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Metallurgical Coatings and Thin Films 1991

2012

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Metallurgical Coatings and Thin Films 1992

2012

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Incorporation of metal silicides and refractory metals in VLSI technology

Applied surface science, 1991-11, Vol.53, p.291-312

1991

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Metallurgical Coatings and Thin Films 1991

1, 1991

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Handbook of Compound Semiconductors - Growth, Processing, Characterization, and Devices

1, 1996

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Metallurgical Coatings and Thin Films 1992

1, 1992

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Effects of ion sputtering on semiconductor surfaces

Surface science, 1978-09, Vol.76 (1), p.130-147

McGuire, G.E.

1978

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Laser ablation deposition of titanium nitride films on silicon substrates at room temperature

Thin solid films, 1989-12, Vol.181 (1), p.65-73

1989

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Study of the x-ray photoelectron spectrum of tungsten—tungsten oxide as a function of thickness of the surface oxide layer

Journal of electron spectroscopy and related phenomena, 1972-01, Vol.1 (2), p.161-168

1972

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Application of Ti: W barrier metallization for integrated circuits

Thin solid films, 1978-09, Vol.53 (2), p.117-128

1978

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High-Power GaN Electronic Devices

Critical reviews in solid state and materials sciences, 2002-01, Vol.27 (1), p.1-71

2002

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Angular distribution of the photoelectron spectrum of CO2, COS, CS2, N2O, H2O, and H2S

Journal of electron spectroscopy and related phenomena, 1972-01, Vol.1 (3), p.209-217

1972

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James R. Durig, Vibrational spectra and structure

Journal of electron spectroscopy and related phenomena, 1988-01, Vol.46 (2), p.435

McGuire, G.E.

1988

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R. Lenk, Fluctuations, diffusion and spin relaxation

Journal of electron spectroscopy and related phenomena, 1987-01, Vol.43 (2), p.C5

McGuire, G.E.

1987

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Ion Beam Deposited Gmr Materials

MRS proceedings, 2001, Vol.690, Article F9.12

2001

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Auger transitions initiated from singly and doubly ionized states in Li metal

Solid state communications, 1973-09, Vol.13 (6), p.681-684

1973

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Characterization of electronic devices and materials by surface-sensitive analytical techniques

Applications of surface science, 1980-01, Vol.4 (3), p.410-444

1980

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Surface characterization

Analytical chemistry (Washington), 1987-06, Vol.59 (12), p.294-308

McGuire, Gary E

1987

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High resistivity Co and Ti silicide formation on silicon-on-insulator substrates

Thin solid films, 1994-12, Vol.253 (1-2), p.462-466

1994

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Selective plasma deposition

Thin solid films, 1993-12, Vol.236 (1), p.274-280

1993

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Foreword

Journal of electron spectroscopy and related phenomena, 1990-01, Vol.51, p.XVII

1990

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Emission current measurements under simulated flat panel display conditions

25th Anniversary, IEEE Conference Record - Abstracts. 1998 IEEE International Conference on Plasma Science (Cat. No.98CH36221), 1998, p.170

1998

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Measured DC performance of large arrays of silicon field emitters

IEEE transactions on electron devices, 1994-10, Vol.41 (10), p.1866-1870

1994

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Surface characterization

Analytical chemistry (Washington), 1991, Vol.63 (12), p.99-118

1991

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James R. Durig, Vibrational spectra and structure : Elsevier Science Publishers, 1987, 480 pp. available in the U.S.A and Canada from Elsevier Science Publishing Co. Inc., 52 Vanderbilt Avenue, New York, N.Y. 10017 (U.S.A)

Journal of Electron Spectroscopy and Related Phenomena, 1988, Vol.46 (2), p.435-435

McGuire, G.E.

1988

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Metallurgical Coatings and Thin Films 1991

Metallurgical Coatings and Thin Films 1992

Incorporation of metal silicides and refractory metals in VLSI technology

Metallurgical Coatings and Thin Films 1991

Handbook of Compound Semiconductors - Growth, Processing, Characterization, and Devices

Metallurgical Coatings and Thin Films 1992

Effects of ion sputtering on semiconductor surfaces

Laser ablation deposition of titanium nitride films on silicon substrates at room temperature

Study of the x-ray photoelectron spectrum of tungsten—tungsten oxide as a function of thickness of the surface oxide layer

Application of Ti: W barrier metallization for integrated circuits

High-Power GaN Electronic Devices

Angular distribution of the photoelectron spectrum of CO2, COS, CS2, N2O, H2O, and H2S

James R. Durig, Vibrational spectra and structure

R. Lenk, Fluctuations, diffusion and spin relaxation

Ion Beam Deposited Gmr Materials

Auger transitions initiated from singly and doubly ionized states in Li metal

Characterization of electronic devices and materials by surface-sensitive analytical techniques

Surface characterization

High resistivity Co and Ti silicide formation on silicon-on-insulator substrates

Selective plasma deposition

Foreword

Emission current measurements under simulated flat panel display conditions

Measured DC performance of large arrays of silicon field emitters

Surface characterization

James R. Durig, Vibrational spectra and structure : Elsevier Science Publishers, 1987, 480 pp. available in the U.S.A and Canada from Elsevier Science Publishing Co. Inc., 52 Vanderbilt Avenue, New York, N.Y. 10017 (U.S.A)

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