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Scanning tunneling microscopy single atom/molecule manipulation and its application to nanoscience and technology

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2005-07, Vol.23 (4), p.1351-1360

Hla, Saw-Wai

2005

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Advanced chemical vapor deposition silicon carbide barrier technology for ultralow permeability applications

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2006-09, Vol.24 (5), p.1706-1713

2006

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Focused ion beam technology and applications

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1987-03, Vol.5 (2), p.469-495

Melngailis, John

1987

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Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2020-05, Vol.38 (3)

2020

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Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2003-11, Vol.21 (6), p.2231-2261

Kim, H.

2003

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Atomic layer deposited ultrathin metal nitride barrier layers for ruthenium interconnect applications

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2017-05, Vol.35 (3)

2017

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Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2017-07, Vol.35 (4)

2017

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Room temperature atomic layer deposition of niobium oxide using plasma excited humidified argon and its application to anticorrosion to hydrochloric acid

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2019-12, Vol.37 (6)

2019

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Electron emission theory and its application: Fowler–Nordheim equation and beyond

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2003-07, Vol.21 (4), p.1528-1544

Jensen, Kevin L.

2003

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Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2018-01, Vol.36 (1)

2018

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Surface passivation of GaN and GaN/AlGaN heterostructures by dielectric films and its application to insulated-gate heterostructure transistors

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2003-07, Vol.21 (4), p.1828-1838

2003

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Characterization of low temperature deposited atomic layer deposition TiO2 for MEMS applications

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2013-01, Vol.31 (1)

2013

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Highly textured growth of AlN films on sapphire by magnetron sputtering for high temperature surface acoustic wave applications

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2011-03, Vol.29 (2), p.021010-021010-6

2011

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Undoped TiO2 and nitrogen-doped TiO2 thin films deposited by atomic layer deposition on planar and architectured surfaces for photovoltaic applications

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2015-01, Vol.33 (1)

2015

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Reproducible resistive switching in nonstoichiometric nickel oxide films grown by rf reactive sputtering for resistive random access memory applications

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2005-09, Vol.23 (5), p.1309-1313

2005

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Surface oxidation of GaN(0001): Nitrogen plasma-assisted cleaning for ultrahigh vacuum applications

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2014-09, Vol.32 (5)

2014

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Mechanics of human voice production and control

The Journal of the Acoustical Society of America, 2016-10, Vol.140 (4), p.2614-2635

Zhang, Zhaoyan

2016

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Applications of microfabrication technology to x‐ray laser cavities

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1988-11, Vol.6 (6), p.2153-2157

1988

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Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applications

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2012-07, Vol.30 (4), p.041501-041501-5

2012

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Recent developments and applications of plasma immersion ion implantation

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2004-01, Vol.22 (1), p.289-296

Chu, Paul K.

2004

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Towards understanding epitaxial growth of alternative high- K dielectrics on Si(001): Application to praseodymium oxide

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2003-07, Vol.21 (4), p.1765-1772

2003

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Microplasma-assisted growth of colloidal Ag nanoparticles for point-of-use surface-enhanced Raman scattering applications

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2010-07, Vol.28 (4), p.L5-L8

2010

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Atmospheric-pressure low-temperature plasma processes for thin film deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2014-05, Vol.32 (3)

2014

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High rate deep Si etching for through-silicon via applications

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2011-03, Vol.29 (2), p.021009-021009-6

2011

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Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2012-01, Vol.30 (1)

2012

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Scanning tunneling microscopy single atom/molecule manipulation and its application to nanoscience and technology

Advanced chemical vapor deposition silicon carbide barrier technology for ultralow permeability applications

Focused ion beam technology and applications

Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition

Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing

Atomic layer deposited ultrathin metal nitride barrier layers for ruthenium interconnect applications

Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications

Room temperature atomic layer deposition of niobium oxide using plasma excited humidified argon and its application to anticorrosion to hydrochloric acid

Electron emission theory and its application: Fowler–Nordheim equation and beyond

Room-temperature plasma enhanced atomic layer deposition of aluminum silicate and its application in dye-sensitized solar cells

Surface passivation of GaN and GaN/AlGaN heterostructures by dielectric films and its application to insulated-gate heterostructure transistors

Characterization of low temperature deposited atomic layer deposition TiO2 for MEMS applications

Highly textured growth of AlN films on sapphire by magnetron sputtering for high temperature surface acoustic wave applications

Undoped TiO2 and nitrogen-doped TiO2 thin films deposited by atomic layer deposition on planar and architectured surfaces for photovoltaic applications

Reproducible resistive switching in nonstoichiometric nickel oxide films grown by rf reactive sputtering for resistive random access memory applications

Surface oxidation of GaN(0001): Nitrogen plasma-assisted cleaning for ultrahigh vacuum applications

Mechanics of human voice production and control

Applications of microfabrication technology to x‐ray laser cavities

Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applications

Recent developments and applications of plasma immersion ion implantation

Towards understanding epitaxial growth of alternative high- K dielectrics on Si(001): Application to praseodymium oxide

Microplasma-assisted growth of colloidal Ag nanoparticles for point-of-use surface-enhanced Raman scattering applications

Atmospheric-pressure low-temperature plasma processes for thin film deposition

High rate deep Si etching for through-silicon via applications

Charge trapping characteristics of Au nanocrystals embedded in remote plasma atomic layer-deposited Al2O3 film as the tunnel and blocking oxides for nonvolatile memory applications

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