UB Paderborn / Katalog / Suche / in CDI

1 – 25 von 58

Sortiert nach

Lehren und Lernen - Tipps aus der Praxis

Fouckhardt, Henning

2nd Aufl 2021st edition, 2021

Volltextzugriff (PDF)

In-situ etch-depth control better than 5 nm with reflectance anisotropy spectroscopy (RAS) equipment during reactive ion etching (RIE): A technical RAS application

AIP advances, 2019-07, Vol.9 (7), p.075116-075116-6

2019

Volltextzugriff (PDF)

In Situ and Real-Time Monitoring of Doping Levels by Reflectance Anisotropy Spectroscopy (RAS) during Molecular Beam Epitaxial (MBE) Growth of III/V Semiconductors

Advances in materials science and engineering, 2023, Vol.2023, p.1-12

2023

Volltextzugriff (PDF)

Theory, simulation, fabrication, and characterization of Galois scattering plates for the optical and the THz spectral range

AIP advances, 2021-06, Vol.11 (6), p.065130-065130-10

2021

Volltextzugriff (PDF)

Reactive Ion Etching (RIE) Induced Surface Roughness Precisely Monitored In-Situ and in Real Time by Reflectance Anisotropy Spectroscopy (RAS) in Combination with Principle Component Analysis (PCA)

Advances in materials science and engineering, 2022, Vol.2022, p.1-7

2022

Volltextzugriff (PDF)

Lithography-Free Technology for the Preparation of Digital Microfluidic (DMF) Lab-Chips with Droplet Actuation by Optoelectrowetting (OEW)

International journal of analytical chemistry, 2022, Vol.2022, p.1-6

2022

Volltextzugriff (PDF)

Microdroplet Actuation via Light Line Optoelectrowetting (LL-OEW)

International journal of analytical chemistry, 2021-12, Vol.2021, p.3402411-9

2021

Volltextzugriff (PDF)

Doped or Quantum-Dot Layers as In Situ Etch-Stop Indicators for III/V Semiconductor Reactive Ion Etching (RIE) Using Reflectance Anisotropy Spectroscopy (RAS)

Micromachines (Basel), 2021-04, Vol.12 (5), p.502

2021

Volltextzugriff (PDF)

Epitaxial Growth of Optoelectronically Active Ga(As)Sb Quantum Dots on Al-Rich AlGaAs with GaAs Capsule Layers

Advances in materials science and engineering, 2021, Vol.2021 (1)

2021

Volltextzugriff (PDF)

Precise in situ etch depth control of multilayered III-V semiconductor samples with reflectance anisotropy spectroscopy (RAS) equipment

Beilstein journal of nanotechnology, 2016, Vol.7 (1), p.1783-1793

2016

Volltextzugriff (PDF)

Deep wet etching of fused silica glass for hollow capillary optical leaky waveguides in microfluidic devices

Journal of micromechanics and microengineering, 2001-05, Vol.11 (3), p.257-262

2001

Volltextzugriff (PDF)

Fundamental Transverse Mode Selection (TMS#0) of Broad Area Semiconductor Lasers with Integrated Twice-Retracted 4f Set-Up and Film-Waveguide Lens

Advances in OptoElectronics (Hindawi), 2017-01, Vol.2017

2017

Volltextzugriff (PDF)

Combination of Transverse Mode Selection and Active Longitudinal Mode-Locking of Broad Area Semiconductor Lasers

Advances in OptoElectronics (Hindawi), 2014-01, Vol.2014, p.1-5

2014

Volltextzugriff (PDF)

Reflectance anisotropy spectroscopy (RAS) for in-situ identification of roughness morphologies evolving during reactive ion etching (RIE)

Applied surface science, 2023-02, Vol.611, p.155769, Article 155769

2023

Volltextzugriff (PDF)

Halbleiterlaser: unter Verwendung Fourier-optischer Methoden

Fouckhardt, Henning

2011st edition, 2011

Volltextzugriff (PDF)

Optoelectrowetting (OEW) with push-actuation of microdroplets at small frequencies and OEW equations revisited

Sensors and actuators. A. Physical., 2022-02, Vol.334, p.113331, Article 113331

2022

Volltextzugriff (PDF)

Dense lying self-organized GaAsSb quantum dots on GaAs for efficient lasers

Beilstein journal of nanotechnology, 2011-06, Vol.2 (1), p.333-338

2011

Volltextzugriff (PDF)

Interferometric in-situ III/V semiconductor dry-etch depth-control with ±0.8 nm best accuracy using a quadruple-Vernier-scale measurement

Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2021-09, Vol.39 (5)

2021

Volltextzugriff (PDF)

High shape-accuracy of surface roughnesses upon nano-moulding with optical elastomers

Optical materials, 2021-08, Vol.118, p.111230, Article 111230

2021

Volltextzugriff (PDF)

Lithography-Free Technology for the Preparation of Digital Microfluidic

International journal of analytical chemistry, 2022-05, Vol.2022

2022

Volltextzugriff (PDF)

Photonik: Eine Einführung in die integrierte Optoelektronik und technische Optik

Fouckhardt, Henning

1994

Volltextzugriff (PDF)

