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Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2008-03, Vol.26 (2), p.495-501

2008

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Atomic layer deposited ultrathin metal nitride barrier layers for ruthenium interconnect applications

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2017-05, Vol.35 (3)

2017

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Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2017-07, Vol.35 (4)

2017

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Room temperature atomic layer deposition of niobium oxide using plasma excited humidified argon and its application to anticorrosion to hydrochloric acid

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2019-12, Vol.37 (6)

2019

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Review Article—Dielectrophoresis: Status of the theory, technology, and applications

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Synthesis, properties, and applications of silicon nanocrystals

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3D-printed microfluidics on thin poly(methyl methacrylate) substrates for genetic applications

Simple O-ring sealed Brewster-angle window for ultrahigh vacuum applications

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Highly stable carbon nanotube cathode for electron beam application

Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition

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Growth and characterization of GaAs1−x−ySbxNy/GaAs heterostructures for multijunction solar cell applications

Finite-temperature second-order many-body perturbation and Hartree-Fock theories for one-dimensional solids: an application to Peierls and charge-density-wave transitions in conjugated polymers

Passivation of InGaAs interface states by thin AlN interface layers for metal-insulator-semiconductor applications

Simple colloidal lithography method to fabricate large-area moth-eye antireflective structures on Si, Ge, and GaAs for IR applications

Optical and electrical properties of amorphous zinc tin oxide thin films examined for thin film transistor application

Atomic layer deposited ultrathin metal nitride barrier layers for ruthenium interconnect applications

Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications

Room temperature atomic layer deposition of niobium oxide using plasma excited humidified argon and its application to anticorrosion to hydrochloric acid

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