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Water‐Stable Chemical‐Protective Textiles via Euhedral Surface‐Oriented 2D Cu–TCPP Metal‐Organic Frameworks

Small (Weinheim an der Bergstrasse, Germany), 2019-03, Vol.15 (10), p.e1805133-n/a

2019

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Progress and future directions for atomic layer deposition and ALD-based chemistry

MRS bulletin, 2011-11, Vol.36 (11), p.865-871

2011

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Unexpectedly large remanent polarization of Hf0.5Zr0.5O2 metal–ferroelectric–metal capacitor fabricated without breaking vacuum

Applied physics letters, 2021-01, Vol.118 (1)

2021

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Investigation of the Corrosion Behavior of Atomic Layer Deposited Al₂O₃/TiO₂ Nanolaminate Thin Films on Copper in 0.1 M NaCl

Materials, 2019-02, Vol.12 (4), p.672

2019

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Density dependence of the room temperature thermal conductivity of atomic layer deposition-grown amorphous alumina (Al2O3)

Applied physics letters, 2014-06, Vol.104 (25)

2014

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Atomic Layer Deposition of Conductive Coatings on Cotton, Paper, and Synthetic Fibers: Conductivity Analysis and Functional Chemical Sensing Using "All-Fiber" Capacitors

Advanced functional materials, 2011-06, Vol.21 (11), p.1993-2002

2011

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Stabilizing Small Molecules on Metal Oxide Surfaces Using Atomic Layer Deposition

Nano letters, 2013-10, Vol.13 (10), p.4802-4809

2013

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An Advanced Dual‐Function MnO2‐Fabric Air Filter Combining Catalytic Oxidation of Formaldehyde and High‐Efficiency Fine Particulate Matter Removal

Advanced functional materials, 2020-10, Vol.30 (42), p.n/a

2020

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Temperature-dependent reaction between trimethylaluminum and poly(methyl methacrylate) during sequential vapor infiltration: experimental and ab initio analysis

Journal of materials chemistry. C, Materials for optical and electronic devices, 2014, Vol.2 (44), p.9416-9424

2014

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Thermal atomic layer etching of metallic tungsten via oxidation and etch reaction mechanism using O2 or O3 for oxidation and WCl6 as the chlorinating etchant

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2020-03, Vol.38 (2)

2020

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Understanding inherent substrate selectivity during atomic layer deposition: Effect of surface preparation, hydroxyl density, and metal oxide composition on nucleation mechanisms during tungsten ALD

The Journal of chemical physics, 2017-02, Vol.146 (5), p.052811-052811

2017

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Highly Breathable Chemically Protective MOF‐Fiber Catalysts

Advanced functional materials, 2022-02, Vol.32 (6), p.n/a

2022

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Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition

Applied physics letters, 2022-08, Vol.121 (8)

2022

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Many routes to ferroelectric HfO2: A review of current deposition methods

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2022-01, Vol.40 (1)

2022

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Low‐Temperature Dual‐Material Area‐Selective Deposition: Molybdenum Hexafluoride‐Mediated SiO2 Fluorination/Passivation for Self‐Aligned Molybdenum/Metal Oxide Nanoribbons

Advanced functional materials, 2024-08, Vol.34 (33), p.n/a

2024

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Reduced fatigue and leakage of ferroelectric TiN/Hf0.5Zr0.5O2/TiN capacitors by thin alumina interlayers at the top or bottom interface

Nanotechnology, 2023-03, Vol.34 (12)

2023

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Atomic layer deposition on polymer fibers and fabrics for multifunctional and electronic textiles

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2016-01, Vol.34 (1)

2016

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Control of ZIF‐62 and agZIF‐62 Film Thickness within Asymmetric Tubular Supports through Pressure and Dose Time Variation of Atomic Layer Deposition

Small (Weinheim an der Bergstrasse, Germany), 2024-07, Vol.20 (27), p.e2307202-n/a

2024

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Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2012-01, Vol.30 (1), p.010802-010802-11

2012

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Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition

Journal of applied physics, 2023-06, Vol.133 (22)

2023

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The influence of crystallographic texture on structural and electrical properties in ferroelectric Hf0.5Zr0.5O2

Journal of applied physics, 2022-12, Vol.132 (24)

2022

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Atomic Layer Deposition of TiO2 on Mesoporous nanolTO: Conductive Core-Shell Photoanodes for Dye-Sensitized Solar Cells

Nano letters, 2014-06, Vol.14 (6), p.3255-3261

2014

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Functional model for analysis of ALD nucleation and quantification of area-selective deposition

Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2019-03, Vol.37 (2)

Parsons, Gregory N.

