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The effects of crystallographic orientation and strain of thin Hf0.5Zr0.5O2 film on its ferroelectricity

Applied physics letters, 2014-02, Vol.104 (7)

2014

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Grain size engineering for ferroelectric Hf0.5Zr0.5O2 films by an insertion of Al2O3 interlayer

Applied physics letters, 2014-11, Vol.105 (19)

2014

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Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films

Advanced materials (Weinheim), 2015-03, Vol.27 (11), p.1811-1831

2015

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Study on the size effect in Hf0.5Zr0.5O2 films thinner than 8 nm before and after wake-up field cycling

Applied physics letters, 2015-11, Vol.107 (19)

2015

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Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature

Applied physics letters, 2013-06, Vol.102 (24)

2013

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Study on the degradation mechanism of the ferroelectric properties of thin Hf0.5Zr0.5O2 films on TiN and Ir electrodes

Applied physics letters, 2014-08, Vol.105 (7)

2014

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Understanding the formation of the metastable ferroelectric phase in hafnia-zirconia solid solution thin films

Nanoscale, 2018-01, Vol.10 (2), p.716-725

2018

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Giant Negative Electrocaloric Effects of Hf0.5Zr0.5O2 Thin Films

Advanced materials (Weinheim), 2016-09, Vol.28 (36), p.7956-7961

2016

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Voltage Drop in a Ferroelectric Single Layer Capacitor by Retarded Domain Nucleation

Nano letters, 2017-12, Vol.17 (12), p.7796-7802

2017

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A Comparative Study on the Ferroelectric Performances in Atomic Layer Deposited Hf0.5Zr0.5O2 Thin Films Using Tetrakis(ethylmethylamino) and Tetrakis(dimethylamino) Precursors

Nanoscale research letters, 2020-04, Vol.15 (1), p.72-72, Article 72

2020

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Thin HfxZr1-xO2 Films: A New Lead-Free System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability

Advanced energy materials, 2014-11, Vol.4 (16), p.n/a

2014

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A study on the wake-up effect of ferroelectric Hf0.5Zr0.5O2 films by pulse-switching measurement

Nanoscale, 2016-01, Vol.8 (3), p.1383-1389

2016

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Quasiparticle interference and impurity resonances on WTe2

Nano research, 2020-09, Vol.13 (9), p.2534-2540

2020

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Ferroelectric properties and switching endurance of Hf0.5Zr0.5O2 films on TiN bottom and TiN or RuO2 top electrodes

Physica status solidi. PSS-RRL. Rapid research letters, 2014-06, Vol.8 (6), p.532-535

2014

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Scale-up and optimization of HfO2-ZrO2 solid solution thin films for the electrostatic supercapacitors

Nano energy, 2017-09, Vol.39, p.390-399

2017

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A comprehensive study on the mechanism of ferroelectric phase formation in hafnia-zirconia nanolaminates and superlattices

Applied physics reviews, 2019-12, Vol.6 (4)

2019

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Nucleation‐Limited Ferroelectric Orthorhombic Phase Formation in Hf0.5Zr0.5O2 Thin Films

Advanced electronic materials, 2019-02, Vol.5 (2), p.n/a

2019

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Time-Dependent Negative Capacitance Effects in Al2O3/BaTiO3 Bilayers

Nano letters, 2016-07, Vol.16 (7), p.4375-4381

2016

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Preparation and characterization of ferroelectric Hf0.5Zr0.5O2 thin films grown by reactive sputtering

Nanotechnology, 2017-07, Vol.28 (30), p.305703-305703

2017

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Two-step polarization switching mediated by a nonpolar intermediate phase in Hf0.4Zr0.6O2 thin films

Nanoscale, 2016-07, Vol.8 (29), p.13898-1397

2016

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Investigating the Impact of Oxygen Surface Plasma Treatments on the Structural and Electrical Properties of Graphene

Applied Science and Convergence Technology, 2024-01, Vol.33 (1), p.7-12

2024

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Characterization of a 2D Electron Gas at the Interface of Atomic‐Layer Deposited Al2O3/ZnO Thin Films for a Field‐Effect Transistor

Advanced electronic materials, 2021-01, Vol.7 (1), p.n/a

2021

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Investigation of ferro-resistive switching mechanisms in TiN/Hf0.5Zr0.5O2/WOx/W ferroelectric tunnel junctions with the interface layer effect

Applied physics reviews, 2024-12, Vol.11 (4)

2024

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2D Electron Gas at the Interface of Atomic‐Layer‐Deposited Al2O3/TiO2 on SrTiO3 Single Crystal Substrate

Advanced electronic materials, 2019-01, Vol.5 (1), p.n/a

2019

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Antenna isolation method using sub-array structure with soft-surface for Tx/Rx separated FDD hybrid beamforming system

Journal of electromagnetic waves and applications, 2021-03, Vol.35 (5), p.620-633

2021

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The effects of crystallographic orientation and strain of thin Hf0.5Zr0.5O2 film on its ferroelectricity

Grain size engineering for ferroelectric Hf0.5Zr0.5O2 films by an insertion of Al2O3 interlayer

Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films

Study on the size effect in Hf0.5Zr0.5O2 films thinner than 8 nm before and after wake-up field cycling

Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature

Study on the degradation mechanism of the ferroelectric properties of thin Hf0.5Zr0.5O2 films on TiN and Ir electrodes

Understanding the formation of the metastable ferroelectric phase in hafnia-zirconia solid solution thin films

Giant Negative Electrocaloric Effects of Hf0.5Zr0.5O2 Thin Films

Voltage Drop in a Ferroelectric Single Layer Capacitor by Retarded Domain Nucleation

A Comparative Study on the Ferroelectric Performances in Atomic Layer Deposited Hf0.5Zr0.5O2 Thin Films Using Tetrakis(ethylmethylamino) and Tetrakis(dimethylamino) Precursors

Thin HfxZr1-xO2 Films: A New Lead-Free System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability

A study on the wake-up effect of ferroelectric Hf0.5Zr0.5O2 films by pulse-switching measurement

Quasiparticle interference and impurity resonances on WTe2

Ferroelectric properties and switching endurance of Hf0.5Zr0.5O2 films on TiN bottom and TiN or RuO2 top electrodes

Scale-up and optimization of HfO2-ZrO2 solid solution thin films for the electrostatic supercapacitors

A comprehensive study on the mechanism of ferroelectric phase formation in hafnia-zirconia nanolaminates and superlattices

Nucleation‐Limited Ferroelectric Orthorhombic Phase Formation in Hf0.5Zr0.5O2 Thin Films

Time-Dependent Negative Capacitance Effects in Al2O3/BaTiO3 Bilayers

Preparation and characterization of ferroelectric Hf0.5Zr0.5O2 thin films grown by reactive sputtering

Two-step polarization switching mediated by a nonpolar intermediate phase in Hf0.4Zr0.6O2 thin films

Investigating the Impact of Oxygen Surface Plasma Treatments on the Structural and Electrical Properties of Graphene

Characterization of a 2D Electron Gas at the Interface of Atomic‐Layer Deposited Al2O3/ZnO Thin Films for a Field‐Effect Transistor

Investigation of ferro-resistive switching mechanisms in TiN/Hf0.5Zr0.5O2/WOx/W ferroelectric tunnel junctions with the interface layer effect

2D Electron Gas at the Interface of Atomic‐Layer‐Deposited Al2O3/TiO2 on SrTiO3 Single Crystal Substrate

Antenna isolation method using sub-array structure with soft-surface for Tx/Rx separated FDD hybrid beamforming system

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