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The effect of UF on the efficiency of O3/H2O2 for the removal of organics from surface water

Desalination, 2010-09, Vol.260 (1-3), p.39-42

2010

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Fundamental study of the removal mechanisms of nano-sized particles using brush scrubber cleaning

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2005-09, Vol.23 (5), p.2160-2175

2005

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Particle adhesion and removal mechanisms during brush scrubber cleaning

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2004-11, Vol.22 (6), p.2844-2852

2004

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The Impact of Traces of Hydrogen Peroxide and Phosphate on the Ozone Decomposition Rate in "Pure Water"

Ozone: science & engineering, 2008-07, Vol.30 (4), p.300-309

2008

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A Detailed Study on the Growth of Thin Oxide Layers on Silicon Using Ozonated Solutions

Journal of the Electrochemical Society, 2000-03, Vol.147 (3), p.1124

2000

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A Study of the Influence of Typical Wet Chemical Treatments on the Germanium Wafer Surface

Solid state phenomena, 2005-04, Vol.103-104, p.27-30

2005

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Validation of vapor phase decomposition–droplet collection–total reflection X-ray fluorescence spectrometry for metallic contamination analysis of silicon wafers

Spectrochimica acta. Part B: Atomic spectroscopy, 2004-08, Vol.59 (8), p.1149-1157

2004

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The Etching Mechanisms of SiO2 in Hydrofluoric Acid

Journal of the Electrochemical Society, 1994-10, Vol.141 (10), p.2852-2857

1994

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The Application of Ozone in Semiconductor Cleaning Processes: The Solubility Issue

Journal of the Electrochemical Society, 2001-09, Vol.148 (9), p.G487

2001

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Silicon Orientation Effects in the Atomic Layer Deposition of Hafnium Oxide

Journal of the Electrochemical Society, 2008, Vol.155 (2), p.G9

2008

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Another look at the electron attachment to nitrous oxide

The Journal of chemical physics, 2001-05, Vol.114 (18), p.7911-7917

2001

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Kinetic study in a microwave-induced plasma afterglow of the Fe (a 5D4) reaction with NO2 from 303 to 814 K

Physical chemistry chemical physics : PCCP, 2003-12, Vol.5 (24), p.5419-5423

2003

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Remediation for TXRF saturation effects on microdroplet residues from preconcentration methods on semiconductor wafers

Journal of analytical atomic spectrometry, 2005-01, Vol.20 (7), p.652

2005

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A new concept of carbon dioxide accelerated ammonia release from liquid manure in pig house

Environment international, 2000-08, Vol.26 (1), p.97-104

2000

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Determination of metallic contaminants on Ge wafers using direct- and droplet sandwich etch-total reflection X-ray fluorescence spectrometry

Spectrochimica acta. Part B: Atomic spectroscopy, 2003-12, Vol.58 (12), p.2093-2104

2003

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Kinetic Investigation of the Reaction Sr( 1 S) + O 2 + He in the Temperature Range from 303 to 968 K

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 1998-10, Vol.102 (43), p.8333-8338

1998

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Vapor phase decomposition–droplet collection–total reflection X-ray fluorescence spectrometry for metallic contamination analysis on Ge wafers

Spectrochimica acta. Part B: Atomic spectroscopy, 2005-02, Vol.60 (2), p.209-213

2005

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Development and validation of a dynamic mathematical model of ammonia release in pig house

Environment international, 2000-08, Vol.26 (1), p.105-115

2000

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Study of the Surface Reactions in ALD Hafnium Aluminates

Journal of the Electrochemical Society, 2010, Vol.157 (1), p.G7

2010

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Kinetic Investigation of the Reaction Sr(1S) + O2 + He in the Temperature Range from 303 to 968 K

The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory, 1998-10, Vol.102 (43), p.8333-8338

1998

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Relation between Particle Density and Haze on a Wafer: a New Approach to Measuring Nano-Sized Particles

Solid state phenomena, 2003-05, Vol.92, p.161-164

2003

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HPLC-MS determination of the oxidation products of the reaction between alpha- and beta-pinene and OH radicals

Analytical and bioanalytical chemistry, 2002-03, Vol.372 (5-6), p.630-638

2002

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Photoresist Stripping by Ozone/Water Processes: Effect of Additives

Solid state phenomena, 2005-04, Vol.103-104, p.309-314

2005

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Adapting, implementing and evaluating a navigation intervention for older people with cancer and their family caregivers in six countries in Europe: the Horizon Europe-funded EU NAVIGATE project

Palliative care and social practice, 2024-01, Vol.18, p.26323524241288873

2024

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The Increasing Importance of the Use of Ozone in the Microelectronics Industry

Ozone: science & engineering, 2002, Vol.24 (5), p.379-390

2002

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The effect of UF on the efficiency of O3/H2O2 for the removal of organics from surface water

Fundamental study of the removal mechanisms of nano-sized particles using brush scrubber cleaning

Particle adhesion and removal mechanisms during brush scrubber cleaning

The Impact of Traces of Hydrogen Peroxide and Phosphate on the Ozone Decomposition Rate in "Pure Water"

A Detailed Study on the Growth of Thin Oxide Layers on Silicon Using Ozonated Solutions

A Study of the Influence of Typical Wet Chemical Treatments on the Germanium Wafer Surface

Validation of vapor phase decomposition–droplet collection–total reflection X-ray fluorescence spectrometry for metallic contamination analysis of silicon wafers

The Etching Mechanisms of SiO2 in Hydrofluoric Acid

The Application of Ozone in Semiconductor Cleaning Processes: The Solubility Issue

Silicon Orientation Effects in the Atomic Layer Deposition of Hafnium Oxide

Another look at the electron attachment to nitrous oxide

Kinetic study in a microwave-induced plasma afterglow of the Fe (a 5D4) reaction with NO2 from 303 to 814 K

Remediation for TXRF saturation effects on microdroplet residues from preconcentration methods on semiconductor wafers

A new concept of carbon dioxide accelerated ammonia release from liquid manure in pig house

Determination of metallic contaminants on Ge wafers using direct- and droplet sandwich etch-total reflection X-ray fluorescence spectrometry

Kinetic Investigation of the Reaction Sr( 1 S) + O 2 + He in the Temperature Range from 303 to 968 K

Vapor phase decomposition–droplet collection–total reflection X-ray fluorescence spectrometry for metallic contamination analysis on Ge wafers

Development and validation of a dynamic mathematical model of ammonia release in pig house

Study of the Surface Reactions in ALD Hafnium Aluminates

Kinetic Investigation of the Reaction Sr(1S) + O2 + He in the Temperature Range from 303 to 968 K

Relation between Particle Density and Haze on a Wafer: a New Approach to Measuring Nano-Sized Particles

HPLC-MS determination of the oxidation products of the reaction between alpha- and beta-pinene and OH radicals

Photoresist Stripping by Ozone/Water Processes: Effect of Additives

Adapting, implementing and evaluating a navigation intervention for older people with cancer and their family caregivers in six countries in Europe: the Horizon Europe-funded EU NAVIGATE project

The Increasing Importance of the Use of Ozone in the Microelectronics Industry

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