UB Paderborn / Katalog / Suche / in CDI

Sortiert nach

Einfacher Volltextzugriff von (fast) überall

Installieren Sie die LibKey Nomad-Browsererweiterung und erhalten Sie von vielen Webseiten einfachen Zugriff auf lizenzierte Volltexte oder Open Access Publikationen. Mehr erfahren...

Charging effect simulation model used in simulations of plasma etching of silicon

Journal of applied physics, 2012-10, Vol.112 (8)

2012

Volltextzugriff (PDF)

Mitigation of plasma-induced damage in porous low-k dielectrics by cryogenic precursor condensation

Journal of physics. D, Applied physics, 2016-05, Vol.49 (17), p.175203-175214

2016

Volltextzugriff (PDF)

Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask

Micro and Nano Engineering, 2021-08, Vol.12, p.100089, Article 100089

2021

Volltextzugriff (PDF)

Dispersion of silicone oil in water surfactant solution: Effect of impeller speed, oil viscosity and addition point on drop size distribution

Chemical engineering and processing, 2009-02, Vol.48 (2), p.633-642

2009

Volltextzugriff (PDF)

Is Technological Change Threatening the Very Existence of “Traditional” Survey Research and, if So, What should we do about it?

International journal of market research, 2017-03, Vol.59 (2), p.153-155

Cooke, Mike

2017

Volltextzugriff (PDF)

Atomic layer etching in close-to-conventional plasma etch tools

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2017-01, Vol.35 (1)

2017

Volltextzugriff (PDF)

Viewpoint: 'Is technological change threatening the very existence of "traditional" survey research and, if so, what should we do about it?'

International journal of market research, 2017-04, Vol.59 (2), p.153

Cooke, Mike

2017

Volltextzugriff (PDF)

Modelling the oxidation of seventeen volatile organic compounds to track yields of CO and CO2

Atmospheric environment (1994), 2010-10, Vol.44 (31), p.3797-3804

2010

Volltextzugriff (PDF)

Metal-free plasma-enhanced chemical vapor deposition of large area nanocrystalline graphene

Materials research express, 2014-06, Vol.1 (2), p.25031

2014

Volltextzugriff (PDF)

A Fully Automated High-Throughput Flow Cytometry Screening System Enabling Phenotypic Drug Discovery

SLAS discovery, 2018-08, Vol.23 (7), p.697-707

2018

Volltextzugriff (PDF)

Web 2.0, Social Networks and the Future of Market Research

International journal of market research, 2008-01, Vol.50 (2), p.267-292

2008

Volltextzugriff (PDF)

Fabrication and properties of etched GaN nanorods

Physica status solidi. C, 2012-03, Vol.9 (3-4), p.631-634

2012

Volltextzugriff (PDF)

Advantages of the hollow (concave) turbine for multi-phase agitation under intense operating conditions

Chemical engineering science, 2005-10, Vol.60 (20), p.5529-5543

2005

Volltextzugriff (PDF)

High yield growth of vertically aligned carbon nanostructure through low frequency induced plasma enhanced chemical vapour deposition

Plasma Research Express, 2019-08, Vol.1 (3), p.35011

2019

Volltextzugriff (PDF)

A Raman metrology approach to quality control of 2D MoS2 film fabrication

Journal of physics. D, Applied physics, 2017-04, Vol.50 (18)

2017

Volltextzugriff (PDF)

Atomic layer etching of SiO2 with Ar and CHF 3 plasmas: A self‐limiting process for aspect ratio independent etching

Plasma processes and polymers, 2019-09, Vol.16 (9), p.n/a

2019

Volltextzugriff (PDF)

A global model for SF6 plasmas coupling reaction kinetics in the gas phase and on the surface of the reactor walls

Journal of physics. D, Applied physics, 2009-03, Vol.42 (5), p.055209-055209 (15)

2009

Volltextzugriff (PDF)

Growth Mechanism of a Hybrid Structure Consisting of a Graphite Layer on Top of Vertical Carbon Nanotubes

Journal of nanomaterials, 2012-01, Vol.2012 (2012), p.1-10

2012

Volltextzugriff (PDF)

Atomic layer etching of SiO2 with Ar and CHF3 plasmas: A self‐limiting process for aspect ratio independent etching

Plasma processes and polymers, 2019-09, Vol.16 (9)

2019

Volltextzugriff (PDF)

Balancing ion parameters and fluorocarbon chemical reactants for SiO2 pattern transfer control using fluorocarbon-based atomic layer etching

