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3D Manipulation of Protein Microcrystals with Optical Tweezers for X-ray Crystallography

Journal of physics. Conference series, 2013-03, Vol.425 (1), p.12011-4

2013

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Fabrication of solid-state fuel cell based on DNA film

Solid state communications, 2005, Vol.133 (1), p.61-64

2005

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Piezoelectric transformer for cold cathode fluorescent lamp inverter

Japanese Journal of Applied Physics, 1997-05, Vol.36 (5B), p.3050-3052

1997

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Development of a Thermophysical Handy Tester for Non-Destructive Evaluation of Engineering Materials

International journal of thermophysics, 2004-09, Vol.25 (5), p.1597-1610

2004

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Amorphous Refractory Compound Film Material for X-Ray Mask Absorbers

Japanese Journal of Applied Physics, 2000-09, Vol.39 (9R), p.5329

2000

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Study of breakup mechanism of a loosely bound projectile in a region of Coulomb-breakup dominance

EPJ Web of conferences, 2010, Vol.3, p.6010

2010

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Development of high-speed Imaging Plate detector

Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 2001, Vol.467, p.1160-1162

2001

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Multilayer piezoelectric ceramic vibrator with internal electrodes

Japanese Journal of Applied Physics, 1995-09, Vol.34 (9B), p.5270-5272

1995

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Sub-100-nm Device Fabrication using Proximity X-Ray Lithography at Five Levels

Japanese Journal of Applied Physics, 2000-12, Vol.39 (12S), p.6952

2000

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Pattern Etching of Ta X-ray Mask Absorber on SiC Membrane by Inductively Coupled Plasma

Japanese Journal of Applied Physics, 1998-07, Vol.37 (7A), p.L824

1998

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Pattern Fabrication Technique for Ta–Ge Amorphous X-Ray Absorber on a SiC Membrane by Inductively Coupled Plasma

Japanese Journal of Applied Physics, 1999-04, Vol.38 (4R), p.2164

1999

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Precise stress control of Ta absorber using low stress alumina etching mask for X-ray mask fabrication

Japanese Journal of Applied Physics, 1996-12, Vol.35 (12B), p.6463-6468

1996

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Etching Residues of Sputtered Ta Film Using Chlorine-Based Plasma

Japanese Journal of Applied Physics, 1998-02, Vol.37 (2B), p.L251

1998

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High-Performance X-Ray Mask Fabrication Using TaGeN Absorber and Dummy Pattern Method for Sub-100 nm Proximity X-Ray Lithography

Japanese Journal of Applied Physics, 2001-04, Vol.40 (4B), p.L410

2001

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Magnetic properties of multilayered Fe-Si films

Journal of applied physics, 1984-03, Vol.55 (6), p.2238-2240

1984

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Probe-type thin-film head for perpendicular recording using multilayered Fe-Si-Ru films

Journal of applied physics, 1985-04, Vol.57 (8), p.3961-3963

1985

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Overlay evaluation of proximity x-ray lithography in 100 nm device fabrication

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000-11, Vol.18 (6), p.2961-2965

2000

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Probe type thin film head for perpendicular magnetic recording

IEEE transactions on magnetics, 1984-09, Vol.20 (5), p.839-841

1984

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Characteristics of Ta-based amorphous alloy film for x-ray mask absorbers

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 1998-11, Vol.16 (6), p.3495-3499

1998

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Origin of stress distribution in sputtered x-ray absorber film

Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 1997-11, Vol.15 (6), p.2483-2488

1997

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Disturb properties of exchange-coupled composite plated wires

IEEE transactions on magnetics, 1971-09, Vol.7 (3), p.626-628

1971

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Sub-100 nm device fabrication using proximity X-ray lithography at five levels

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387), 2000, p.114-115

2000

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3D Manipulation of Protein Microcrystals with Optical Tweezers for X-ray Crystallography

Fabrication of solid-state fuel cell based on DNA film

Piezoelectric transformer for cold cathode fluorescent lamp inverter

Development of a Thermophysical Handy Tester for Non-Destructive Evaluation of Engineering Materials

Amorphous Refractory Compound Film Material for X-Ray Mask Absorbers

Study of breakup mechanism of a loosely bound projectile in a region of Coulomb-breakup dominance

Development of high-speed Imaging Plate detector

Multilayer piezoelectric ceramic vibrator with internal electrodes

Sub-100-nm Device Fabrication using Proximity X-Ray Lithography at Five Levels

Pattern Etching of Ta X-ray Mask Absorber on SiC Membrane by Inductively Coupled Plasma

Pattern Fabrication Technique for Ta–Ge Amorphous X-Ray Absorber on a SiC Membrane by Inductively Coupled Plasma

Precise stress control of Ta absorber using low stress alumina etching mask for X-ray mask fabrication

Etching Residues of Sputtered Ta Film Using Chlorine-Based Plasma

High-Performance X-Ray Mask Fabrication Using TaGeN Absorber and Dummy Pattern Method for Sub-100 nm Proximity X-Ray Lithography

Magnetic properties of multilayered Fe-Si films

Probe-type thin-film head for perpendicular recording using multilayered Fe-Si-Ru films

Overlay evaluation of proximity x-ray lithography in 100 nm device fabrication

Probe type thin film head for perpendicular magnetic recording

Characteristics of Ta-based amorphous alloy film for x-ray mask absorbers

Origin of stress distribution in sputtered x-ray absorber film

Disturb properties of exchange-coupled composite plated wires

Sub-100 nm device fabrication using proximity X-ray lithography at five levels

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