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SiO2@TiO2 Coating: Synthesis, Physical Characterization and Photocatalytic Evaluation

Coatings (Basel), 2018-04, Vol.8 (4), p.120

2018

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Capillary Force Lithography: Fabrication of Functional Polymer Templates as Versatile Tools for Nanolithography

Advanced functional materials, 2006-08, Vol.16 (12), p.1555-1565

2006

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State of the art of TiO2 containing cementitious materials: self-cleaning properties

Materiales de construcción (Madrid), 2010-01, Vol.60 (298), p.33-50

2010

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Studies on passivation behavior of tungsten in application to chemical mechanical polishing

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1999-07, Vol.17 (4), p.1168-1173

1999

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Thermochromic Vanadium Oxide Coatings Grown by APCVD at Low Temperatures

Physics procedia, 2013, Vol.46, p.137-141

2013

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Super-Hydrophobic and Oloephobic Crystalline Coatings by Initiated Chemical Vapor Deposition

Physics procedia, 2013, Vol.46, p.56-61

2013

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Raman Characterisation of Diamond Coatings Using Different Laser Wavelengths

Physics procedia, 2013, Vol.46, p.71-78

2013

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Technology and Application of Transition Metal Oxide of W-V-O as Functional Layers and NiO Thin Films as Counter Electrode Material in Electrochromic “Smart Windows”

Physics procedia, 2013, Vol.46, p.149-158

2013

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Thermodynamic Analysis and Growth of Zirconium Carbide by Chemical Vapor Deposition

Physics procedia, 2013, Vol.46, p.88-101

2013

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Growth of Boron Nitride on (0001) AlN Templates by High Temperature-Hydride Vapor Phase Epitaxy (HT-HVPE)

Physics procedia, 2013, Vol.46, p.102-106

2013

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High Power Pulsed Plasma Enhanced Chemical Vapor Deposition: A Brief Overview of General Concepts and Early Results

Physics procedia, 2013, Vol.46, p.3-11

2013

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In Situ Deposition Monitoring by a Tilted Fiber Bragg Grating Optical Probe: Probing Nucleation in Chemical Vapour Deposition of Gold

Physics procedia, 2013, Vol.46, p.12-20

2013

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Thin Film Optical Coatings of Vanadium Oxide and Mixed Tungsten/Vanadium Oxide Deposited by APCVD Employing Precursors of Vanadyl Acetylacetonate and a Mixture with Tungsten Hexacarbonyl

Physics procedia, 2013, Vol.46, p.127-136

2013

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Electric and Ferro-Electric Behaviour of Polymer-Coated Graphene-Oxide Thin Film

Physics procedia, 2013, Vol.46, p.62-70

2013

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Patterned PPy Polymer and PPy/Ag Nanocomposites Thin Films by Photo-DLICVD

Physics procedia, 2013, Vol.46, p.46-55

2013

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New Heteroleptic Copper(II) Complexes as MOCVD Precursors

Physics procedia, 2013, Vol.46, p.174-182

2013

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Bis(trimethylsilyl)Ethylamine: Synthesis, Properties and its use as CVD Precursor

Physics procedia, 2013, Vol.46, p.209-218

2013

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The Influence of F-Doping in SnO2 Thin Films

Physics procedia, 2013, Vol.46, p.159-166

2013

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Silicon Chemical Vapor Deposition Process Using a Half-Inch Silicon Wafer for Minimal Manufacturing System

Physics procedia, 2013, Vol.46, p.230-238

2013

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A Comparative Study of a Series of Dimethylgold(III) Complexes with S,S Chelating Ligands Used as MOCVD Precursors

Physics procedia, 2013, Vol.46, p.167-173

2013

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Low Pressure Chemical Vapour Deposition of Crystalline Ga2Te3 and Ga2Se3 Thin Films from Single Source Precursors Using Telluroether and Selenoether Complexes

Physics procedia, 2013, Vol.46, p.142-148

2013

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Pulsed Direct liquid Injection ALD of TiO2 Films Using Titanium Tetraisopropoxide Precursor

Physics procedia, 2013, Vol.46, p.33-39

2013

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The Use of Additives to Control the Morphology of Thin Films Synthesized Using Aerosol Assisted Chemical Vapour Deposition

Physics procedia, 2013, Vol.46, p.21-26

2013

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Design of Ordered Wrinkled Patterns with Dynamically Tuned Properties

Physics procedia, 2013, Vol.46, p.40-45

2013

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Multifunctional Manganese Single Source Precursor for the Selective Deposition of MnF2 or Mn3O4

Physics procedia, 2013, Vol.46, p.118-126

2013

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SiO2@TiO2 Coating: Synthesis, Physical Characterization and Photocatalytic Evaluation

Capillary Force Lithography: Fabrication of Functional Polymer Templates as Versatile Tools for Nanolithography

State of the art of TiO2 containing cementitious materials: self-cleaning properties

Studies on passivation behavior of tungsten in application to chemical mechanical polishing

Thermochromic Vanadium Oxide Coatings Grown by APCVD at Low Temperatures

Super-Hydrophobic and Oloephobic Crystalline Coatings by Initiated Chemical Vapor Deposition

Raman Characterisation of Diamond Coatings Using Different Laser Wavelengths

Technology and Application of Transition Metal Oxide of W-V-O as Functional Layers and NiO Thin Films as Counter Electrode Material in Electrochromic “Smart Windows”

Thermodynamic Analysis and Growth of Zirconium Carbide by Chemical Vapor Deposition

Growth of Boron Nitride on (0001) AlN Templates by High Temperature-Hydride Vapor Phase Epitaxy (HT-HVPE)

High Power Pulsed Plasma Enhanced Chemical Vapor Deposition: A Brief Overview of General Concepts and Early Results

In Situ Deposition Monitoring by a Tilted Fiber Bragg Grating Optical Probe: Probing Nucleation in Chemical Vapour Deposition of Gold

Thin Film Optical Coatings of Vanadium Oxide and Mixed Tungsten/Vanadium Oxide Deposited by APCVD Employing Precursors of Vanadyl Acetylacetonate and a Mixture with Tungsten Hexacarbonyl

Electric and Ferro-Electric Behaviour of Polymer-Coated Graphene-Oxide Thin Film

Patterned PPy Polymer and PPy/Ag Nanocomposites Thin Films by Photo-DLICVD

New Heteroleptic Copper(II) Complexes as MOCVD Precursors

Bis(trimethylsilyl)Ethylamine: Synthesis, Properties and its use as CVD Precursor

The Influence of F-Doping in SnO2 Thin Films

Silicon Chemical Vapor Deposition Process Using a Half-Inch Silicon Wafer for Minimal Manufacturing System

A Comparative Study of a Series of Dimethylgold(III) Complexes with S,S Chelating Ligands Used as MOCVD Precursors

Low Pressure Chemical Vapour Deposition of Crystalline Ga2Te3 and Ga2Se3 Thin Films from Single Source Precursors Using Telluroether and Selenoether Complexes

Pulsed Direct liquid Injection ALD of TiO2 Films Using Titanium Tetraisopropoxide Precursor

The Use of Additives to Control the Morphology of Thin Films Synthesized Using Aerosol Assisted Chemical Vapour Deposition

Design of Ordered Wrinkled Patterns with Dynamically Tuned Properties

Multifunctional Manganese Single Source Precursor for the Selective Deposition of MnF2 or Mn3O4

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