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Metrology for the next generation of semiconductor devices

Nature electronics, 2018-01, Vol.1 (10), p.532-547

2018

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FOUP decontamination solutions to control AMCs in semiconductor fabs: Gas purge or wet cleaning?

Microelectronic engineering, 2018-07, Vol.194, p.19-24

2018

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Depth profiling investigation by pARXPS and MEIS of advanced transistor technology gate stack

Microelectronic engineering, 2017-02, Vol.169, p.24-28

2017

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High resolution nanotopography characterization at die scale of 28 nm FDSOI CMOS front-end CMP processes

Microelectronic engineering, 2014-01, Vol.113, p.105-108

2014

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HF Transport Coefficients in Polymers Used for Microelectronic Applications

Diffusion and defect data. Solid state data. Pt. A, Defect and diffusion forum, 2016-04, Vol.367, p.68-76

2016

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Dynamic boundary conditions for a coupled convection-diffusion model with heat effects: applications in cross-contamination control

International journal of applied mathematical research, 2015-01, Vol.4 (1), p.58-77

2015

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Coupled system of PDEs to predict the sensitivity of some materials constituents of FOUP with the AMCs cross-contamination

International journal of applied mathematical research, 2014-06, Vol.3 (3)

2014

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Diffusion and Solubility of Common Microelectronic Airborne Molecular Contaminants into PEI Thin Polymer Membranes and its Related Contamination Control Applications

Diffusion and defect data. Solid state data. Pt. A, Defect and diffusion forum, 2020-03, Vol.400, p.109-116

2020

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Optical profilometry and AFM measurements comparison on low amplitude deterministic surfaces

2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 2019, p.1-4

2019

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Theoretical and Experimental Optical Spectroscopy Study of Hydrogen Adsorption at Si(111)-(7 x 7)

Physical review letters, 1996-06, Vol.76 (26), p.4923-4926

1996

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In-line characterization of dielectric constant and leakage currents of low-k films with corona charge method

Journal of materials science. Materials in electronics, 2008-02, Vol.19 (2), p.115-118

2008

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Benefits of XPS nanocharacterization for process development and industrial control of thin SiGe channel layers in advanced CMOS technologies

Materials science in semiconductor processing, 2017-11, Vol.70, p.105-110

2017

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Adsorption kinetics of H on Si(111)7×7 by means of surface differential reflectivity

Physical review. B, 1997-08, Vol.56 (8), p.R4371-R4374

1997

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Spectroscopic Investigations of Borosilicate Glass and Its Application as a Dopant Source for Shallow Junctions

Journal of the Electrochemical Society, 2000-08, Vol.147 (8), p.3100

2000

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Comparison Of Several Metrology Techniques For In-line Process Monitoring Of Porous SiOCH

AIP conference proceedings, 2007, Vol.931 (1), p.362-366

2007

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Metrology and Optical Characterization of Plasma Enhanced Chemical Vapor Deposition, (PECVD), low temperature deposited Amorphous Carbon films

Frontiers of Characterization and Metrology for Nanoelectronics: 2007 (AIP Conference Proceedings Volume 931), 2007, Vol.931, p.99-104

2007

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Epidemiological and clinical characteristics and the approach to infant chickenpox in primary care

European journal of pediatrics, 2019-05, Vol.178 (5), p.641-648

2019

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High resolution nanotopography characterization at die scale of 28nm FDSOI CMOS front-end CMP processes

Microelectronic engineering, 2014-01, Vol.113, p.105-108

2014

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Formation and stability of small particles of potassium studied by real-time surface differential reflectance

Surface science, 1998-05, Vol.402, p.445-449

1998

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High resolution nanotopography characterization at die scale of 28 nm FDSOI CMOS front-end CMP processes

Microelectronic engineering, 2013, Vol.113, p.105-108

2013

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Publisher Correction: Metrology for the next generation of semiconductor devices

Nature electronics, 2018-11, Vol.1 (12), p.662-662

2018

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Optical spectroscopy study of hydrogenation of the Si(111)-7 × 7 surface

Applied surface science, 1996-09, Vol.104, p.158-162

1996

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Real-Time Investigation of Potassium Growth by Surface Differential Reflectance Spectroscopy

Physica status solidi. A, Applied research, 1998-12, Vol.170 (2), p.221-226

1998

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Formation and stability of small particles of potassium studied by real-time surface differential reflectance

Surface science, 1997-09, Vol.402-404 (1-3), p.445-449

1997

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Substrate-induced multipolar resonances in supported free-electron metal spheres

Physical review. B, Condensed matter, 1999, Vol.60 (8), p.6018-6022

1999

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Metrology for the next generation of semiconductor devices

FOUP decontamination solutions to control AMCs in semiconductor fabs: Gas purge or wet cleaning?

Depth profiling investigation by pARXPS and MEIS of advanced transistor technology gate stack

High resolution nanotopography characterization at die scale of 28 nm FDSOI CMOS front-end CMP processes

HF Transport Coefficients in Polymers Used for Microelectronic Applications

Dynamic boundary conditions for a coupled convection-diffusion model with heat effects: applications in cross-contamination control

Coupled system of PDEs to predict the sensitivity of some materials constituents of FOUP with the AMCs cross-contamination

Diffusion and Solubility of Common Microelectronic Airborne Molecular Contaminants into PEI Thin Polymer Membranes and its Related Contamination Control Applications

Optical profilometry and AFM measurements comparison on low amplitude deterministic surfaces

Theoretical and Experimental Optical Spectroscopy Study of Hydrogen Adsorption at Si(111)-(7 x 7)

In-line characterization of dielectric constant and leakage currents of low-k films with corona charge method

Benefits of XPS nanocharacterization for process development and industrial control of thin SiGe channel layers in advanced CMOS technologies

Adsorption kinetics of H on Si(111)7×7 by means of surface differential reflectivity

Spectroscopic Investigations of Borosilicate Glass and Its Application as a Dopant Source for Shallow Junctions

Comparison Of Several Metrology Techniques For In-line Process Monitoring Of Porous SiOCH

Metrology and Optical Characterization of Plasma Enhanced Chemical Vapor Deposition, (PECVD), low temperature deposited Amorphous Carbon films

Epidemiological and clinical characteristics and the approach to infant chickenpox in primary care

High resolution nanotopography characterization at die scale of 28nm FDSOI CMOS front-end CMP processes

Formation and stability of small particles of potassium studied by real-time surface differential reflectance

High resolution nanotopography characterization at die scale of 28 nm FDSOI CMOS front-end CMP processes

Publisher Correction: Metrology for the next generation of semiconductor devices

Optical spectroscopy study of hydrogenation of the Si(111)-7 × 7 surface

Real-Time Investigation of Potassium Growth by Surface Differential Reflectance Spectroscopy

Formation and stability of small particles of potassium studied by real-time surface differential reflectance

Substrate-induced multipolar resonances in supported free-electron metal spheres

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