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Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge

Journal of physics. D, Applied physics, 2022-01, Vol.55 (1), p.15202

2022

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On the polytropic coefficient of negative ions for modeling the sheath and presheath of electronegative plasmas

Journal of applied physics, 2023-08, Vol.134 (7)

2023

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On the HiPIMS benefits of multi-pulse operating mode

Journal of physics. D, Applied physics, 2015-01, Vol.48 (1), p.15202-10

2015

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Effect of space charge on vacuum pre-breakdown voltage and electron emission current

Journal of applied physics, 2021-04, Vol.129 (15)

2021

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Target ion and neutral spread in high power impulse magnetron sputtering

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2023-01, Vol.41 (1)

2023

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Plasma investigations and deposition of Me-DLC (Me = Al, Ti or Nb) obtained by a magnetron sputtering-RFPECVD hybrid process

Surface & coatings technology, 2018-11, Vol.354, p.351-359

2018

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Kinetics of plasma species and their ionization in short-HiPIMS by particle modeling

Surface & coatings technology, 2014-09, Vol.255, p.52-61

2014

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Extracted current saturation in negative ion sources

Journal of applied geophysics, 2012-06, Vol.111 (11), p.113303-113303-10

2012

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Microwave air plasmas in capillaries at low pressure II. Experimental investigation

Journal of physics. D, Applied physics, 2016-11, Vol.49 (43), p.435202

2016

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Self-consistent Monte Carlo model for ECRIS plasma simulation

Journal of physics. Conference series, 2022, Vol.2244 (1), p.12027

2022

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Simulation of Beam Formation in the CERN Negative Ion Source for the Linac4 Accelerator

Journal of physics. Conference series, 2022, Vol.2244 (1), p.12042

2022

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Time resolved metal line profile by near-ultraviolet tunable diode laser absorption spectroscopy

Journal of applied physics, 2011-03, Vol.109 (5), p.053307-053307-6

2011

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Improving HiPIMS deposition rates by hybrid RF/HiPIMS co-sputtering, and its relevance for NbSi films

Surface & coatings technology, 2014-07, Vol.250, p.32-36

2014

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Controlled electron emission and vacuum breakdown with nanosecond pulses

Journal of physics. D, Applied physics, 2016-06, Vol.49 (23), p.235502-235511

2016

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The role of oxygen in magnetron-sputtered Ta3N5 thin films for the photoelectrolysis of water

Surface & coatings technology, 2017-09, Vol.324, p.620-625

2017

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Nanoparticle growth by collection of ions: orbital motion limited theory and collision-enhanced collection

Journal of physics. D, Applied physics, 2016-10, Vol.49 (39), p.395208

2016

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Beam Formation Studies on the CERN IS03b H Source

Journal of physics. Conference series, 2022, Vol.2244 (1), p.12036

2022

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Role of Electron–Ion Dissociative Recombination in CH4 Microwave Plasma on Basis of Simulations and Measurements of Electron Energy

Plasma chemistry and plasma processing, 2019-09, Vol.39 (5), p.1275-1289

2019

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3D numerical simulations of negative hydrogen ion extraction using realistic plasma parameters, geometry of the extraction aperture and full 3D magnetic field map

Review of scientific instruments, 2014-02, Vol.85 (2)

2014

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Tunable diode-laser induced fluorescence on Al and Ti atoms in low pressure magnetron discharges

Journal of physics. D, Applied physics, 2010-03, Vol.43 (12), p.124013-124013

2010

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Interface study between nanostructured tantalum nitride films and carbon nanotubes grown by chemical vapour deposition

Applied surface science, 2014-10, Vol.315, p.510-515

2014

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Microstructure and properties of the compound layer obtained by pulsed plasma nitriding in steel gears

Surface & coatings technology, 2009-02, Vol.203 (10), p.1457-1461

2009

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Room temperature synthesis of carbon nanofibers containing nitrogen by plasma-enhanced chemical vapor deposition

Applied physics letters, 2004-08, Vol.85 (7), p.1244-1246

2004

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Nanostructured tantalum nitride films as buffer-layer for carbon nanotube growth

Thin solid films, 2011-04, Vol.519 (12), p.4097-4100

2011

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Single chamber PVD/PECVD process for in situ control of the catalyst activity on carbon nanotubes growth

Surface & coatings technology, 2005-10, Vol.200 (1-4), p.1101-1105

2005

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Influence of the magnetic field on the discharge physics of a high power impulse magnetron sputtering discharge

On the polytropic coefficient of negative ions for modeling the sheath and presheath of electronegative plasmas

On the HiPIMS benefits of multi-pulse operating mode

Effect of space charge on vacuum pre-breakdown voltage and electron emission current

Target ion and neutral spread in high power impulse magnetron sputtering

Plasma investigations and deposition of Me-DLC (Me = Al, Ti or Nb) obtained by a magnetron sputtering-RFPECVD hybrid process

Kinetics of plasma species and their ionization in short-HiPIMS by particle modeling

Extracted current saturation in negative ion sources

Microwave air plasmas in capillaries at low pressure II. Experimental investigation

Self-consistent Monte Carlo model for ECRIS plasma simulation

Simulation of Beam Formation in the CERN Negative Ion Source for the Linac4 Accelerator

Time resolved metal line profile by near-ultraviolet tunable diode laser absorption spectroscopy

Improving HiPIMS deposition rates by hybrid RF/HiPIMS co-sputtering, and its relevance for NbSi films

Controlled electron emission and vacuum breakdown with nanosecond pulses

The role of oxygen in magnetron-sputtered Ta3N5 thin films for the photoelectrolysis of water

Nanoparticle growth by collection of ions: orbital motion limited theory and collision-enhanced collection

Beam Formation Studies on the CERN IS03b H Source

Role of Electron–Ion Dissociative Recombination in CH4 Microwave Plasma on Basis of Simulations and Measurements of Electron Energy

3D numerical simulations of negative hydrogen ion extraction using realistic plasma parameters, geometry of the extraction aperture and full 3D magnetic field map

Tunable diode-laser induced fluorescence on Al and Ti atoms in low pressure magnetron discharges

Interface study between nanostructured tantalum nitride films and carbon nanotubes grown by chemical vapour deposition

Microstructure and properties of the compound layer obtained by pulsed plasma nitriding in steel gears

Room temperature synthesis of carbon nanofibers containing nitrogen by plasma-enhanced chemical vapor deposition

Nanostructured tantalum nitride films as buffer-layer for carbon nanotube growth

Single chamber PVD/PECVD process for in situ control of the catalyst activity on carbon nanotubes growth

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