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Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect

Optics express, 2010-09, Vol.18 (19), p.19485-19494

2010

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High performance diffraction gratings made by e-beam lithography

Applied physics. A, Materials science & processing, 2012-12, Vol.109 (4), p.789-796

2012

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Measuring the spatiotemporal electric field of tightly focused ultrashort pulses with sub-micron spatial resolution

Optics express, 2008-09, Vol.16 (18), p.13663

2008

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Beam homogenizers based on chirped microlens arrays

Optics express, 2007-05, Vol.15 (10), p.6218-6231

2007

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Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sources

Optics express, 2013-11, Vol.21 (23), p.27852-27864

2013

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High-resolution proximity lithography for nano-optical components

Microelectronic engineering, 2015-01, Vol.132, p.120-134

2015

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Ultrafast farfield simulation of non-paraxial computer generated holograms

Optics express, 2022-04, Vol.30 (8), p.13765-13775

2022

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Macroscopic wave-optical simulation of dielectric metasurfaces

Optics express, 2021-03, Vol.29 (7), p.10879-10892

2021

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Second harmonic generation under doubly resonant lattice plasmon excitation

Optics express, 2022-10, Vol.30 (22), p.40884-40896

2022

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Rowland ghost suppression in high efficiency spectrometer gratings fabricated by e-beam lithography

Optics express, 2017-03, Vol.25 (6), p.6182-6191

2017

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Design of computer-generated holograms based on semi-rigorous simulations of sub-wavelength structures

Optics express, 2023-03, Vol.31 (7), p.11089-11101

2023

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Structured illumination ptychography and at-wavelength characterization with an EUV diffuser at 13.5 nm wavelength

Optics express, 2024-01, Vol.32 (3), p.3480-3491

2024

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Diffuse scattering due to stochastic disturbances of 1D-gratings on the example of line edge roughness

Optics express, 2018-10, Vol.26 (21), p.28104-28118

2018

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Laser-lithography on non-planar surfaces

Optics express, 2007-02, Vol.15 (3), p.1167-1174

2007

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Laser lithographic fabrication and characterization of a spherical artificial compound eye

Optics express, 2007-03, Vol.15 (6), p.3067-3077

2007

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Switchable optics based on guided mode resonance in lithographically patterned vanadium dioxide with integrated heating layer

Journal of the European Optical Society. Rapid publications, 2023, Vol.19 (1), p.21

2023

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Photomask displacement technology for continuous profile generation by mask aligner lithography

Journal of optics (2010), 2016-12, Vol.18 (12), p.125401

2016

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Advanced mask aligner lithography: new illumination system

Optics express, 2010-09, Vol.18 (20), p.20968-20978

2010

Volltextzugriff (PDF)

Extending standard mask lithography exposure technique to spherical surfaces

Applied physics. B, Lasers and optics, 2014-06, Vol.115 (3), p.371-377

2014

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Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography

Optics express, 2015-06, Vol.23 (13), p.16628-16637

2015

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High numerical aperture hybrid optics for two-photon polymerization

Optics express, 2012-03, Vol.20 (7), p.7994-8005

2012

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Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings

Optical materials express, 2015-01, Vol.5 (1), p.124-129

2015

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Experimental Realization of Monolithic Diffractive Broad-Area Polymeric Waveguide Dye Lasers

IEEE journal of quantum electronics, 2007-07, Vol.43 (7), p.545-551

2007

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On-axis diffractive elements with improved signal quality in the presence of fabrication errors and wavelength tolerances

Journal of modern optics, 2005-10, Vol.52 (15), p.2051-2057

2005

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High-dispersion TIR-GRISMs with flattened angular dispersion profile

Optica, 2022-04, Vol.9 (4), p.412

2022

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Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect

High performance diffraction gratings made by e-beam lithography

Measuring the spatiotemporal electric field of tightly focused ultrashort pulses with sub-micron spatial resolution

Beam homogenizers based on chirped microlens arrays

Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sources

High-resolution proximity lithography for nano-optical components

Ultrafast farfield simulation of non-paraxial computer generated holograms

Macroscopic wave-optical simulation of dielectric metasurfaces

Second harmonic generation under doubly resonant lattice plasmon excitation

Rowland ghost suppression in high efficiency spectrometer gratings fabricated by e-beam lithography

Design of computer-generated holograms based on semi-rigorous simulations of sub-wavelength structures

Structured illumination ptychography and at-wavelength characterization with an EUV diffuser at 13.5 nm wavelength

Diffuse scattering due to stochastic disturbances of 1D-gratings on the example of line edge roughness

Laser-lithography on non-planar surfaces

Laser lithographic fabrication and characterization of a spherical artificial compound eye

Switchable optics based on guided mode resonance in lithographically patterned vanadium dioxide with integrated heating layer

Photomask displacement technology for continuous profile generation by mask aligner lithography

Advanced mask aligner lithography: new illumination system

Extending standard mask lithography exposure technique to spherical surfaces

Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography

High numerical aperture hybrid optics for two-photon polymerization

Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings

Experimental Realization of Monolithic Diffractive Broad-Area Polymeric Waveguide Dye Lasers

On-axis diffractive elements with improved signal quality in the presence of fabrication errors and wavelength tolerances

High-dispersion TIR-GRISMs with flattened angular dispersion profile

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