 3D Thin-Shell Nanolattice Materials with Near-Unity Refractive Indices

Advanced functional materials, 2015-11, Vol.25 (42), p.6644-6649

2015

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Atomic Layer Deposition on Electrospun Polymer Fibers as a Direct Route to Al2O3 Microtubes with Precise Wall Thickness Control

Nano letters, 2007-03, Vol.7 (3), p.719-722

2007

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Making inert polypropylene fibers chemically responsive by combining atomic layer deposition and vapor phase chemical grafting

Nanotechnology, 2011-04, Vol.22 (15), p.155601-155601

2011

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Water‐Stable Chemical‐Protective Textiles via Euhedral Surface‐Oriented 2D Cu–TCPP Metal‐Organic Frameworks

Progress and future directions for atomic layer deposition and ALD-based chemistry

Unexpectedly large remanent polarization of Hf0.5Zr0.5O2 metal–ferroelectric–metal capacitor fabricated without breaking vacuum

Density dependence of the room temperature thermal conductivity of atomic layer deposition-grown amorphous alumina (Al2O3)

Stabilizing Small Molecules on Metal Oxide Surfaces Using Atomic Layer Deposition

Investigation of the Corrosion Behavior of Atomic Layer Deposited Al₂O₃/TiO₂ Nanolaminate Thin Films on Copper in 0.1 M NaCl

An Advanced Dual‐Function MnO2‐Fabric Air Filter Combining Catalytic Oxidation of Formaldehyde and High‐Efficiency Fine Particulate Matter Removal

Temperature-dependent reaction between trimethylaluminum and poly(methyl methacrylate) during sequential vapor infiltration: experimental and ab initio analysis

Thermal atomic layer etching of metallic tungsten via oxidation and etch reaction mechanism using O2 or O3 for oxidation and WCl6 as the chlorinating etchant

Understanding inherent substrate selectivity during atomic layer deposition: Effect of surface preparation, hydroxyl density, and metal oxide composition on nucleation mechanisms during tungsten ALD

Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition

Highly Breathable Chemically Protective MOF‐Fiber Catalysts

Many routes to ferroelectric HfO2: A review of current deposition methods

Atomic layer deposition on polymer fibers and fabrics for multifunctional and electronic textiles

Reduced fatigue and leakage of ferroelectric TiN/Hf0.5Zr0.5O2/TiN capacitors by thin alumina interlayers at the top or bottom interface

Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition

Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition

The influence of crystallographic texture on structural and electrical properties in ferroelectric Hf0.5Zr0.5O2

Atomic Layer Deposition of TiO2 on Mesoporous nanolTO: Conductive Core-Shell Photoanodes for Dye-Sensitized Solar Cells

Effect of Al2O3 ALD coating and vapor infusion on the bulk mechanical response of elastic and viscoelastic polymers

Functional model for analysis of ALD nucleation and quantification of area-selective deposition

Solution-Processed, Antimony-Doped Tin Oxide Colloid Films Enable High-Performance TiO2 Photoanodes for Water Splitting

Ordered 3D Thin-Shell Nanolattice Materials with Near-Unity Refractive Indices

Atomic Layer Deposition on Electrospun Polymer Fibers as a Direct Route to Al2O3 Microtubes with Precise Wall Thickness Control

Making inert polypropylene fibers chemically responsive by combining atomic layer deposition and vapor phase chemical grafting

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