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The role of the metastable O2(b1Σg+) and energy-dependent secondary electron emission yields in capacitively coupled oxygen discharges

Plasma sources science & technology, 2016-10, Vol.25 (5)

2016

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An ionization region model of the reactive Ar/O2 high power impulse magnetron sputtering discharge

Plasma sources science & technology, 2016-10, Vol.25 (6)

2016

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Global model of plasma chemistry in a low-pressure O2/F2 discharge

Journal of physics. D, Applied physics, 2002-02, Vol.35 (4), p.328-341

Gudmundsson, J T

2002

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A study of the oxygen dynamics in a reactive Ar/O2 high power impulse magnetron sputtering discharge using an ionization region model

Journal of applied physics, 2017-05, Vol.121 (17)

2017

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The low pressure Cl2/O2 discharge and the role of ClO

Plasma sources science & technology, 2010-10, Vol.19 (5), p.055008-055008

2010

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A global (volume averaged) model of a Cl2/Ar discharge: I. Continuous power

Journal of physics. D, Applied physics, 2010-03, Vol.43 (11), p.115201-115201

2010

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Experimental studies of O2/Ar plasma in a planar inductive discharge

Plasma sources science & technology, 1999-02, Vol.8 (1), p.22-30

1999

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Ion energy distribution in H2/Ar plasma in a planar inductive discharge

Plasma sources science & technology, 1999, Vol.8 (1), p.58-64

Gudmundsson, J T

1999

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The role of the metastable O 2 (b${{}^{1}}{\Sigma}_{\text {g}}^{+}$ ) and energy-dependent secondary electron emission yields in capacitively coupled oxygen discharges

Plasma sources science & technology, 2016-07, Vol.25 (5), p.55002

2016

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Efficacy of annealing and fabrication parameters on photo-response of SiGe in TiO 2 matrix

Nanotechnology, 2019-09, Vol.30 (36), p.365604

2019

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A global model study of low pressure high density CF 4 discharge

Plasma sources science & technology, 2019-02, Vol.28 (2), p.25007

2019

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Experimental studies of H2/Ar plasma in a planar inductive discharge

Plasma sources science & technology, 1998-08, Vol.7 (3), p.330-336

GUDMUNDSSON, J. T

1998

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Inductively-coupled plasma discharge for use in high-energy-density scienceexperiments

Journal of instrumentation, 2023-04, Vol.18 (4), p.P04008

2023

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A global (volume averaged) model of a Cl2/Ar discharge: II. Pulsed power modulation

Journal of physics. D, Applied physics, 2010-03, Vol.43 (11), p.115202-115202

2010

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Morphology of Tantalum Nitride Thin Films Grown on Fused Quartz by Reactive High Power Impulse Magnetron Sputtering (HiPIMS)

MRS proceedings, 2015, Vol.1803 (1), Article mrss15-2136859

2015

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Rutile TiO 2 thin films grown by reactive high power impulse magnetron sputtering

Thin solid films, 2013-10, Vol.545, p.445-450

2013

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The low pressure C12/O2 discharge and the role of C10

Plasma sources science & technology, 2010, Vol.19 (5)

2010

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Growth, coalescence, and electrical resistivity of thin Pt films grown by dc magnetron sputtering on SiO 2

Applied surface science, 2008-09, Vol.254 (22), p.7356-7360

2008

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Morphology of TiN thin films grown on SiO(2) by reactive high power impulse magnetron sputtering

Thin solid films, 2011, Vol.520 (5), p.1621

2011

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In-situ electrical characterization of ultrathin TiN films grown by reactive dc magnetron sputtering on SiO(2)

Thin solid films, 2009-10, Vol.517 (24), p.6731-6736

2009

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Current-voltage-time characteristics of the reactive Ar/N{sub 2} high power impulse magnetron sputtering discharge

Journal of applied physics, 2011-10, Vol.110 (8)

2011

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Ar+ and Xe+ Velocities near the Presheath-Sheath Boundary in an Ar/Xe Discharge

Physical review letters, 2011-07, Vol.107 (4)

2011

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Growth of TiO2 thin films on Si(001) and SiO2 by reactive high power impulse magnetron sputtering

MRS proceedings, 2011, Vol.1352 (1)

2011

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Comparison of TiN thin films grown on SiO2 by reactive dc magnetron sputtering and high power impulse magnetron sputtering

MRS proceedings, 2011, Vol.1335 (1)

2011

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On Electron Heating In Magnetron Sputtering Discharges

2017 IEEE International Conference on Plasma Science (ICOPS), 2017, p.1-1

2017

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The role of the metastable O2(b1Σg+) and energy-dependent secondary electron emission yields in capacitively coupled oxygen discharges

An ionization region model of the reactive Ar/O2 high power impulse magnetron sputtering discharge

Global model of plasma chemistry in a low-pressure O2/F2 discharge

A study of the oxygen dynamics in a reactive Ar/O2 high power impulse magnetron sputtering discharge using an ionization region model

The low pressure Cl2/O2 discharge and the role of ClO

A global (volume averaged) model of a Cl2/Ar discharge: I. Continuous power

Experimental studies of O2/Ar plasma in a planar inductive discharge

Ion energy distribution in H2/Ar plasma in a planar inductive discharge

The role of the metastable O 2 (b${{}^{1}}{\Sigma}_{\text {g}}^{+}$ ) and energy-dependent secondary electron emission yields in capacitively coupled oxygen discharges

Efficacy of annealing and fabrication parameters on photo-response of SiGe in TiO 2 matrix

A global model study of low pressure high density CF 4 discharge

Experimental studies of H2/Ar plasma in a planar inductive discharge

Inductively-coupled plasma discharge for use in high-energy-density scienceexperiments

A global (volume averaged) model of a Cl2/Ar discharge: II. Pulsed power modulation

Morphology of Tantalum Nitride Thin Films Grown on Fused Quartz by Reactive High Power Impulse Magnetron Sputtering (HiPIMS)

Rutile TiO 2 thin films grown by reactive high power impulse magnetron sputtering

The low pressure C12/O2 discharge and the role of C10

Growth, coalescence, and electrical resistivity of thin Pt films grown by dc magnetron sputtering on SiO 2

Morphology of TiN thin films grown on SiO(2) by reactive high power impulse magnetron sputtering

In-situ electrical characterization of ultrathin TiN films grown by reactive dc magnetron sputtering on SiO(2)

Current-voltage-time characteristics of the reactive Ar/N{sub 2} high power impulse magnetron sputtering discharge

Ar+ and Xe+ Velocities near the Presheath-Sheath Boundary in an Ar/Xe Discharge

Growth of TiO2 thin films on Si(001) and SiO2 by reactive high power impulse magnetron sputtering

Comparison of TiN thin films grown on SiO2 by reactive dc magnetron sputtering and high power impulse magnetron sputtering

On Electron Heating In Magnetron Sputtering Discharges

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