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Effect of Al2O3 ALD coating and vapor infusion on the bulk mechanical response of elastic and viscoelastic polymers

Surface & coatings technology, 2015-01, Vol.261, p.411-417

2015

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Solution-Processed, Antimony-Doped Tin Oxide Colloid Films Enable High-Performance TiO2 Photoanodes for Water Splitting

Nano letters, 2013-04, Vol.13 (4), p.1481-1488

2013

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Ordered 3D Thin-Shell Nanolattice Materials with Near-Unity Refractive Indices

Advanced functional materials, 2015-11, Vol.25 (42), p.6644-6649

2015

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Atomic Layer Deposition on Electrospun Polymer Fibers as a Direct Route to Al2O3 Microtubes with Precise Wall Thickness Control

Nano letters, 2007-03, Vol.7 (3), p.719-722

2007

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Making inert polypropylene fibers chemically responsive by combining atomic layer deposition and vapor phase chemical grafting

Nanotechnology, 2011-04, Vol.22 (15), p.155601-155601

2011

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Stabilizing chromophore binding on TiO2 for long-term stability of dye-sensitized solar cells using multicomponent atomic layer deposition

Physical chemistry chemical physics : PCCP, 2014-05, Vol.16 (18), p.8615-8622

2014

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Effect of temperature and gas velocity on growth per cycle during Al2O3 and ZnO atomic layer deposition at atmospheric pressure

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2012-01, Vol.30 (1)

2012

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Conduction mechanisms and stability of single molecule nanoparticle/molecule/nanoparticle junctions

Nanotechnology, 2007-01, Vol.18 (3), p.035203-035203 (8)

2007

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Real-time conductivity analysis through single-molecule electrical junctions

Nanotechnology, 2007-10, Vol.18 (42), p.424001-424001 (7)

2007

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Low-Temperature Atomic Layer Deposition of Tungsten using Tungsten Hexafluoride and Highly-diluted Silane in Argon

Chemical vapor deposition, 2013-06, Vol.19 (4-6), p.161-166

2013

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Stable anatase TiO2 coating on quartz fibers by atomic layer deposition for photoactive light-scattering in dye-sensitized solar cells

Nanoscale, 2012-08, Vol.4 (15), p.4731-4738

2012

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Charge generation during oxidation of thin Hf metal films on silicon

Thin solid films, 2006-08, Vol.513 (1), p.201-205

2006

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SiNx charge-trap nonvolatile memory based on ZnO thin-film transistors

Applied physics letters, 2011-09, Vol.99 (11)

2011

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Low temperature metal oxide film deposition and reaction kinetics in supercritical carbon dioxide

Thin solid films, 2008-06, Vol.516 (15), p.4997-5003

2008

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Angular behavior of the Berreman effect investigated in uniform Al2O3 layers formed by atomic layer deposition

Journal of physics. Condensed matter, 2010-04, Vol.22 (15), p.155401-155401

2010

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Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2023-07, Vol.41 (4)

2023

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Prevention of Ultraviolet (UV)-Induced Surface Damage and Cytotoxicity of Polyethersulfone Using Atomic Layer Deposition (ALD) Titanium Dioxide

JOM (1989), 2013-04, Vol.65 (4), p.550-556

2013

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Sinter-free phase conversion and scanning transmission electron microscopy of FePt nanoparticle monolayers

Nanoscale, 2011-01, Vol.3 (10), p.4142-4149

2011

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Compositional dependence of crystallization temperatures and phase evolution in hafnia-zirconia (HfxZr1−x)O2 thin films

Applied physics letters, 2020-05, Vol.116 (19)

2020

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Properties of La-silicate high- K dielectric films formed by oxidation of La on silicon

Journal of applied physics, 2003-02, Vol.93 (3), p.1691-1696

2003

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Inherent substrate-dependent growth initiation and selective-area atomic layer deposition of TiO2 using “water-free” metal-halide/metal alkoxide reactants

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2016-01, Vol.34 (1)

2016

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Carbonate formation during post-deposition ambient exposure of high-k dielectrics

Applied physics letters, 2003-10, Vol.83 (17), p.3543-3545

2003

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Effect of reactant dosing on selectivity during area-selective deposition of TiO2 via integrated atomic layer deposition and atomic layer etching

Journal of applied physics, 2020-09, Vol.128 (10)

2020

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Wetting properties induced in nano-composite POSS-MA polymer films by atomic layer deposited oxides

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2012-01, Vol.30 (1), p.01A105-01A105-6

2012

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Vapor-phase zeolitic imidazolate framework-8 growth on fibrous polymer substrates

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2024-01, Vol.42 (1)

2024

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Effect of Al2O3 ALD coating and vapor infusion on the bulk mechanical response of elastic and viscoelastic polymers

Solution-Processed, Antimony-Doped Tin Oxide Colloid Films Enable High-Performance TiO2 Photoanodes for Water Splitting

Ordered 3D Thin-Shell Nanolattice Materials with Near-Unity Refractive Indices

Atomic Layer Deposition on Electrospun Polymer Fibers as a Direct Route to Al2O3 Microtubes with Precise Wall Thickness Control

Making inert polypropylene fibers chemically responsive by combining atomic layer deposition and vapor phase chemical grafting

Stabilizing chromophore binding on TiO2 for long-term stability of dye-sensitized solar cells using multicomponent atomic layer deposition

Effect of temperature and gas velocity on growth per cycle during Al2O3 and ZnO atomic layer deposition at atmospheric pressure

Conduction mechanisms and stability of single molecule nanoparticle/molecule/nanoparticle junctions

Real-time conductivity analysis through single-molecule electrical junctions

Low-Temperature Atomic Layer Deposition of Tungsten using Tungsten Hexafluoride and Highly-diluted Silane in Argon

Stable anatase TiO2 coating on quartz fibers by atomic layer deposition for photoactive light-scattering in dye-sensitized solar cells

Charge generation during oxidation of thin Hf metal films on silicon

SiNx charge-trap nonvolatile memory based on ZnO thin-film transistors

Low temperature metal oxide film deposition and reaction kinetics in supercritical carbon dioxide

Angular behavior of the Berreman effect investigated in uniform Al2O3 layers formed by atomic layer deposition

Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride

Prevention of Ultraviolet (UV)-Induced Surface Damage and Cytotoxicity of Polyethersulfone Using Atomic Layer Deposition (ALD) Titanium Dioxide

Sinter-free phase conversion and scanning transmission electron microscopy of FePt nanoparticle monolayers

Compositional dependence of crystallization temperatures and phase evolution in hafnia-zirconia (HfxZr1−x)O2 thin films

Properties of La-silicate high- K dielectric films formed by oxidation of La on silicon

Inherent substrate-dependent growth initiation and selective-area atomic layer deposition of TiO2 using “water-free” metal-halide/metal alkoxide reactants

Carbonate formation during post-deposition ambient exposure of high-k dielectrics

Effect of reactant dosing on selectivity during area-selective deposition of TiO2 via integrated atomic layer deposition and atomic layer etching

Wetting properties induced in nano-composite POSS-MA polymer films by atomic layer deposited oxides

Vapor-phase zeolitic imidazolate framework-8 growth on fibrous polymer substrates

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