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2019-09, Vol.37 (5)

2019

Volltextzugriff (PDF)

Specific features of power characteristics of in-line rotor–stator mixers

Chemical engineering and processing, 2015-05, Vol.91, p.43-56

2015

Volltextzugriff (PDF)

The effect of scale and interfacial tension on liquid–liquid dispersion in in-line Silverson rotor–stator mixers

Chemical engineering research & design, 2013-11, Vol.91 (11), p.2156-2168

2013

Volltextzugriff (PDF)

A global model for C4F8 plasmas coupling gas phase and wall surface reaction kinetics

Journal of physics. D, Applied physics, 2008-10, Vol.41 (19), p.195211-195211 (12)

2008

Volltextzugriff (PDF)

(Invited) Development of Plasma Atomic Layer Etching in Close-to-Conventional Etch Tools

ECS transactions, 2018, Vol.85 (6), p.71-76

2018

Volltextzugriff (PDF)

Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber

Journal of Micro/Nanopatterning, Materials, and Metrology, 2023-04, Vol.22 (2)

2023

Volltextzugriff (PDF)

1 – 25 von 210

Suche als RSS-Feed

Aktive Filter

ThemaHumans

Suchergebnisse filtern

Filter anzeigen

Nur zeigen

Geprüft (Peer-Review)
(144)
Mit Volltextzugriff
(175)

Publikationsform

3 weitere anzeigen...

Weniger anzeigen...

Sprache

Englisch
(209)
Spanisch
(1)

Erscheinungsjahr

n.n

Thema

Science & Technology
(64)
Life Sciences & Biomedicine
(32)
Physical Sciences
(21)
Technology
(21)
Social Sciences
(16)
Physics
(15)
Engineering
(14)
Materials Science
(12)
Physics, Applied
(12)
Business
(10)
Business & Economics
(10)
Animals
(9)
Materials Science, Multidisciplinary
(9)
Science & Technology - Other Topics
(9)
Biological And Medical Sciences
(8)
Communication
(7)
Engineering, Electrical & Electronic
(7)
Exact Sciences And Technology
(7)
Fundamental And Applied Biological Sciences. Psychology
(7)
United Kingdom
(7)

15 weitere anzeigen...

Weniger anzeigen...

Menü

Weitere Dienste

Einstellungen

Charging effect simulation model used in simulations of plasma etching of silicon

Mitigation of plasma-induced damage in porous low-k dielectrics by cryogenic precursor condensation

Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask

Dispersion of silicone oil in water surfactant solution: Effect of impeller speed, oil viscosity and addition point on drop size distribution

Is Technological Change Threatening the Very Existence of “Traditional” Survey Research and, if So, What should we do about it?

Atomic layer etching in close-to-conventional plasma etch tools

Viewpoint: 'Is technological change threatening the very existence of "traditional" survey research and, if so, what should we do about it?'

Modelling the oxidation of seventeen volatile organic compounds to track yields of CO and CO2

Metal-free plasma-enhanced chemical vapor deposition of large area nanocrystalline graphene

A Fully Automated High-Throughput Flow Cytometry Screening System Enabling Phenotypic Drug Discovery

Web 2.0, Social Networks and the Future of Market Research

Fabrication and properties of etched GaN nanorods

Advantages of the hollow (concave) turbine for multi-phase agitation under intense operating conditions

High yield growth of vertically aligned carbon nanostructure through low frequency induced plasma enhanced chemical vapour deposition

A Raman metrology approach to quality control of 2D MoS2 film fabrication

Atomic layer etching of SiO2 with Ar and CHF 3 plasmas: A self‐limiting process for aspect ratio independent etching

A global model for SF6 plasmas coupling reaction kinetics in the gas phase and on the surface of the reactor walls

Growth Mechanism of a Hybrid Structure Consisting of a Graphite Layer on Top of Vertical Carbon Nanotubes

Atomic layer etching of SiO2 with Ar and CHF3 plasmas: A self‐limiting process for aspect ratio independent etching

Balancing ion parameters and fluorocarbon chemical reactants for SiO2 pattern transfer control using fluorocarbon-based atomic layer etching

Specific features of power characteristics of in-line rotor–stator mixers

The effect of scale and interfacial tension on liquid–liquid dispersion in in-line Silverson rotor–stator mixers

A global model for C4F8 plasmas coupling gas phase and wall surface reaction kinetics

(Invited) Development of Plasma Atomic Layer Etching in Close-to-Conventional Etch Tools

Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber

Aktive Filter

Suchergebnisse filtern