Details

Autor(en) / Beteiligte

• He, Gang
• Sun, Zhaoqi

Titel

High-K Gate Dielectrics for CMOS Technology

Auflage

1

Ort / Verlag

Newark: John Wiley & Sons, Incorporated

Erscheinungsjahr

2012

Link zum Volltext

Quelle

Wiley Online Library All Obooks

Beschreibungen/Notizen

• A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.