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Deep wet etching of fused silica glass for hollow capillary optical leaky waveguides in microfluidic devices

Journal of micromechanics and microengineering, 2001-05, Vol.11 (3), p.257-262

2001

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Fundamental Transverse Mode Selection (TMS#0) of Broad Area Semiconductor Lasers with Integrated Twice-Retracted 4f Set-Up and Film-Waveguide Lens

Advances in OptoElectronics (Hindawi), 2017-01, Vol.2017

2017

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Combination of Transverse Mode Selection and Active Longitudinal Mode-Locking of Broad Area Semiconductor Lasers

Advances in OptoElectronics (Hindawi), 2014-01, Vol.2014, p.1-5

2014

Volltextzugriff (PDF)

Halbleiterlaser: unter Verwendung Fourier-optischer Methoden

Fouckhardt, Henning

2011st edition, 2011

Volltextzugriff (PDF)

Lehren und Lernen: 10 Tipps aus der Praxis

Fouckhardt, Henning

1. Aufl. 2017 edition., 2017

Volltextzugriff (PDF)

Optoelectrowetting (OEW) with push-actuation of microdroplets at small frequencies and OEW equations revisited

Sensors and actuators. A. Physical., 2022-02, Vol.334, p.113331, Article 113331

2022

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Photonik: Eine Einführung in die integrierte Optoelektronik und technische Optik

Fouckhardt, Henning

1994

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Photonik: Eine Einfuhrung in die integrierte Optoelektronik und technische Optik

Fouckhardt, Henning

1994th edition, 2013

Volltextzugriff (PDF)

Evanescent-field fiber sensor for the water content in lubricating oils with sensitivity increase by dielectrophoresis

Sensors and actuators. A. Physical., 2012-09, Vol.184, p.93-97

2012

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Microfluidic Droplet Array as Optical Irises Actuated via Electrowetting

Advances in OptoElectronics (Hindawi), 2018-01, Vol.2018, p.1-8

2018

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Compact dynamic microfluidic iris for active optics

Microelectronic engineering, 2011-08, Vol.88 (8), p.1772-1774

2011

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Dependence of the fused-silica etch rate on the etch mask opening diameter

Microelectronic engineering, 2013-12, Vol.112, p.10-13

2013

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1D Confocal Broad Area Semiconductor Lasers (Confocal BALs) for Fundamental Transverse Mode Selection (TMS#0)

Advances in OptoElectronics (Hindawi), 2019-01, Vol.2019, p.1-7

2019

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1 ML Wetting Layer upon Ga(As)Sb Quantum Dot (QD) Formation on GaAs Substrate Monitored with Reflectance Anisotropy Spectroscopy (RAS)

Advances in OptoElectronics (Hindawi), 2018-01, Vol.2018, p.1-7

2018

Volltextzugriff (PDF)

Deep fused silica wet etching using an Au-free and stress-reduced sputter-deposited Cr hard mask

Journal of micromechanics and microengineering, 2005-11, Vol.15 (11), p.2130-2135

2005

Volltextzugriff (PDF)

Generation of Dense Lying Ga(As)Sb Quantum Dots for Efficient Quantum Dot Lasers

Advanced materials research, 2013, Vol.684, p.285-289

2013

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Fourier-optical transverse mode selection in external-cavity broad-area lasers: experimental and numerical results

IEEE journal of quantum electronics, 2003-03, Vol.39 (3), p.448-458

2003

Volltextzugriff (PDF)

nm- and μ m-Scale Surface Roughness on Glass with Specific Optical Scattering Characteristics on Demand

Advances in OptoElectronics (Hindawi), 2007-01, Vol.2007, p.1-7

2007

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Waveguide-based type-II heterostructure photodiode on InAs substrate with broad wavelength range photoresponse

IEEE photonics technology letters, 2004-05, Vol.16 (5), p.1358-1360

2004

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Deep reactive ion etching of GaSb in Cl 2 /Ar-plasma discharges using single-layer soft mask technologies

Journal of micromechanics and microengineering, 2003-03, Vol.13 (2), p.238-245

2003

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Ga(As)Sb/GaAs quantum dots for emission around 1300 nm

2013 Conference on Lasers & Electro-Optics Europe & International Quantum Electronics Conference CLEO EUROPE/IQEC, 2013, p.1-1

2013

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Use of femtosecond square pulses to avoid pulse breakup in all-optical switching

IEEE journal of quantum electronics, 1989-12, Vol.25 (12), p.2648-2655

1989

Volltextzugriff (PDF)

Deep dry etching of GaAs and GaSb using Cl 2 / Ar plasma discharges

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2003-11, Vol.21 (6), p.2393-2397

2003

Volltextzugriff (PDF)

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Deep wet etching of fused silica glass for hollow capillary optical leaky waveguides in microfluidic devices

Fundamental Transverse Mode Selection (TMS#0) of Broad Area Semiconductor Lasers with Integrated Twice-Retracted 4f Set-Up and Film-Waveguide Lens

Combination of Transverse Mode Selection and Active Longitudinal Mode-Locking of Broad Area Semiconductor Lasers

Halbleiterlaser: unter Verwendung Fourier-optischer Methoden

Lehren und Lernen: 10 Tipps aus der Praxis

Optoelectrowetting (OEW) with push-actuation of microdroplets at small frequencies and OEW equations revisited

Photonik: Eine Einführung in die integrierte Optoelektronik und technische Optik

Photonik: Eine Einfuhrung in die integrierte Optoelektronik und technische Optik

Evanescent-field fiber sensor for the water content in lubricating oils with sensitivity increase by dielectrophoresis

Microfluidic Droplet Array as Optical Irises Actuated via Electrowetting

Compact dynamic microfluidic iris for active optics

Dependence of the fused-silica etch rate on the etch mask opening diameter

1D Confocal Broad Area Semiconductor Lasers (Confocal BALs) for Fundamental Transverse Mode Selection (TMS#0)

1 ML Wetting Layer upon Ga(As)Sb Quantum Dot (QD) Formation on GaAs Substrate Monitored with Reflectance Anisotropy Spectroscopy (RAS)

Deep fused silica wet etching using an Au-free and stress-reduced sputter-deposited Cr hard mask

Generation of Dense Lying Ga(As)Sb Quantum Dots for Efficient Quantum Dot Lasers

Fourier-optical transverse mode selection in external-cavity broad-area lasers: experimental and numerical results

nm- and μ m-Scale Surface Roughness on Glass with Specific Optical Scattering Characteristics on Demand

Waveguide-based type-II heterostructure photodiode on InAs substrate with broad wavelength range photoresponse

Deep reactive ion etching of GaSb in Cl 2 /Ar-plasma discharges using single-layer soft mask technologies

Ga(As)Sb/GaAs quantum dots for emission around 1300 nm

Use of femtosecond square pulses to avoid pulse breakup in all-optical switching

Deep dry etching of GaAs and GaSb using Cl 2 / Ar plasma discharges

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