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Multicenter Prospective Study of Stereotactic Body Radiotherapy for Untreated Solitary Primary Hepatocellular Carcinoma: The STRSPH Study

International journal of radiation oncology, biology, physics, 2019-09, Vol.105 (1), p.E223-E223

2019

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IMRT Made Less Toxic Than 3D Conformal Radiation Therapy in Combination With Iodine-125 Brachytherapy for the Treatment of Prostate Cancer

International journal of radiation oncology, biology, physics, 2015-11, Vol.93 (3), p.E188-E188

2015

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Outcomes of Clinically Node Negative Breast Cancer Without Axillary Dissection: Can the Preserved Axilla Be Safely Treated With Radiation After a Positive Sentinel Node Biopsy?

International journal of radiation oncology, biology, physics, 2012-11, Vol.84 (3), p.S243-S244

2012

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Cell Adhesion and Morphology in Porous Scaffold Based on Enantiomeric Poly(lactic acid) Graft-type Phospholipid Polymers

Biomacromolecules, 2002-11, Vol.3 (6), p.1375-1383

2002

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Stereocomplex Formation by Enantiomeric Poly(lactic acid) Graft-Type Phospholipid Polymers for Tissue Engineering

Biomacromolecules, 2002-09, Vol.3 (5), p.1109-1114

2002

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Photochromic Diarylethenes with Intralocking Arms

Journal of the American Chemical Society, 1994-11, Vol.116 (22), p.9894-9900

1994

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Photochromism of diarylethenes having thiophene oligomers as the aryl groups

Tetrahedron, 1997-09, Vol.53 (36), p.12263-12271

1997

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Application of a 3-D chemical fate prediction model (FATE3D) to predict dioxin concentrations in the Tokyo Bay

Estuarine, coastal and shelf science, 2006-12, Vol.70 (4), p.621-632

2006

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37.1: Invited Paper: New Developments in Drivers for Mobile AM-LCDs

SID International Symposium Digest of technical papers, 2006-06, Vol.37 (1), p.1402-1405

2006

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Process of new negative photo-dielectric polymer ALX with high reliability

2010 12th Electronics Packaging Technology Conference, 2010, p.832-834

2010

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Automated antenna detection and correction methodology in VLSI designs

2003 8th International Symposium Plasma- and Process-Induced Damage, 2003, p.158-161

2003

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A general concept for monitoring plasma induced charging damage

2003 8th International Symposium Plasma- and Process-Induced Damage, 2003, p.36-39

2003

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Plasma induced substrate damage in high dose implant resist strip process

2003 8th International Symposium Plasma- and Process-Induced Damage, 2003, p.73-76

2003

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Backend dielectric etch induced wafer arcing mechanism and solution

2003 8th International Symposium Plasma- and Process-Induced Damage, 2003, p.178-181

2003

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Metal contamination monitoring in ion implantation technology

2003 8th International Symposium Plasma- and Process-Induced Damage, 2003, p.81-84

2003

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Impacts of HF etching on ultra-thin core gate oxide integrity in dual gate oxide CMOS technology

2003 8th International Symposium Plasma- and Process-Induced Damage, 2003, p.77-80

2003

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Effect of the process flow on negative-bias-temperature-instability

2003 8th International Symposium Plasma- and Process-Induced Damage, 2003, p.142-145

2003

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Plasma-induced charging in two bit per cell SONOS memories

2003 8th International Symposium Plasma- and Process-Induced Damage, 2003, p.61-64

2003

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Effects of plasma-induced damage to ultrathin (/spl les/1.5 nm) gate dielectric on equivalent oxide thickness downscaling using plasma nitridation process

2003 8th International Symposium Plasma- and Process-Induced Damage, 2003, p.130-133

2003

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The effect of fluorine in an advanced CMOS process with triple (1.6/2.2/5.2 nm) nitrided gate oxide

2003 8th International Symposium Plasma- and Process-Induced Damage, 2003, p.150-153

2003

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Critical issues in plasma etching processes involved in the gate etch fabrication of CMOS devices

2003 8th International Symposium Plasma- and Process-Induced Damage, 2003, p.12-15

2003

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Interaction between ILD-process and metal-etch induced gate charging effect

2003 8th International Symposium Plasma- and Process-Induced Damage, 2003, p.16-19

2003

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Process induced damages from various integrated circuit interconnection designs - limitations of antenna rule under practical integrated circuit layout practice

2003 8th International Symposium Plasma- and Process-Induced Damage, 2003, p.162-167

2003

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Physical characterization of ultrathin high k dielectrics

2003 8th International Symposium Plasma- and Process-Induced Damage, 2003, p.40-50

2003

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Effects of gate notching profile defect on characteristic of cell NMOSFET in low-power SRAM device

2003 8th International Symposium Plasma- and Process-Induced Damage, 2003, p.146-149

2003

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Multicenter Prospective Study of Stereotactic Body Radiotherapy for Untreated Solitary Primary Hepatocellular Carcinoma: The STRSPH Study

IMRT Made Less Toxic Than 3D Conformal Radiation Therapy in Combination With Iodine-125 Brachytherapy for the Treatment of Prostate Cancer

Outcomes of Clinically Node Negative Breast Cancer Without Axillary Dissection: Can the Preserved Axilla Be Safely Treated With Radiation After a Positive Sentinel Node Biopsy?

Cell Adhesion and Morphology in Porous Scaffold Based on Enantiomeric Poly(lactic acid) Graft-type Phospholipid Polymers

Stereocomplex Formation by Enantiomeric Poly(lactic acid) Graft-Type Phospholipid Polymers for Tissue Engineering

Photochromic Diarylethenes with Intralocking Arms

Photochromism of diarylethenes having thiophene oligomers as the aryl groups

Application of a 3-D chemical fate prediction model (FATE3D) to predict dioxin concentrations in the Tokyo Bay

37.1: Invited Paper: New Developments in Drivers for Mobile AM-LCDs

Process of new negative photo-dielectric polymer ALX with high reliability

Automated antenna detection and correction methodology in VLSI designs

A general concept for monitoring plasma induced charging damage

Plasma induced substrate damage in high dose implant resist strip process

Backend dielectric etch induced wafer arcing mechanism and solution

Metal contamination monitoring in ion implantation technology

Impacts of HF etching on ultra-thin core gate oxide integrity in dual gate oxide CMOS technology

Effect of the process flow on negative-bias-temperature-instability

Plasma-induced charging in two bit per cell SONOS memories

Effects of plasma-induced damage to ultrathin (/spl les/1.5 nm) gate dielectric on equivalent oxide thickness downscaling using plasma nitridation process

The effect of fluorine in an advanced CMOS process with triple (1.6/2.2/5.2 nm) nitrided gate oxide

Critical issues in plasma etching processes involved in the gate etch fabrication of CMOS devices

Interaction between ILD-process and metal-etch induced gate charging effect

Process induced damages from various integrated circuit interconnection designs - limitations of antenna rule under practical integrated circuit layout practice

Physical characterization of ultrathin high k dielectrics

Effects of gate notching profile defect on characteristic of cell NMOSFET in low-power SRAM device

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