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Seasonal and Root-Specific Metabolomic Profiles of Panax Ginseng Meyer by Ultra-High Performance Liquid Chromatography-Quadrupole-Time-of-Flight-Mass Spectrometry (UPLC-QTOF-MS) and Partial Least Squares-Discriminant Analysis (PLS-DA)

Analytical letters, 2024-11, Vol.57 (16), p.2762-2772

2024

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Fuel characteristics of molasses-impregnated low-rank coal produced in a top-spray fluidized-bed reactor

Drying technology, 2016-07, Vol.34 (9), p.1095-1106

2016

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Demonstration of a high throughput on-board hydrogen generation reactor system using aluminum coil as fuel for a vehicle

International journal of green energy, 2016-01, Vol.13 (6), p.573-579

2016

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Effect of Dry Etching of TiO2 Thin Films Using Inductively Coupled Plasma

Ferroelectrics, 2013-01, Vol.456 (1), p.63-73

2013

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Dry Etching Characteristics of Bi0.5(Na0.82K0.18)0.5TiO3 Thin Films in Inductively Coupled Plasma

Ferroelectrics, 2013-01, Vol.453 (1), p.44-53

2013

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Surface Chemical Reaction on HfO2 Thin Film Etched by High Density Plasma

Ferroelectrics, 2013-01, Vol.454 (1), p.91-98

2013

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Dry Etch Properties of ZTO Thin Films Using Inductively Coupled Plasma

Ferroelectrics, 2013-01, Vol.454 (1), p.99-109

2013

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Prediction of termination migration of a rod-type particle in Ti-6Al-4Fe alloy

Philosophical magazine letters, 2012-12, Vol.92 (12), p.701-709

2012

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Exploring the Impact of Acculturation and Ethnic Identity on Korean U.S. Residents' Consumption Behaviors of Utilitarian versus Hedonic Products

Journal of international consumer marketing, 2014-01, Vol.26 (1), p.2-13

2014

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The Dry Etching Properties of HfAlO3 Thin Films over Si and SiO2 Using Inductively Coupled Plasma Source

Ferroelectrics, 2013-01, Vol.457 (1), p.137-145

2013

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The Dry Etching Properties of HfAlO^sub 3^ Thin Films over Si and SiO^sub 2^ Using Inductively Coupled Plasma Source

Ferroelectrics, 2013-01, Vol.457 (1), p.137

2013

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The Dry Etching Properties of HfAlO sub(3) Thin Films over Si and SiO sub(2) Using Inductively Coupled Plasma Source

Ferroelectrics, 2013-01, Vol.457 (1), p.137-145

2013

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The Dry Etching Properties of HfAlO 3 Thin Films over Si and SiO 2 Using Inductively Coupled Plasma Source

Ferroelectrics, 2013-01, Vol.457 (1), p.137-145

2013

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Temperature Dependence on Dry Etching of Hafnium Oxide Using an Inductively Coupled Plasma

Ferroelectrics, 2010-01, Vol.406 (1), p.176-184

2010

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Surface Chemical Reaction on HfO 2 Thin Film Etched by High Density Plasma

Ferroelectrics, 2013-01, Vol.454 (1), p.91-98

2013

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Effect of Dry Etching of TiO sub(2) Thin Films Using Inductively Coupled Plasma

Ferroelectrics, 2013-01, Vol.456 (1), p.63-73

2013

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Surface Chemical Reaction on HfO^sub 2^ Thin Film Etched by High Density Plasma

Ferroelectrics, 2013-01, Vol.454 (1), p.91

2013

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Effect of Dry Etching of TiO 2 Thin Films Using Inductively Coupled Plasma

Ferroelectrics, 2013-01, Vol.456 (1), p.63-73

2013

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Surface Chemical Reaction on HfO sub(2) Thin Film Etched by High Density Plasma

Ferroelectrics, 2013-01, Vol.454 (1), p.91-98

2013

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Effect of Dry Etching of TiO^sub 2^ Thin Films Using Inductively Coupled Plasma

Ferroelectrics, 2013-01, Vol.456 (1), p.63

2013

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Dry Etching Characteristics of Bi 0.5 (Na 0.82 K 0.18 ) 0.5 TiO 3 Thin Films in Inductively Coupled Plasma