2019

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Effect of Al2O3 ALD coating and vapor infusion on the bulk mechanical response of elastic and viscoelastic polymers

Surface & coatings technology, 2015-01, Vol.261, p.411-417

2015

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Solution-Processed, Antimony-Doped Tin Oxide Colloid Films Enable High-Performance TiO2 Photoanodes for Water Splitting

Nano letters, 2013-04, Vol.13 (4), p.1481-1488

2013

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Water‐Stable Chemical‐Protective Textiles via Euhedral Surface‐Oriented 2D Cu–TCPP Metal‐Organic Frameworks

Progress and future directions for atomic layer deposition and ALD-based chemistry

Unexpectedly large remanent polarization of Hf0.5Zr0.5O2 metal–ferroelectric–metal capacitor fabricated without breaking vacuum

Investigation of the Corrosion Behavior of Atomic Layer Deposited Al₂O₃/TiO₂ Nanolaminate Thin Films on Copper in 0.1 M NaCl

Density dependence of the room temperature thermal conductivity of atomic layer deposition-grown amorphous alumina (Al2O3)

Atomic Layer Deposition of Conductive Coatings on Cotton, Paper, and Synthetic Fibers: Conductivity Analysis and Functional Chemical Sensing Using "All-Fiber" Capacitors

Stabilizing Small Molecules on Metal Oxide Surfaces Using Atomic Layer Deposition

An Advanced Dual‐Function MnO2‐Fabric Air Filter Combining Catalytic Oxidation of Formaldehyde and High‐Efficiency Fine Particulate Matter Removal

Temperature-dependent reaction between trimethylaluminum and poly(methyl methacrylate) during sequential vapor infiltration: experimental and ab initio analysis

Thermal atomic layer etching of metallic tungsten via oxidation and etch reaction mechanism using O2 or O3 for oxidation and WCl6 as the chlorinating etchant

Understanding inherent substrate selectivity during atomic layer deposition: Effect of surface preparation, hydroxyl density, and metal oxide composition on nucleation mechanisms during tungsten ALD

Highly Breathable Chemically Protective MOF‐Fiber Catalysts

Mechanisms for undesired nucleation on H-terminated Si and dimethylamino-trimethylsilane passivated SiO2 during TiO2 area-selective atomic layer deposition

Many routes to ferroelectric HfO2: A review of current deposition methods

Low‐Temperature Dual‐Material Area‐Selective Deposition: Molybdenum Hexafluoride‐Mediated SiO2 Fluorination/Passivation for Self‐Aligned Molybdenum/Metal Oxide Nanoribbons

Reduced fatigue and leakage of ferroelectric TiN/Hf0.5Zr0.5O2/TiN capacitors by thin alumina interlayers at the top or bottom interface

Atomic layer deposition on polymer fibers and fabrics for multifunctional and electronic textiles

Control of ZIF‐62 and agZIF‐62 Film Thickness within Asymmetric Tubular Supports through Pressure and Dose Time Variation of Atomic Layer Deposition

Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition

Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition

The influence of crystallographic texture on structural and electrical properties in ferroelectric Hf0.5Zr0.5O2

Atomic Layer Deposition of TiO2 on Mesoporous nanolTO: Conductive Core-Shell Photoanodes for Dye-Sensitized Solar Cells

Functional model for analysis of ALD nucleation and quantification of area-selective deposition

Effect of Al2O3 ALD coating and vapor infusion on the bulk mechanical response of elastic and viscoelastic polymers

Solution-Processed, Antimony-Doped Tin Oxide Colloid Films Enable High-Performance TiO2 Photoanodes for Water Splitting

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