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Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2019-11, Vol.37 (6)

2019

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Status and prospects of plasma-assisted atomic layer deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2019-05, Vol.37 (3)

2019

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Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2012-07, Vol.30 (4)

2012

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Overview of atomic layer etching in the semiconductor industry

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2015-03, Vol.33 (2)

2015

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New strategies for conformal, superconformal, and ultrasmooth films by low temperature chemical vapor deposition

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2020-05, Vol.38 (3)

2020

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Practical guide to the use of backgrounds in quantitative XPS

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2021-01, Vol.39 (1)

Tougaard, Sven

2021

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Molecular dynamics simulation of atomic friction: A review and guide

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2013-05, Vol.31 (3)

2013

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Paradigm shift in thin-film growth by magnetron sputtering: From gas-ion to metal-ion irradiation of the growing film

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2019-11, Vol.37 (6)

2019

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Glancing angle deposition: Fabrication, properties, and applications of micro- and nanostructured thin films

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2007-09, Vol.25 (5), p.1317-1335

2007

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Review Article: Catalysts design and synthesis via selective atomic layer deposition

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2018-01, Vol.36 (1)

2018

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Electronic surface and dielectric interface states on GaN and AlGaN

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2013-09, Vol.31 (5)

2013

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Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2022-12, Vol.40 (6)

2022

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Systematic compositional analysis of sputter-deposited boron-containing thin films

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2021-12, Vol.39 (6)

2021

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Review Article: Hydrogenated graphene: A user’s guide

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2018-09, Vol.36 (5)

Whitener, Keith E.

2018

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Chemical significance of x-ray photoelectron spectroscopy binding energy shifts: A Perspective

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2023-12, Vol.41 (6)

2023

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Critical review of Ohmic and Schottky contacts to β-Ga2O3

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2022-12, Vol.40 (6)

Lyle, Luke A. M.

2022

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Growth of large edge length two-dimensional W S 2 using a custom 12-zone atmospheric pressure chemical vapor deposition system

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2024-01, Vol.42 (1)

2024

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Review Article: Gas and vapor sorption measurements using electronic beam balances

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2018-09, Vol.36 (5)

2018

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Al-rich AlGaN based transistors

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2020-03, Vol.38 (2)

2020

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Tailoring structure, morphology, and tribo-mechanical properties of HiPIMS-deposited CrxNy coatings for enhanced performance in wear and corrosion protection

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2024-07, Vol.42 (4)

2024

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Review of radiation damage in GaN-based materials and devices

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2013-09, Vol.31 (5)

2013

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Hydrogen permeation barriers and preparation techniques: A review

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2022-12, Vol.40 (6)

2022

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Advances in growth, doping, and devices and applications of zinc oxide

Journal of Vacuum Science & Technology A, 2024-03, Vol.42 (2)

2024

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Review Article: Atomic layer deposition for oxide semiconductor thin film transistors: Advances in research and development

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2018-11, Vol.36 (6)

2018

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Review of recent studies on nanoscale electrical junctions and contacts: Quantum tunneling, current crowding, and interface engineering

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2022-05, Vol.40 (3)

2022

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Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook

Status and prospects of plasma-assisted atomic layer deposition

Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells

Overview of atomic layer etching in the semiconductor industry

New strategies for conformal, superconformal, and ultrasmooth films by low temperature chemical vapor deposition

Practical guide to the use of backgrounds in quantitative XPS

Molecular dynamics simulation of atomic friction: A review and guide

Paradigm shift in thin-film growth by magnetron sputtering: From gas-ion to metal-ion irradiation of the growing film

Glancing angle deposition: Fabrication, properties, and applications of micro- and nanostructured thin films

Review Article: Catalysts design and synthesis via selective atomic layer deposition

Electronic surface and dielectric interface states on GaN and AlGaN

Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations

Systematic compositional analysis of sputter-deposited boron-containing thin films

Review Article: Hydrogenated graphene: A user’s guide

Chemical significance of x-ray photoelectron spectroscopy binding energy shifts: A Perspective

Critical review of Ohmic and Schottky contacts to β-Ga2O3

Growth of large edge length two-dimensional W S 2 using a custom 12-zone atmospheric pressure chemical vapor deposition system

Review Article: Gas and vapor sorption measurements using electronic beam balances

Al-rich AlGaN based transistors

Tailoring structure, morphology, and tribo-mechanical properties of HiPIMS-deposited CrxNy coatings for enhanced performance in wear and corrosion protection

Review of radiation damage in GaN-based materials and devices

Hydrogen permeation barriers and preparation techniques: A review

Advances in growth, doping, and devices and applications of zinc oxide

Review Article: Atomic layer deposition for oxide semiconductor thin film transistors: Advances in research and development

Review of recent studies on nanoscale electrical junctions and contacts: Quantum tunneling, current crowding, and interface engineering

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