Photonik: Eine Einfuhrung in die integrierte Optoelektronik und technische Optik

Fouckhardt, Henning

1994th edition, 2013

Volltextzugriff (PDF)

Glass surface modification by lithography-free reactive ion etching in an Ar/CF4-plasma for controlled diffuse optical scattering

Surface & coatings technology, 2011-07, Vol.205, p.S419-S424

2011

Volltextzugriff (PDF)

Evanescent-field fiber sensor for the water content in lubricating oils with sensitivity increase by dielectrophoresis

Sensors and actuators. A. Physical., 2012-09, Vol.184, p.93-97

2012

Volltextzugriff (PDF)

An improved shooting approach for solving the time-independent Schrödinger equation for III/V QW structures

Physics letters. A, 2001-07, Vol.286 (2), p.199-204

2001

Volltextzugriff (PDF)

1 – 25 von 58

Suche als RSS-Feed

Aktive Filter

KollektioneBooks on EBSCOhost

PublikationsformBuchkapitel

Suchergebnisse filtern

Filter anzeigen

Nur zeigen

Geprüft (Peer-Review)
(45)
Mit Volltextzugriff
(57)

Publikationsform

Sprache

Erscheinungsjahr

n.n

Thema

Science & Technology
(38)
Technology
(33)
Physics
(27)
Physical Sciences
(26)
Engineering
(22)
Physics, Applied
(20)
Engineering, Electrical & Electronic
(19)
Materials Science
(15)
Nanoscience & Nanotechnology
(11)
Science & Technology - Other Topics
(11)
Optics
(10)
Exact Sciences And Technology
(9)
Materials Science, Multidisciplinary
(9)
Quantum Dots
(9)
Reflectance Anisotropy Spectroscopy
(9)
Lasers
(8)
Anisotropy
(7)
Etching
(7)
Molecular Beam Epitaxy
(7)
Reactive Ion Etching
(7)

15 weitere anzeigen...

Weniger anzeigen...

Menü

Weitere Dienste

Einstellungen

Lehren und Lernen - Tipps aus der Praxis

In-situ etch-depth control better than 5 nm with reflectance anisotropy spectroscopy (RAS) equipment during reactive ion etching (RIE): A technical RAS application

In Situ and Real-Time Monitoring of Doping Levels by Reflectance Anisotropy Spectroscopy (RAS) during Molecular Beam Epitaxial (MBE) Growth of III/V Semiconductors

Theory, simulation, fabrication, and characterization of Galois scattering plates for the optical and the THz spectral range

Reactive Ion Etching (RIE) Induced Surface Roughness Precisely Monitored In-Situ and in Real Time by Reflectance Anisotropy Spectroscopy (RAS) in Combination with Principle Component Analysis (PCA)

Lithography-Free Technology for the Preparation of Digital Microfluidic (DMF) Lab-Chips with Droplet Actuation by Optoelectrowetting (OEW)

Microdroplet Actuation via Light Line Optoelectrowetting (LL-OEW)

Doped or Quantum-Dot Layers as In Situ Etch-Stop Indicators for III/V Semiconductor Reactive Ion Etching (RIE) Using Reflectance Anisotropy Spectroscopy (RAS)

Epitaxial Growth of Optoelectronically Active Ga(As)Sb Quantum Dots on Al-Rich AlGaAs with GaAs Capsule Layers

Precise in situ etch depth control of multilayered III-V semiconductor samples with reflectance anisotropy spectroscopy (RAS) equipment

Deep wet etching of fused silica glass for hollow capillary optical leaky waveguides in microfluidic devices

Fundamental Transverse Mode Selection (TMS#0) of Broad Area Semiconductor Lasers with Integrated Twice-Retracted 4f Set-Up and Film-Waveguide Lens

Combination of Transverse Mode Selection and Active Longitudinal Mode-Locking of Broad Area Semiconductor Lasers

Reflectance anisotropy spectroscopy (RAS) for in-situ identification of roughness morphologies evolving during reactive ion etching (RIE)

Halbleiterlaser: unter Verwendung Fourier-optischer Methoden

Optoelectrowetting (OEW) with push-actuation of microdroplets at small frequencies and OEW equations revisited

Dense lying self-organized GaAsSb quantum dots on GaAs for efficient lasers

Interferometric in-situ III/V semiconductor dry-etch depth-control with ±0.8 nm best accuracy using a quadruple-Vernier-scale measurement

High shape-accuracy of surface roughnesses upon nano-moulding with optical elastomers

Lithography-Free Technology for the Preparation of Digital Microfluidic

Photonik: Eine Einführung in die integrierte Optoelektronik und technische Optik

Photonik: Eine Einfuhrung in die integrierte Optoelektronik und technische Optik

Glass surface modification by lithography-free reactive ion etching in an Ar/CF4-plasma for controlled diffuse optical scattering

Evanescent-field fiber sensor for the water content in lubricating oils with sensitivity increase by dielectrophoresis

An improved shooting approach for solving the time-independent Schrödinger equation for III/V QW structures

Aktive Filter

Suchergebnisse filtern