Ferroelectrics, 2013-01, Vol.453 (1), p.44-53

2013

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Dry Etching Characteristics of Bi sub(0.5)(Na sub(0.82)K sub(0.18)) sub(0.5)TiO sub(3) Thin Films in Inductively Coupled Plasma

Ferroelectrics, 2013-01, Vol.453 (1), p.44-53

2013

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Dry Etching Characteristics of Bi^sub 0.5^(Na^sub 0.82^K^sub 0.18^)^sub 0.5^TiO^sub 3^ Thin Films in Inductively Coupled Plasma

Ferroelectrics, 2013-01, Vol.453 (1), p.44

2013

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Magnetoelectric Coupling Effect in Ferroelectric and Ferromagnetic Hybrid Thin Films

Integrated ferroelectrics, 2014-10, Vol.157 (1), p.57-62

2014

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Immunomodulatory activities and subacute toxicity of a novel β-glucan from Paenibacillus polymyxa JB115 in rats

Immunopharmacology and immunotoxicology, 2011-03, Vol.33 (1), p.124-134

2011

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Seasonal and Root-Specific Metabolomic Profiles of Panax Ginseng Meyer by Ultra-High Performance Liquid Chromatography-Quadrupole-Time-of-Flight-Mass Spectrometry (UPLC-QTOF-MS) and Partial Least Squares-Discriminant Analysis (PLS-DA)

Fuel characteristics of molasses-impregnated low-rank coal produced in a top-spray fluidized-bed reactor

Demonstration of a high throughput on-board hydrogen generation reactor system using aluminum coil as fuel for a vehicle

Effect of Dry Etching of TiO2 Thin Films Using Inductively Coupled Plasma

Dry Etching Characteristics of Bi0.5(Na0.82K0.18)0.5TiO3 Thin Films in Inductively Coupled Plasma

Surface Chemical Reaction on HfO2 Thin Film Etched by High Density Plasma

Dry Etch Properties of ZTO Thin Films Using Inductively Coupled Plasma

Prediction of termination migration of a rod-type particle in Ti-6Al-4Fe alloy

Exploring the Impact of Acculturation and Ethnic Identity on Korean U.S. Residents' Consumption Behaviors of Utilitarian versus Hedonic Products

The Dry Etching Properties of HfAlO3 Thin Films over Si and SiO2 Using Inductively Coupled Plasma Source

The Dry Etching Properties of HfAlO^sub 3^ Thin Films over Si and SiO^sub 2^ Using Inductively Coupled Plasma Source

The Dry Etching Properties of HfAlO sub(3) Thin Films over Si and SiO sub(2) Using Inductively Coupled Plasma Source

The Dry Etching Properties of HfAlO 3 Thin Films over Si and SiO 2 Using Inductively Coupled Plasma Source

Temperature Dependence on Dry Etching of Hafnium Oxide Using an Inductively Coupled Plasma

Surface Chemical Reaction on HfO 2 Thin Film Etched by High Density Plasma

Effect of Dry Etching of TiO sub(2) Thin Films Using Inductively Coupled Plasma

Surface Chemical Reaction on HfO^sub 2^ Thin Film Etched by High Density Plasma

Effect of Dry Etching of TiO 2 Thin Films Using Inductively Coupled Plasma

Surface Chemical Reaction on HfO sub(2) Thin Film Etched by High Density Plasma

Effect of Dry Etching of TiO^sub 2^ Thin Films Using Inductively Coupled Plasma

Dry Etching Characteristics of Bi 0.5 (Na 0.82 K 0.18 ) 0.5 TiO 3 Thin Films in Inductively Coupled Plasma

Dry Etching Characteristics of Bi sub(0.5)(Na sub(0.82)K sub(0.18)) sub(0.5)TiO sub(3) Thin Films in Inductively Coupled Plasma

Dry Etching Characteristics of Bi^sub 0.5^(Na^sub 0.82^K^sub 0.18^)^sub 0.5^TiO^sub 3^ Thin Films in Inductively Coupled Plasma

Magnetoelectric Coupling Effect in Ferroelectric and Ferromagnetic Hybrid Thin Films

Immunomodulatory activities and subacute toxicity of a novel β-glucan from Paenibacillus polymyxa JB115 in rats

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