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Atomic layer-controlled growth of transparent conducting ZnO on plastic substrates

Materials chemistry and physics, 1999-03, Vol.58 (2), p.132-138

1999

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Surface Chemistry for Atomic Layer Growth

Journal of physical chemistry (1952), 1996-08, Vol.100 (31), p.13121-13131

1996

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Atomic layer controlled growth of Si3N4 films using sequential surface reactions

Surface science, 1998-11, Vol.418 (1), p.L14-L19

1998

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Atomic layer controlled growth of SiO2 films using binary reaction sequence chemistry

Applied physics letters, 1997-03, Vol.70 (9), p.1092-1094

1997

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Atomic layer growth of SiO2 on Si(100) using SiCl4 and H2O in a binary reaction sequence

Surface science, 1995-07, Vol.334 (1-3), p.135-152

1995

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Modification of Porous Alumina Membranes Using Al2O3 Atomic Layer Controlled Deposition

Chemistry of materials, 1997-03, Vol.9 (3), p.707-714

1997

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In Situ Monitoring of Atomic Layer Controlled Pore Reduction in Alumina Tubular Membranes Using Sequential Surface Reactions

Chemistry of materials, 1998-12, Vol.10 (12), p.3941-3950

1998

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Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry

Thin solid films, 1997-01, Vol.292 (1-2), p.135-144

1997

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Atomic layer controlled deposition of SiO2 and Al2O3 using ABAB... binary reaction sequence chemistry

Applied surface science, 1994-12, Vol.82-83 (1-4), p.460-467

1994

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Atomic layer controlled deposition of Al2O3 films using binary reaction sequence chemistry

Applied surface science, 1996-11, Vol.107 (1-4), p.128-136

1996

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Electromagnetic compatibility engineering

Ott, Henry W

Expanded 3rd Edition, 2009

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Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence

Surface science, 1995-01, Vol.322 (1-3), p.230-242

1995

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Plasma-Assisted MOCVD Growth of Superconducting NbN Thin Films Using Nb Dialkylamide and Nb Alkylimide Precursors

Chemical vapor deposition, 2001-01, Vol.7 (1), p.25-28

2001

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Adsorption and decomposition of 1,4-disilabutane (SiH 3CH 2CH 2SiH 3) on Si(100) 2×1 and porous silicon surfaces

Surface science, 1998-12, Vol.418 (2), p.353-366

1998

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Adsorption and decomposition of 1,4-disilabutane (SiH3CH2CH2SiH3) on Si(100) 2x 1 and porous silicon surfaces

Surface science, 1998, Vol.418 (2), p.353-366

1998

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Surface chemistry of In2O3 deposition using In(CH3)3 and H2O in a binary reaction sequence

Applied surface science, 1997-03, Vol.112, p.205-215

1997

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Modification of Porous Alumina Membranes Using Al 2 O 3 Atomic Layer Controlled Deposition

Chemistry of materials, 1997-03, Vol.9 (3), p.707-714

1997

Volltextzugriff (PDF)

Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence

Surface science, 1995, Vol.322 (1-3), p.230-242

1995

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Surface chemistry of Al sub(2)O sub(3) deposition using Al(CH sub(3)) sub(3) and H sub(2)O in a binary reaction sequence

Surface science, 1995-01, Vol.322 (1-3), p.230-242

1995

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Assessment of indoor fine aerosol contributions from environmental tobacco smoke and cooking with a portable nephelometer

Journal of Exposure Analysis and Environmental Epidemiology, 2000-03, Vol.10 (2), p.136-144

2000

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Atomic Layer Controlled Deposition of Al 2 O 3 Films Employing Trimethylaluminum (TMA) and H 2 O Vapor

MRS proceedings, 1993, Vol.335, Article 335

1993

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Atomic Layer Controlled Deposition of Al2O3 Films Employing Trimethylaluminum (TMA) and H2O Vapor

MRS proceedings, 1993, Vol.335

1993

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A new process for extracting gold from auriferous ores, and particularly applicable with great advantage to pyrites and other ores containing gold in small quantities

Journal of the Franklin Institute, 1865, Vol.80 (1), p.24-28

1865

Volltextzugriff (PDF)

APPENDIX F: Answers to Problems

Electromagnetic Compatibility Engineering, 2011, p.790-824

Ott, Henry W

2011

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APPENDIX C: Multiple Reflections of Magnetic Fields in Thin Shields

Electromagnetic Compatibility Engineering, 2011, p.743-745

Ott, Henry W

2011

Volltextzugriff (PDF)

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Atomic layer-controlled growth of transparent conducting ZnO on plastic substrates

Surface Chemistry for Atomic Layer Growth

Atomic layer controlled growth of Si3N4 films using sequential surface reactions

Atomic layer controlled growth of SiO2 films using binary reaction sequence chemistry

Atomic layer growth of SiO2 on Si(100) using SiCl4 and H2O in a binary reaction sequence

Modification of Porous Alumina Membranes Using Al2O3 Atomic Layer Controlled Deposition

In Situ Monitoring of Atomic Layer Controlled Pore Reduction in Alumina Tubular Membranes Using Sequential Surface Reactions

Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry

Atomic layer controlled deposition of SiO2 and Al2O3 using ABAB... binary reaction sequence chemistry

Atomic layer controlled deposition of Al2O3 films using binary reaction sequence chemistry

Electromagnetic compatibility engineering

Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence

Plasma-Assisted MOCVD Growth of Superconducting NbN Thin Films Using Nb Dialkylamide and Nb Alkylimide Precursors

Adsorption and decomposition of 1,4-disilabutane (SiH 3CH 2CH 2SiH 3) on Si(100) 2×1 and porous silicon surfaces

Adsorption and decomposition of 1,4-disilabutane (SiH3CH2CH2SiH3) on Si(100) 2x 1 and porous silicon surfaces

Surface chemistry of In2O3 deposition using In(CH3)3 and H2O in a binary reaction sequence

Modification of Porous Alumina Membranes Using Al 2 O 3 Atomic Layer Controlled Deposition

Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence

Surface chemistry of Al sub(2)O sub(3) deposition using Al(CH sub(3)) sub(3) and H sub(2)O in a binary reaction sequence

Assessment of indoor fine aerosol contributions from environmental tobacco smoke and cooking with a portable nephelometer

Atomic Layer Controlled Deposition of Al 2 O 3 Films Employing Trimethylaluminum (TMA) and H 2 O Vapor

Atomic Layer Controlled Deposition of Al2O3 Films Employing Trimethylaluminum (TMA) and H2O Vapor

A new process for extracting gold from auriferous ores, and particularly applicable with great advantage to pyrites and other ores containing gold in small quantities

APPENDIX F: Answers to Problems

APPENDIX C: Multiple Reflections of Magnetic Fields in Thin Shields

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