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Cleaning mechanisms during post chemical mechanical polishing (CMP) using particle removal of surfactants via a citric acid-based solution

Colloids and surfaces. A, Physicochemical and engineering aspects, 2024-09, Vol.697, p.134428, Article 134428

2024

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Nanosecond laser irradiation assisted chemical mechanical polishing (CMP) process for promoting material removal of single crystal 4H–SiC

Ceramics international, 2024-06

2024

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CMP characteristics of IGZO thin film with a variety of process parameters

Japanese Journal of Applied Physics, 2024-06, Vol.63 (6), p.6

2024

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DSH to Extend-DSH: Chip-level Chemical Mechanical Planarization (CMP) Model Upgrade Based on Decoupling Regression Strategy

IEEE transactions on semiconductor manufacturing, 2024-06, p.1-1

2024

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IEEE_Xplore

Un espace d’accueil au sein d’un CMP : un lieu entre l’intime, le familial et l’institutionnel

Neuropsychiatrie de l'enfance et de l'adolescence, 2024-06

2024

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Processable CMP aerogel with Ag nanocatalysts for the treatment of combined pollutant containing p-NP&MO in continuous flow

Desalination and water treatment, 2024-07, Vol.319, p.100475, Article 100475

2024

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Construction of hollow CMPs microspheres based on the kinetic quantum sieving effect for highly efficient adsorption of Iodide/Cesium ions

Separation and purification technology, 2025-01, Vol.353, p.128561, Article 128561

2025

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New High Resolution Method to Characterize CMP Slurry Particle Size Distributions

2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 2024, p.1-6

2024

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IEEE_Xplore

A review on the development of ceria for chemical mechanical polishing

Powder technology, 2024-08, Vol.444, p.119989, Article 119989

2024

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Role of alumina particles in chemical-mechanical synergies in ruthenium polishing

Journal of materials processing technology, 2024-09, Vol.330, p.118477, Article 118477

2024

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Seismic data extrapolation based on multi-scale dynamic time warping

Petroleum science, 2024-06

2024

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Low-Temperature Nanocrystalline Cu/polymer Hybrid Bonding with Tailored CMP Process

2024 IEEE 74th Electronic Components and Technology Conference (ECTC), 2024, p.1863-1867

2024

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IEEE_Xplore

Evaluation of a medically coordinated care program in the management of autism

Encéphale, 2024-07

2024

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A CMP Process for Hybrid Bonding Application with Conventional / nt-Cu and SixNy / SixOy Dielectrics

2024 IEEE 74th Electronic Components and Technology Conference (ECTC), 2024, p.2058-2061

2024

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IEEE_Xplore

Atomistic Removal Mechanisms of SiC in Hydrogen Peroxide Solution

Micromachines (Basel), 2024-06, Vol.15 (6), p.754

2024

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The Patterned Photosensitive Dielectric Organic Material/Cu Simultaneous Novel CMP Process for Fine Damascene RDL Based on Process Design Assisted by Deep Learning

2024 IEEE 74th Electronic Components and Technology Conference (ECTC), 2024, p.1347-1353

2024

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IEEE_Xplore

Electrochemical Innovations for Sustainable Copper Management in Semiconductor Wastewater

2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 2024, p.1-5

2024

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IEEE_Xplore

In-house Test Wafer Reclaim for Fab Cost and Wastage Reduction: MS: Manufacturing for Sustainability

2024 35th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 2024, p.1-7

2024

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IEEE_Xplore

Effect of abrasive particle size and oxidant concentration on CdZnTe crystal properties during CMP process

Materials science in semiconductor processing, Article 108667

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CMP Investors Have Opportunity to Lead Compass Minerals International, Inc. Securities Fraud Lawsuit with the Schall Law Firm

Business Wire, 2024

2024

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Compass Minerals International, Inc. Sued for Securities Law Violations - Contact the DJS Law Group to Discuss Your Rights - CMP

Business Wire, 2024

2024

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Shareholders of Compass Minerals International, Inc. Should Contact Levi Korsinsky Before June 24, 2024 to Discuss Your Rights - CMP

PR Newswire, 2024

2024

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CMP Investors Have Opportunity to Join Compass Minerals International, Inc. Securities Fraud Investigation with the Schall Law Firm

Business Wire, 2024

2024

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CMP Investors Have Opportunity to Lead Compass Minerals International, Inc. Securities Fraud Lawsuit Filed by Rosen Law Firm

PR Newswire, 2024

2024

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Compass Minerals International, Inc. Sued for Securities Law Violations - Investors Should Contact The Gross Law Firm Before June 24, 2024 to Discuss Your Rights - CMP

PR Newswire, 2024

2024

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Cleaning mechanisms during post chemical mechanical polishing (CMP) using particle removal of surfactants via a citric acid-based solution

Nanosecond laser irradiation assisted chemical mechanical polishing (CMP) process for promoting material removal of single crystal 4H–SiC

CMP characteristics of IGZO thin film with a variety of process parameters

DSH to Extend-DSH: Chip-level Chemical Mechanical Planarization (CMP) Model Upgrade Based on Decoupling Regression Strategy

Un espace d’accueil au sein d’un CMP : un lieu entre l’intime, le familial et l’institutionnel

Processable CMP aerogel with Ag nanocatalysts for the treatment of combined pollutant containing p-NP&MO in continuous flow

Construction of hollow CMPs microspheres based on the kinetic quantum sieving effect for highly efficient adsorption of Iodide/Cesium ions

New High Resolution Method to Characterize CMP Slurry Particle Size Distributions

A review on the development of ceria for chemical mechanical polishing

Role of alumina particles in chemical-mechanical synergies in ruthenium polishing

Seismic data extrapolation based on multi-scale dynamic time warping

Low-Temperature Nanocrystalline Cu/polymer Hybrid Bonding with Tailored CMP Process

Evaluation of a medically coordinated care program in the management of autism

A CMP Process for Hybrid Bonding Application with Conventional / nt-Cu and SixNy / SixOy Dielectrics

Atomistic Removal Mechanisms of SiC in Hydrogen Peroxide Solution

The Patterned Photosensitive Dielectric Organic Material/Cu Simultaneous Novel CMP Process for Fine Damascene RDL Based on Process Design Assisted by Deep Learning

Electrochemical Innovations for Sustainable Copper Management in Semiconductor Wastewater

In-house Test Wafer Reclaim for Fab Cost and Wastage Reduction: MS: Manufacturing for Sustainability

Effect of abrasive particle size and oxidant concentration on CdZnTe crystal properties during CMP process

CMP Investors Have Opportunity to Lead Compass Minerals International, Inc. Securities Fraud Lawsuit with the Schall Law Firm

Compass Minerals International, Inc. Sued for Securities Law Violations - Contact the DJS Law Group to Discuss Your Rights - CMP

Shareholders of Compass Minerals International, Inc. Should Contact Levi Korsinsky Before June 24, 2024 to Discuss Your Rights - CMP

CMP Investors Have Opportunity to Join Compass Minerals International, Inc. Securities Fraud Investigation with the Schall Law Firm

CMP Investors Have Opportunity to Lead Compass Minerals International, Inc. Securities Fraud Lawsuit Filed by Rosen Law Firm

Compass Minerals International, Inc. Sued for Securities Law Violations - Investors Should Contact The Gross Law Firm Before June 24, 2024 to Discuss Your Rights - CMP

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