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Synthesis and characterization of Sn complexes containing aminoalkoxide ligands for solution process

Molecular Crystals and Liquid Crystals, 2023-07, Vol.760 (1), p.44-50

2023

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Atomic layer deposition of a ruthenium thin film using a precursor with enhanced reactivity

Journal of materials chemistry. C, Materials for optical and electronic devices, 2021-03, Vol.9 (11), p.382-3825

2021

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Synthesis and characterization of novel zinc precursors for ZnO thin film deposition by atomic layer deposition

Dalton transactions : an international journal of inorganic chemistry, 2020-04, Vol.49 (14), p.436-4314

2020

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Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition

Coatings (Basel), 2020-07, Vol.10 (7), p.692

2020

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Highly efficient photocatalytic methylene blue degradation over Sn(O,S)/TiO2 photocatalyst fabricated via powder atomic layer deposition of SnO and subsequent sulfurization

Materials letters, 2020-08, Vol.272, p.127868, Article 127868

2020

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Vinyl-addition copolymerization of norbornene and 1-octene catalyzed by a non-bridged half-titanocene with a tetrazole-phenoxy ligand

Polymer (Guilford), 2024-03, Vol.295, p.126679, Article 126679

2024

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Atomic-layer-deposited SnO film using novel Sn(dmamb)2 precursor for p-channel thin film transistor

Applied surface science, 2021-05, Vol.547, p.148758, Article 148758

2021

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Phase-controlled SnO2 and SnO growth by atomic layer deposition using Bis(N-ethoxy-2,2-dimethyl propanamido)tin precursor

Ceramics international, 2019-03, Vol.45 (4), p.5124-5132

2019

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Simultaneous etching of underlying metal oxide and sulfide thin films during Cu2S atomic layer deposition

Applied surface science, 2020-09, Vol.524, p.146452, Article 146452

2020

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Polycrystalline and high purity SnO2 films by plasma-enhanced atomic layer deposition using H2O plasma at very low temperatures of 60–90 °C

Vacuum, 2022-02, Vol.196, p.110739, Article 110739

2022

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High-performance Atomic-Layer-Deposited SnO thin film transistors fabricated by intense pulsed light annealing

Applied surface science, 2023-01, Vol.609, p.155281, Article 155281

2023

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Atomic layer deposition of pure In2O3 films for a temperature range of 200–300 °C using heteroleptic liquid In(DMAMP)2(OiPr) precursor

Ceramics international, 2020-02, Vol.46 (3), p.3139-3143

2020

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Strategic allocation of two-dimensional van der Waals semiconductor as an oxygen reservoir for boosting resistive switching reliability

Applied surface science, 2022-03, Vol.577, p.151936, Article 151936

2022

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Thermal atomic layer deposition of In2O3 thin films using dimethyl(N-ethoxy-2,2-dimethylcarboxylicpropanamide)indium and H2O

Applied surface science, 2017-10, Vol.419, p.758-763

2017

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Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu

Journal of alloys and compounds, 2016-04, Vol.663, p.651-658

2016

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Atomic layer deposition of indium oxide thin film from a liquid indium complex containing 1-dimethylamino-2-methyl-2-propoxy ligands

Applied surface science, 2016-10, Vol.383, p.1-8

2016

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Synthesis of novel volatile niobium precursors containing carboxamide for Nb2O5 thin films

Polyhedron, 2021-05, Vol.200, p.115134, Article 115134

2021

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Strategy of solution process precursors for phase change memory

Polyhedron, 2020-01, Vol.176, p.114289, Article 114289

2020

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Indium complexes bearing donor-functionalized alkoxide ligands as precursors for indium oxide thin films

Journal of organometallic chemistry, 2017-03, Vol.833, p.43-49

2017

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Tin oxysulfide composite thin films based on atomic layer deposition of tin sulfide and tin oxide using Sn(dmamp)2 as Sn precursor

Ceramics international, 2020-03, Vol.46 (4), p.5109-5118

2020

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Synthesis of noble molybdenum and tungsten complexes for hydrocracking catalyst of heavy oil

Journal of Industrial and Engineering Chemistry, 2019, 72(0), , pp.408-413

2019

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Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex

Applied surface science, 2016-01, Vol.362, p.176-181

2016

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SnO2 thin films grown by atomic layer deposition using a novel Sn precursor

Applied surface science, 2014-11, Vol.320, p.188-194

2014

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Heteroleptic magnesium complexes containing amidinate and aminoalkoxy ligands

Polyhedron, 2015-11, Vol.101, p.185-190

2015

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Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma

Applied surface science, 2015-12, Vol.357, p.672-677

2015

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Synthesis and characterization of Sn complexes containing aminoalkoxide ligands for solution process

Atomic layer deposition of a ruthenium thin film using a precursor with enhanced reactivity

Synthesis and characterization of novel zinc precursors for ZnO thin film deposition by atomic layer deposition

Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition

Highly efficient photocatalytic methylene blue degradation over Sn(O,S)/TiO2 photocatalyst fabricated via powder atomic layer deposition of SnO and subsequent sulfurization

Vinyl-addition copolymerization of norbornene and 1-octene catalyzed by a non-bridged half-titanocene with a tetrazole-phenoxy ligand

Atomic-layer-deposited SnO film using novel Sn(dmamb)2 precursor for p-channel thin film transistor

Phase-controlled SnO2 and SnO growth by atomic layer deposition using Bis(N-ethoxy-2,2-dimethyl propanamido)tin precursor

Simultaneous etching of underlying metal oxide and sulfide thin films during Cu2S atomic layer deposition

Polycrystalline and high purity SnO2 films by plasma-enhanced atomic layer deposition using H2O plasma at very low temperatures of 60–90 °C

High-performance Atomic-Layer-Deposited SnO thin film transistors fabricated by intense pulsed light annealing

Atomic layer deposition of pure In2O3 films for a temperature range of 200–300 °C using heteroleptic liquid In(DMAMP)2(OiPr) precursor

Strategic allocation of two-dimensional van der Waals semiconductor as an oxygen reservoir for boosting resistive switching reliability

Thermal atomic layer deposition of In2O3 thin films using dimethyl(N-ethoxy-2,2-dimethylcarboxylicpropanamide)indium and H2O

Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu

Atomic layer deposition of indium oxide thin film from a liquid indium complex containing 1-dimethylamino-2-methyl-2-propoxy ligands

Synthesis of novel volatile niobium precursors containing carboxamide for Nb2O5 thin films

Strategy of solution process precursors for phase change memory

Indium complexes bearing donor-functionalized alkoxide ligands as precursors for indium oxide thin films

Tin oxysulfide composite thin films based on atomic layer deposition of tin sulfide and tin oxide using Sn(dmamp)2 as Sn precursor

Synthesis of noble molybdenum and tungsten complexes for hydrocracking catalyst of heavy oil

Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex

SnO2 thin films grown by atomic layer deposition using a novel Sn precursor

Heteroleptic magnesium complexes containing amidinate and aminoalkoxy ligands

Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma

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