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Carbon nanotube growth mechanism switches from tip- to base-growth with decreasing catalyst particle size

Carbon (New York), 2008-08, Vol.46 (10), p.1331-1338

2008

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Plasma investigations and deposition of Me-DLC (Me = Al, Ti or Nb) obtained by a magnetron sputtering-RFPECVD hybrid process

Surface & coatings technology, 2018-11, Vol.354, p.351-359

2018

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Kinetics of plasma species and their ionization in short-HiPIMS by particle modeling

Surface & coatings technology, 2014-09, Vol.255, p.52-61

2014

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Extracted current saturation in negative ion sources

Journal of applied geophysics, 2012-06, Vol.111 (11), p.113303-113303-10

2012

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Improving HiPIMS deposition rates by hybrid RF/HiPIMS co-sputtering, and its relevance for NbSi films

Surface & coatings technology, 2014-07, Vol.250, p.32-36

2014

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The role of oxygen in magnetron-sputtered Ta3N5 thin films for the photoelectrolysis of water

Surface & coatings technology, 2017-09, Vol.324, p.620-625

2017

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Interface study between nanostructured tantalum nitride films and carbon nanotubes grown by chemical vapour deposition

Applied surface science, 2014-10, Vol.315, p.510-515

2014

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Microstructure and properties of the compound layer obtained by pulsed plasma nitriding in steel gears

Surface & coatings technology, 2009-02, Vol.203 (10), p.1457-1461

2009

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Experimental realization and numerical simulation of wavelength-modulated fibre optic sensor based on surface plasmon resonance

Sensors and actuators. B, Chemical, 2007-09, Vol.126 (1), p.198-203

2007

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The European contribution to the development of the ITER NB injector

Fusion engineering and design, 2011-10, Vol.86 (6), p.860-863

2011

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Nanostructured tantalum nitride films as buffer-layer for carbon nanotube growth

Thin solid films, 2011-04, Vol.519 (12), p.4097-4100

2011

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Single chamber PVD/PECVD process for in situ control of the catalyst activity on carbon nanotubes growth

Surface & coatings technology, 2005-10, Vol.200 (1-4), p.1101-1105

2005

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Early stages of the carbon nanotube growth by low pressure CVD and PE-CVD

Diamond and related materials, 2009, Vol.18 (1), p.61-65

2009

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Effect of tantalum nitride supporting layer on growth and morphology of carbon nanotubes by thermal chemical vapor deposition

Diamond and related materials, 2011-07, Vol.20 (7), p.999-1004

2011

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Temperature effect on the nitrogen insertion in carbon nitride films deposited by ECR

Diamond and related materials, 2009-09, Vol.18 (9), p.1091-1097

2009

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Tantalum based coated substrates for controlling the diameter of carbon nanotubes

Carbon (New York), 2009-12, Vol.47 (15), p.3424-3426

2009

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Comparative study of the structure of a-CNx and a-CNx:H films using NEXAFS, XPS and FT-IR analysis

Thin solid films, 2005-06, Vol.482 (1-2), p.156-166

2005

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Comparative study of different process steps for the near-field optical probes manufacturing

Ultramicroscopy, 2007-10, Vol.107 (10), p.1042-1047

2007

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Impact of the Cu-based substrates and catalyst deposition techniques on carbon nanotube growth at low temperature by PECVD

Microelectronic engineering, 2007-11, Vol.84 (11), p.2501-2505

2007

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Growth kinetics of low temperature single-wall and few walled carbon nanotubes grown by plasma enhanced chemical vapor deposition

Physica. E, Low-dimensional systems & nanostructures, 2007, Vol.37 (1), p.34-39

2007

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Limits of the PECVD process for single wall carbon nanotubes growth

Chemical physics letters, 2006-04, Vol.421 (1), p.242-245

2006

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EELS and NEXAFS structural investigations on the effects of the nitrogen incorporation in a-CNx films deposited by r.f. magnetron sputtering

Diamond and related materials, 2004-04, Vol.13 (4-8), p.1433-1436

2004

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Template synthesis of carbon nanotubes from porous alumina matrix on silicon

Microelectronic engineering, 2006-11, Vol.83 (11), p.2432-2436

2006

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Model for power coupled to RF planar magnetrons. Experimental validation and application to CNx thin film deposition

Surface & coatings technology, 2003-09, Vol.174-175, p.49-54

2003

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Oxygen incorporated during deposition determines the crystallinity of magnetron-sputtered Ta3N5 films

Thin solid films, 2019-09, Vol.685, p.204-209

2019

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Carbon nanotube growth mechanism switches from tip- to base-growth with decreasing catalyst particle size

Plasma investigations and deposition of Me-DLC (Me = Al, Ti or Nb) obtained by a magnetron sputtering-RFPECVD hybrid process

Kinetics of plasma species and their ionization in short-HiPIMS by particle modeling

Extracted current saturation in negative ion sources

Improving HiPIMS deposition rates by hybrid RF/HiPIMS co-sputtering, and its relevance for NbSi films

The role of oxygen in magnetron-sputtered Ta3N5 thin films for the photoelectrolysis of water

Interface study between nanostructured tantalum nitride films and carbon nanotubes grown by chemical vapour deposition

Microstructure and properties of the compound layer obtained by pulsed plasma nitriding in steel gears

Experimental realization and numerical simulation of wavelength-modulated fibre optic sensor based on surface plasmon resonance

The European contribution to the development of the ITER NB injector

Nanostructured tantalum nitride films as buffer-layer for carbon nanotube growth

Single chamber PVD/PECVD process for in situ control of the catalyst activity on carbon nanotubes growth

Early stages of the carbon nanotube growth by low pressure CVD and PE-CVD

Effect of tantalum nitride supporting layer on growth and morphology of carbon nanotubes by thermal chemical vapor deposition

Temperature effect on the nitrogen insertion in carbon nitride films deposited by ECR

Tantalum based coated substrates for controlling the diameter of carbon nanotubes

Comparative study of the structure of a-CNx and a-CNx:H films using NEXAFS, XPS and FT-IR analysis

Comparative study of different process steps for the near-field optical probes manufacturing

Impact of the Cu-based substrates and catalyst deposition techniques on carbon nanotube growth at low temperature by PECVD

Growth kinetics of low temperature single-wall and few walled carbon nanotubes grown by plasma enhanced chemical vapor deposition

Limits of the PECVD process for single wall carbon nanotubes growth

EELS and NEXAFS structural investigations on the effects of the nitrogen incorporation in a-CNx films deposited by r.f. magnetron sputtering

Template synthesis of carbon nanotubes from porous alumina matrix on silicon

Model for power coupled to RF planar magnetrons. Experimental validation and application to CNx thin film deposition

Oxygen incorporated during deposition determines the crystallinity of magnetron-sputtered Ta3N5 films

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