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Progress and future directions for atomic layer deposition and ALD-based chemistry

MRS bulletin, 2011-11, Vol.36 (11), p.865-871

2011

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Unexpectedly large remanent polarization of Hf0.5Zr0.5O2 metal–ferroelectric–metal capacitor fabricated without breaking vacuum

Applied physics letters, 2021-01, Vol.118 (1)

2021

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Density dependence of the room temperature thermal conductivity of atomic layer deposition-grown amorphous alumina (Al2O3)

Applied physics letters, 2014-06, Vol.104 (25)

2014

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Temperature-dependent reaction between trimethylaluminum and poly(methyl methacrylate) during sequential vapor infiltration: experimental and ab initio analysis

Journal of materials chemistry. C, Materials for optical and electronic devices, 2014, Vol.2 (44), p.9416-9424

2014

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Thermal atomic layer etching of metallic tungsten via oxidation and etch reaction mechanism using O2 or O3 for oxidation and WCl6 as the chlorinating etchant

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2020-03, Vol.38 (2)

2020

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Understanding inherent substrate selectivity during atomic layer deposition: Effect of surface preparation, hydroxyl density, and metal oxide composition on nucleation mechanisms during tungsten ALD

The Journal of chemical physics, 2017-02, Vol.146 (5), p.052811-052811

2017

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Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition

Applied physics letters, 2022-08, Vol.121 (8)

2022

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Many routes to ferroelectric HfO2: A review of current deposition methods

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2022-01, Vol.40 (1)

2022

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Reduced fatigue and leakage of ferroelectric TiN/Hf0.5Zr0.5O2/TiN capacitors by thin alumina interlayers at the top or bottom interface

Nanotechnology, 2023-03, Vol.34 (12)

2023

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Atomic layer deposition on polymer fibers and fabrics for multifunctional and electronic textiles

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2016-01, Vol.34 (1)

2016

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Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2012-01, Vol.30 (1), p.010802-010802-11

2012

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Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition

Journal of applied physics, 2023-06, Vol.133 (22)

2023

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The influence of crystallographic texture on structural and electrical properties in ferroelectric Hf0.5Zr0.5O2

Journal of applied physics, 2022-12, Vol.132 (24)

2022

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Functional model for analysis of ALD nucleation and quantification of area-selective deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2019-03, Vol.37 (2)

Parsons, Gregory N.

2019

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Effect of Al2O3 ALD coating and vapor infusion on the bulk mechanical response of elastic and viscoelastic polymers

Surface & coatings technology, 2015-01, Vol.261, p.411-417

2015

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Making inert polypropylene fibers chemically responsive by combining atomic layer deposition and vapor phase chemical grafting

Nanotechnology, 2011-04, Vol.22 (15), p.155601-155601

2011

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Stabilizing chromophore binding on TiO2 for long-term stability of dye-sensitized solar cells using multicomponent atomic layer deposition

Physical chemistry chemical physics : PCCP, 2014-05, Vol.16 (18), p.8615-8622

2014

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Effect of temperature and gas velocity on growth per cycle during Al2O3 and ZnO atomic layer deposition at atmospheric pressure

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2012-01, Vol.30 (1)

2012

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Conduction mechanisms and stability of single molecule nanoparticle/molecule/nanoparticle junctions

Nanotechnology, 2007-01, Vol.18 (3), p.035203-035203 (8)

2007

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Real-time conductivity analysis through single-molecule electrical junctions

Nanotechnology, 2007-10, Vol.18 (42), p.424001-424001 (7)

2007

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Stable anatase TiO2 coating on quartz fibers by atomic layer deposition for photoactive light-scattering in dye-sensitized solar cells

Nanoscale, 2012-08, Vol.4 (15), p.4731-4738

2012

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SiNx charge-trap nonvolatile memory based on ZnO thin-film transistors

Applied physics letters, 2011-09, Vol.99 (11)

2011

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Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2023-07, Vol.41 (4)

2023

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Prevention of Ultraviolet (UV)-Induced Surface Damage and Cytotoxicity of Polyethersulfone Using Atomic Layer Deposition (ALD) Titanium Dioxide

JOM (1989), 2013-04, Vol.65 (4), p.550-556

2013

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Sinter-free phase conversion and scanning transmission electron microscopy of FePt nanoparticle monolayers

Nanoscale, 2011-01, Vol.3 (10), p.4142-4149

2011

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Progress and future directions for atomic layer deposition and ALD-based chemistry

Unexpectedly large remanent polarization of Hf0.5Zr0.5O2 metal–ferroelectric–metal capacitor fabricated without breaking vacuum

Density dependence of the room temperature thermal conductivity of atomic layer deposition-grown amorphous alumina (Al2O3)

Temperature-dependent reaction between trimethylaluminum and poly(methyl methacrylate) during sequential vapor infiltration: experimental and ab initio analysis

Thermal atomic layer etching of metallic tungsten via oxidation and etch reaction mechanism using O2 or O3 for oxidation and WCl6 as the chlorinating etchant

Understanding inherent substrate selectivity during atomic layer deposition: Effect of surface preparation, hydroxyl density, and metal oxide composition on nucleation mechanisms during tungsten ALD

Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition

Many routes to ferroelectric HfO2: A review of current deposition methods

Reduced fatigue and leakage of ferroelectric TiN/Hf0.5Zr0.5O2/TiN capacitors by thin alumina interlayers at the top or bottom interface

Atomic layer deposition on polymer fibers and fabrics for multifunctional and electronic textiles

Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition

Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition

The influence of crystallographic texture on structural and electrical properties in ferroelectric Hf0.5Zr0.5O2

Functional model for analysis of ALD nucleation and quantification of area-selective deposition

Effect of Al2O3 ALD coating and vapor infusion on the bulk mechanical response of elastic and viscoelastic polymers

Making inert polypropylene fibers chemically responsive by combining atomic layer deposition and vapor phase chemical grafting

Stabilizing chromophore binding on TiO2 for long-term stability of dye-sensitized solar cells using multicomponent atomic layer deposition

Effect of temperature and gas velocity on growth per cycle during Al2O3 and ZnO atomic layer deposition at atmospheric pressure

Conduction mechanisms and stability of single molecule nanoparticle/molecule/nanoparticle junctions

Real-time conductivity analysis through single-molecule electrical junctions

Stable anatase TiO2 coating on quartz fibers by atomic layer deposition for photoactive light-scattering in dye-sensitized solar cells

SiNx charge-trap nonvolatile memory based on ZnO thin-film transistors

Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride

Prevention of Ultraviolet (UV)-Induced Surface Damage and Cytotoxicity of Polyethersulfone Using Atomic Layer Deposition (ALD) Titanium Dioxide

Sinter-free phase conversion and scanning transmission electron microscopy of FePt nanoparticle monolayers

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