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Main properties of Al2O3 thin films deposited by magnetron sputtering of an Al2O3 ceramic target at different radio-frequency power and argon pressure and their passivation effect on p-type c-Si wafers

Thin solid films, 2016-11, Vol.619, p.288-296

2016

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Soft chemistry routes to transparent metal oxide thin films. The case of sol–gel synthesis and structural characterization of Ta2O5 thin films from tantalum chloromethoxide

Thin solid films, 2014-03, Vol.555, p.39-41

2014

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Low temperature amorphous and nanocrystalline silicon thin film transistors deposited by Hot-Wire CVD on glass substrate

Thin solid films, 2006-04, Vol.501 (1), p.303-306

2006

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Top-gate microcrystalline silicon TFTs processed at low temperature (<200 °C)

Thin solid films, 2005-09, Vol.487 (1), p.227-231

2005

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Progress in single junction microcrystalline silicon solar cells deposited by Hot-Wire CVD

Thin solid films, 2006-04, Vol.501 (1), p.247-251

2006

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Photodiodes based on fullerene semiconductor

Thin solid films, 2007-07, Vol.515 (19), p.7675-7678

2007

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Morphological and structural characterization of WO3 and Cr-WO3 thin films synthesized by sol-gel process

Thin solid films, 2010-06, Vol.518 (16), p.4512-4514

2010

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Electronic properties of intrinsic and doped amorphous silicon carbide films

Thin solid films, 2006-07, Vol.511 (Complete), p.290-294

2006

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Morphological and structural characterization of WO 3 and Cr–WO 3 thin films synthesized by sol–gel process

Thin solid films, 2010, Vol.518 (16), p.4512-4514

2010

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Progress in a-Si:H/c-Si heterojunction emitters obtained by Hot-Wire CVD at 200 °C

Thin solid films, 2008, Vol.516 (5), p.761-764

2008

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Low temperature back-surface-field contacts deposited by hot-wire CVD for heterojunction solar cells

Thin solid films, 2008-08, Vol.516 (20), p.6782-6785

2008

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Nanocrystalline silicon thin films on PEN substrates

Thin solid films, 2007-06

2007

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Analysis of bias stress on thin-film transistors obtained by Hot-Wire Chemical Vapour Deposition

Thin solid films, 2001-02, Vol.383 (1-2), p.307-309

2001

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Surface passivation of crystalline silicon by Cat-CVD amorphous and nanocrystalline thin silicon films

Thin solid films, 2003-04, Vol.430 (1), p.270-273

2003

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Stability of hydrogenated nanocrystalline silicon thin-film transistors

Thin solid films, 2001-09, Vol.395 (1-2), p.335-338

2001

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Substrate influence on the properties of doped thin silicon layers grown by Cat-CVD

Thin solid films, 2003-04, Vol.430 (1), p.157-160

2003

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Thin silicon films ranging from amorphous to nanocrystalline obtained by hot-wire CVD

Thin solid films, 2001-02, Vol.383 (1-2), p.189-191

2001

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Investigations on doping of amorphous and nano-crystalline silicon films deposited by catalytic chemical vapour deposition

Thin solid films, 2001

2001

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Optoelectronic studies in nanocrystalline silicon Schottky diodes obtained by Hot-Wire Chemical Vapour Deposition

Thin solid films, 2001

2001

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Main properties of Al2O3 thin films deposited by magnetron sputtering of an Al2O3 ceramic target at different radio-frequency power and argon pressure and their passivation effect on p-type c-Si wafers

Soft chemistry routes to transparent metal oxide thin films. The case of sol–gel synthesis and structural characterization of Ta2O5 thin films from tantalum chloromethoxide

Low temperature amorphous and nanocrystalline silicon thin film transistors deposited by Hot-Wire CVD on glass substrate

Top-gate microcrystalline silicon TFTs processed at low temperature (<200 °C)

Progress in single junction microcrystalline silicon solar cells deposited by Hot-Wire CVD

Photodiodes based on fullerene semiconductor

Morphological and structural characterization of WO3 and Cr-WO3 thin films synthesized by sol-gel process

Electronic properties of intrinsic and doped amorphous silicon carbide films

Morphological and structural characterization of WO 3 and Cr–WO 3 thin films synthesized by sol–gel process

Progress in a-Si:H/c-Si heterojunction emitters obtained by Hot-Wire CVD at 200 °C

Low temperature back-surface-field contacts deposited by hot-wire CVD for heterojunction solar cells

Nanocrystalline silicon thin films on PEN substrates

Analysis of bias stress on thin-film transistors obtained by Hot-Wire Chemical Vapour Deposition

Surface passivation of crystalline silicon by Cat-CVD amorphous and nanocrystalline thin silicon films

Stability of hydrogenated nanocrystalline silicon thin-film transistors

Substrate influence on the properties of doped thin silicon layers grown by Cat-CVD

Thin silicon films ranging from amorphous to nanocrystalline obtained by hot-wire CVD

Investigations on doping of amorphous and nano-crystalline silicon films deposited by catalytic chemical vapour deposition

Optoelectronic studies in nanocrystalline silicon Schottky diodes obtained by Hot-Wire Chemical Vapour Deposition

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