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Rare earth silicate environmental barrier coatings for SiC/SiC composites and Si3N4 ceramics

Journal of the European Ceramic Society, 2005, Vol.25 (10), p.1705-1715

2005

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Mechanical bending of flexible complementary inverters based on organic and oxide thin film transistors

Organic electronics, 2012-11, Vol.13 (11), p.2401-2405

2012

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Etching characteristics of silicon oxide using amorphous carbon hard mask in dual-frequency capacitively coupled plasma

Thin solid films, 2012-10, Vol.521, p.83-88

2012

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Fabrication of the ZnO thin films using wet-chemical etching processes on application for organic light emitting diode (OLED) devices

Surface & coatings technology, 2008-08, Vol.202 (22-23), p.5476-5479

2008

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Deep dry etching of borosilicate glass using SF6 and SF6/Ar inductively coupled plasmas

Microelectronic engineering, 2005-10, Vol.82 (2), p.119-128

2005

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Spontaneous growth mechanism of tin whiskers

Acta materialia, 1998-06, Vol.46 (10), p.3701-3714

1998

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Non-metallic inclusion and intragranular nucleation of ferrite in Ti-killed C–Mn steel

Acta materialia, 2003-04, Vol.51 (6), p.1593-1606

2003

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Organic field-effect transistor with extended indium tin oxide gate structure for selective pH sensing

Organic electronics, 2011-11, Vol.12 (11), p.1815-1821

2011

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Analysis of deformation textures of asymmetrically rolled aluminum sheets

Acta materialia, 2001-08, Vol.49 (13), p.2583-2595

2001

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Fast release process of metal structure using chemical dry etching of sacrificial Si layer

Thin solid films, 2011-08, Vol.519 (20), p.6769-6772

2011

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Mullite–gadolinium silicate environmental barrier coatings for melt infiltrated SiC/SiC composites

Surface & coatings technology, 2011-03, Vol.205 (12), p.3578-3581

2011

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Effects of different electroplated gate electrodes on electrical performances of flexible organic thin film transistor and flexibility improvement

Organic electronics, 2007-10, Vol.8 (5), p.513-521

2007

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Slurry based multilayer environmental barrier coatings for silicon carbide and silicon nitride ceramics — II. Oxidation resistance

Surface & coatings technology, 2010-10, Vol.205 (2), p.266-270

2010

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Drift and diffusion of a confined semiflexible chain

The European physical journal. E, Soft matter and biological physics, 2010-06, Vol.32 (2), p.119-126

2010

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Slurry based multilayer environmental barrier coatings for silicon carbide and silicon nitride ceramics — I. Processing

Surface & coatings technology, 2010-10, Vol.205 (2), p.258-265

2010

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The effects of gas flow rates on the etch characteristics of silicon nitride with an extreme ultra-violet resist pattern in CH2F2/N2/Ar capacitively coupled plasmas

Thin solid films, 2011-08, Vol.519 (20), p.6741-6745

2011

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Etching characteristics of ZnO thin films in chlorine-containing inductively coupled plasmas

Microelectronic engineering, 2006-02, Vol.83 (2), p.328-335

2006

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Effect of electron–electron scattering at an elevated temperature on device lifetime of nanoscale nMOSFETs

Microelectronics and reliability, 2012-09, Vol.52 (9-10), p.1905-1908

2012

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Highly selective dry etching of alternating phase-shift mask (PSM) structures for extreme ultraviolet lithography (EUVL) using inductively coupled plasmas (ICP)

Thin solid films, 2009-05, Vol.517 (14), p.3938-3941

2009

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Improvement of mechanical and electrical stabilities of flexible organic thin film transistor by using adhesive organic interlayer

Organic electronics, 2008-06, Vol.9 (3), p.413-417

2008

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Micro-scale metallization of high aspect-ratio Cu and Au lines on flexible polyimide substrate by electroplating using SU-8 photoresist mask

Microelectronic engineering, 2005-02, Vol.77 (2), p.116-124

2005

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Electro-Mechanical Property Investigation of Striated REBCO Coated Conductor Tapes in Pure Torsion Mode

IEEE transactions on applied superconductivity, 2011-06, Vol.21 (3), p.2997-3000

2011

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Oxidation and corrosion of ceramics and ceramic matrix composites

Current opinion in solid state & materials science, 2001-08, Vol.5 (4), p.301-309

2001

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Key Durability Issues With Mullite-Based Environmental Barrier Coatings for Si-Based Ceramics

Journal of engineering for gas turbines and power, 2000-10, Vol.122 (4), p.632-636

Lee, Kang N.

2000

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Comparison of etching characteristics of SiO2 with ArF photoresist in C4F6 and C4F8 based dual-frequency superimposed capacitively coupled plasmas

Microelectronic engineering, 2007, Vol.84 (1), p.165-172

2007

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Rare earth silicate environmental barrier coatings for SiC/SiC composites and Si3N4 ceramics

Mechanical bending of flexible complementary inverters based on organic and oxide thin film transistors

Etching characteristics of silicon oxide using amorphous carbon hard mask in dual-frequency capacitively coupled plasma

Fabrication of the ZnO thin films using wet-chemical etching processes on application for organic light emitting diode (OLED) devices

Deep dry etching of borosilicate glass using SF6 and SF6/Ar inductively coupled plasmas

Spontaneous growth mechanism of tin whiskers

Non-metallic inclusion and intragranular nucleation of ferrite in Ti-killed C–Mn steel

Organic field-effect transistor with extended indium tin oxide gate structure for selective pH sensing

Analysis of deformation textures of asymmetrically rolled aluminum sheets

Fast release process of metal structure using chemical dry etching of sacrificial Si layer

Mullite–gadolinium silicate environmental barrier coatings for melt infiltrated SiC/SiC composites

Effects of different electroplated gate electrodes on electrical performances of flexible organic thin film transistor and flexibility improvement

Slurry based multilayer environmental barrier coatings for silicon carbide and silicon nitride ceramics — II. Oxidation resistance

Drift and diffusion of a confined semiflexible chain

Slurry based multilayer environmental barrier coatings for silicon carbide and silicon nitride ceramics — I. Processing

The effects of gas flow rates on the etch characteristics of silicon nitride with an extreme ultra-violet resist pattern in CH2F2/N2/Ar capacitively coupled plasmas

Etching characteristics of ZnO thin films in chlorine-containing inductively coupled plasmas

Effect of electron–electron scattering at an elevated temperature on device lifetime of nanoscale nMOSFETs

Highly selective dry etching of alternating phase-shift mask (PSM) structures for extreme ultraviolet lithography (EUVL) using inductively coupled plasmas (ICP)

Improvement of mechanical and electrical stabilities of flexible organic thin film transistor by using adhesive organic interlayer

Micro-scale metallization of high aspect-ratio Cu and Au lines on flexible polyimide substrate by electroplating using SU-8 photoresist mask

Electro-Mechanical Property Investigation of Striated REBCO Coated Conductor Tapes in Pure Torsion Mode

Oxidation and corrosion of ceramics and ceramic matrix composites

Key Durability Issues With Mullite-Based Environmental Barrier Coatings for Si-Based Ceramics

Comparison of etching characteristics of SiO2 with ArF photoresist in C4F6 and C4F8 based dual-frequency superimposed capacitively coupled plasmas

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