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Progress and future directions for atomic layer deposition and ALD-based chemistry

MRS bulletin, 2011-11, Vol.36 (11), p.865-871

2011

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Unexpectedly large remanent polarization of Hf0.5Zr0.5O2 metal–ferroelectric–metal capacitor fabricated without breaking vacuum

Applied physics letters, 2021-01, Vol.118 (1)

2021

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Investigation of the Corrosion Behavior of Atomic Layer Deposited Al₂O₃/TiO₂ Nanolaminate Thin Films on Copper in 0.1 M NaCl

Materials, 2019-02, Vol.12 (4), p.672

2019

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Density dependence of the room temperature thermal conductivity of atomic layer deposition-grown amorphous alumina (Al2O3)

Applied physics letters, 2014-06, Vol.104 (25)

2014

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Temperature-dependent reaction between trimethylaluminum and poly(methyl methacrylate) during sequential vapor infiltration: experimental and ab initio analysis

Journal of materials chemistry. C, Materials for optical and electronic devices, 2014, Vol.2 (44), p.9416-9424

2014

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Thermal atomic layer etching of metallic tungsten via oxidation and etch reaction mechanism using O2 or O3 for oxidation and WCl6 as the chlorinating etchant

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2020-03, Vol.38 (2)

2020

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Understanding inherent substrate selectivity during atomic layer deposition: Effect of surface preparation, hydroxyl density, and metal oxide composition on nucleation mechanisms during tungsten ALD

The Journal of chemical physics, 2017-02, Vol.146 (5), p.052811-052811

2017

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Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition

Applied physics letters, 2022-08, Vol.121 (8)

2022

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Many routes to ferroelectric HfO2: A review of current deposition methods

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2022-01, Vol.40 (1)

2022

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Atomic layer deposition on polymer fibers and fabrics for multifunctional and electronic textiles

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2016-01, Vol.34 (1)

2016

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Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2012-01, Vol.30 (1), p.010802-010802-11

2012

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Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition

Journal of applied physics, 2023-06, Vol.133 (22)

2023

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The influence of crystallographic texture on structural and electrical properties in ferroelectric Hf0.5Zr0.5O2

Journal of applied physics, 2022-12, Vol.132 (24)

2022

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Functional model for analysis of ALD nucleation and quantification of area-selective deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2019-03, Vol.37 (2)

Parsons, Gregory N.

2019

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Effect of Al2O3 ALD coating and vapor infusion on the bulk mechanical response of elastic and viscoelastic polymers

Surface & coatings technology, 2015-01, Vol.261, p.411-417

2015

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Stabilizing chromophore binding on TiO2 for long-term stability of dye-sensitized solar cells using multicomponent atomic layer deposition

Physical chemistry chemical physics : PCCP, 2014-05, Vol.16 (18), p.8615-8622

2014

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Effect of temperature and gas velocity on growth per cycle during Al2O3 and ZnO atomic layer deposition at atmospheric pressure

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2012-01, Vol.30 (1)

2012

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Low-Temperature Atomic Layer Deposition of Tungsten using Tungsten Hexafluoride and Highly-diluted Silane in Argon

Chemical vapor deposition, 2013-06, Vol.19 (4-6), p.161-166

2013

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Charge generation during oxidation of thin Hf metal films on silicon

Thin solid films, 2006-08, Vol.513 (1), p.201-205

2006

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SiNx charge-trap nonvolatile memory based on ZnO thin-film transistors

Applied physics letters, 2011-09, Vol.99 (11)

2011

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Low temperature metal oxide film deposition and reaction kinetics in supercritical carbon dioxide

Thin solid films, 2008-06, Vol.516 (15), p.4997-5003

2008

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Angular behavior of the Berreman effect investigated in uniform Al2O3 layers formed by atomic layer deposition

Journal of physics. Condensed matter, 2010-04, Vol.22 (15), p.155401-155401

2010

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Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2023-07, Vol.41 (4)

2023

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Prevention of Ultraviolet (UV)-Induced Surface Damage and Cytotoxicity of Polyethersulfone Using Atomic Layer Deposition (ALD) Titanium Dioxide

JOM (1989), 2013-04, Vol.65 (4), p.550-556

2013

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Compositional dependence of crystallization temperatures and phase evolution in hafnia-zirconia (HfxZr1−x)O2 thin films

Applied physics letters, 2020-05, Vol.116 (19)

2020

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Progress and future directions for atomic layer deposition and ALD-based chemistry

Unexpectedly large remanent polarization of Hf0.5Zr0.5O2 metal–ferroelectric–metal capacitor fabricated without breaking vacuum

Investigation of the Corrosion Behavior of Atomic Layer Deposited Al₂O₃/TiO₂ Nanolaminate Thin Films on Copper in 0.1 M NaCl

Density dependence of the room temperature thermal conductivity of atomic layer deposition-grown amorphous alumina (Al2O3)

Temperature-dependent reaction between trimethylaluminum and poly(methyl methacrylate) during sequential vapor infiltration: experimental and ab initio analysis

Thermal atomic layer etching of metallic tungsten via oxidation and etch reaction mechanism using O2 or O3 for oxidation and WCl6 as the chlorinating etchant

Understanding inherent substrate selectivity during atomic layer deposition: Effect of surface preparation, hydroxyl density, and metal oxide composition on nucleation mechanisms during tungsten ALD

Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition

Many routes to ferroelectric HfO2: A review of current deposition methods

Atomic layer deposition on polymer fibers and fabrics for multifunctional and electronic textiles

Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition

Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition

The influence of crystallographic texture on structural and electrical properties in ferroelectric Hf0.5Zr0.5O2

Functional model for analysis of ALD nucleation and quantification of area-selective deposition

Effect of Al2O3 ALD coating and vapor infusion on the bulk mechanical response of elastic and viscoelastic polymers

Stabilizing chromophore binding on TiO2 for long-term stability of dye-sensitized solar cells using multicomponent atomic layer deposition

Effect of temperature and gas velocity on growth per cycle during Al2O3 and ZnO atomic layer deposition at atmospheric pressure

Low-Temperature Atomic Layer Deposition of Tungsten using Tungsten Hexafluoride and Highly-diluted Silane in Argon

Charge generation during oxidation of thin Hf metal films on silicon

SiNx charge-trap nonvolatile memory based on ZnO thin-film transistors

Low temperature metal oxide film deposition and reaction kinetics in supercritical carbon dioxide

Angular behavior of the Berreman effect investigated in uniform Al2O3 layers formed by atomic layer deposition

Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride

Prevention of Ultraviolet (UV)-Induced Surface Damage and Cytotoxicity of Polyethersulfone Using Atomic Layer Deposition (ALD) Titanium Dioxide

Compositional dependence of crystallization temperatures and phase evolution in hafnia-zirconia (HfxZr1−x)O2 thin films

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