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Structure and mechanical properties of TiAlN―WNx thin films

Surface & coatings technology, 2011-07, Vol.205 (20), p.4821-4827

2011

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Recent progress and new directions in density functional theory based design of hard coatings

Surface & coatings technology, 2016, Vol.286, p.178-190

2016

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Transmission electron microscopy investigation of the effect of Si alloying on the thermal stability of amorphous alumina thin films deposited by filtered cathodic arc deposition

Surface & coatings technology, 2014-10, Vol.257, p.338-347

2014

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Spinodal decomposition of reactively sputtered (V0.64Al0.36)0.49N0.51 thin films

Surface & coatings technology, 2020-05, Vol.389, p.125641, Article 125641

2020

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ZrCuAlNi thin film metallic glass grown by high power impulse and direct current magnetron sputtering

Surface & coatings technology, 2021-04, Vol.412, p.127029, Article 127029

2021

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Influence of the Al concentration in Ti-Al-B coatings on microstructure and mechanical properties using combinatorial sputtering from a segmented TiB2/AlB2 target

Surface & coatings technology, 2019-04, Vol.364, p.89-98

2019

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Crystallization kinetics of amorphous Cr2AlC thin films

Surface & coatings technology, 2011-11, Vol.206 (4), p.599-603

2011

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Thermal stability of nanocomposite Mo2BC hard coatings deposited by magnetron sputtering

Surface & coatings technology, 2018-09, Vol.349, p.378-383

2018

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Substrate rotation-induced chemical modulation in Ti-Al-O-N coatings synthesized by cathodic arc in an industrial deposition plant

Surface & coatings technology, 2016-11, Vol.305, p.249-253

2016

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Composition-constitution-morphology relationship of Al2O3 thin films deposited by plasma assisted chemical vapor deposition

Surface & coatings technology, 2009-09, Vol.204 (1-2), p.215-221

2009

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Preface

Surface & coatings technology, 2020-12, Vol.404, p.126451, Article 126451

2020

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Deviations between film and target compositions induced by backscattered Ar during sputtering from M-2-Al-C (M = Cr, Zr, and Hf) composite targets

Surface & coatings technology, 2022-09, Vol.446

2022

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Plasma-based Surface Engineering: Celebrating the research career of Professor Allan Matthews, FREng

Surface & coatings technology, 2022-07, Vol.442

2022

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Plasma-based Surface Engineering

Surface & coatings technology, 2022-07, Vol.442, p.128593, Article 128593

2022

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Is it meaningful to quantify vacancy concentrations of nanolamellar (Ti,Al)N thin films based on laser-assisted atom probe data?

Surface & coatings technology, 2023-11, Vol.473, p.130020, Article 130020

2023

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Deviations between film and target compositions induced by backscattered Ar during sputtering from M2-Al-C (M = Cr, Zr, and Hf) composite targets

Surface & coatings technology, 2022-09, Vol.446, p.128764, Article 128764

2022

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Temporally-resolved decomposition of Ti 0.12 Al 0.21 B 0.67 thin films at 1000°C

Surface & coatings technology, 2024, Vol.487

2024

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Temporally-resolved decomposition of Ti0.12Al0.21B0.67 thin films at 1000 °C

Surface & coatings technology, 2024-07, Vol.487, p.131026, Article 131026

2024

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Spinodal decomposition of reactively sputtered (V0.64Al0.36)(0.49)N-0.51 thin films

Surface & coatings technology, 2020-05, Vol.389

2020

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Synthesis and oxidation behavior of Ti0.35Al0.65By (y = 1.7–2.4) coatings

Surface & coatings technology, 2022-07, Vol.442, p.128190, Article 128190

2022

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Probing the onset of wurtzite phase formation in (V,Al)N thin films by transmission electron microscopy and atom probe tomography

Surface & coatings technology, 2022-07, Vol.442, p.128235, Article 128235

2022

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Oxidation resistance and mechanical properties of sputter-deposited Ti0.9Al0.1B2-y thin films

Surface & coatings technology, 2022-07, Vol.442, p.128187, Article 128187

2022

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A novel pulsed magnetron sputter technique utilizing very high target power densities

Surface & coatings technology, 1999-12, Vol.122 (2), p.290-293

1999

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Reactive ionized magnetron sputtering of crystalline alumina coatings

Surface & coatings technology, 1998, Vol.98 (1), p.1473-1476

1998

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Phase formation and mechanical properties of alumina coatings prepared at substrate temperatures less than 500 °C by ionized and conventional sputtering

Surface & coatings technology, 1997, Vol.94 (1-3), p.179-183

1997

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Structure and mechanical properties of TiAlN―WNx thin films

Recent progress and new directions in density functional theory based design of hard coatings

Transmission electron microscopy investigation of the effect of Si alloying on the thermal stability of amorphous alumina thin films deposited by filtered cathodic arc deposition

Spinodal decomposition of reactively sputtered (V0.64Al0.36)0.49N0.51 thin films

ZrCuAlNi thin film metallic glass grown by high power impulse and direct current magnetron sputtering

Influence of the Al concentration in Ti-Al-B coatings on microstructure and mechanical properties using combinatorial sputtering from a segmented TiB2/AlB2 target

Crystallization kinetics of amorphous Cr2AlC thin films

Thermal stability of nanocomposite Mo2BC hard coatings deposited by magnetron sputtering

Substrate rotation-induced chemical modulation in Ti-Al-O-N coatings synthesized by cathodic arc in an industrial deposition plant

Composition-constitution-morphology relationship of Al2O3 thin films deposited by plasma assisted chemical vapor deposition

Preface

Deviations between film and target compositions induced by backscattered Ar during sputtering from M-2-Al-C (M = Cr, Zr, and Hf) composite targets

Plasma-based Surface Engineering: Celebrating the research career of Professor Allan Matthews, FREng

Plasma-based Surface Engineering

Is it meaningful to quantify vacancy concentrations of nanolamellar (Ti,Al)N thin films based on laser-assisted atom probe data?

Deviations between film and target compositions induced by backscattered Ar during sputtering from M2-Al-C (M = Cr, Zr, and Hf) composite targets

Temporally-resolved decomposition of Ti 0.12 Al 0.21 B 0.67 thin films at 1000°C

Temporally-resolved decomposition of Ti0.12Al0.21B0.67 thin films at 1000 °C

Spinodal decomposition of reactively sputtered (V0.64Al0.36)(0.49)N-0.51 thin films

Synthesis and oxidation behavior of Ti0.35Al0.65By (y = 1.7–2.4) coatings

Probing the onset of wurtzite phase formation in (V,Al)N thin films by transmission electron microscopy and atom probe tomography

Oxidation resistance and mechanical properties of sputter-deposited Ti0.9Al0.1B2-y thin films

A novel pulsed magnetron sputter technique utilizing very high target power densities

Reactive ionized magnetron sputtering of crystalline alumina coatings

Phase formation and mechanical properties of alumina coatings prepared at substrate temperatures less than 500 °C by ionized and conventional sputtering

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