Details

Autor(en) / Beteiligte

• Nolde, J. A.
• Jackson, E. M.
• Bennett, M. F.
• Affouda, C. A.
• Cleveland, E. R.
• Canedy, C. L.
• Vurgaftman, I.
• Jernigan, G. G.
• Meyer, J. R.
• Aifer, E. H.

Titel

Reticulated shallow etch mesa isolation for controlling surface leakage in GaSb-based infrared detectors

Ist Teil von

• Applied physics letters, 2017-07, Vol.111 (5)

Ort / Verlag

Melville: American Institute of Physics

Erscheinungsjahr

2017

Quelle

AIP Journals Complete

Beschreibungen/Notizen

• Longwave infrared detectors using p-type absorbers composed of InAs-rich type-II superlattices (T2SLs) nearly always suffer from high surface currents due to carrier inversion on the etched sidewalls. Here, we demonstrate reticulated shallow etch mesa isolation (RSEMI): a structural method of reducing surface currents in longwave single-band and midwave/longwave dual-band detectors with p-type T2SL absorbers. By introducing a lateral shoulder to increase the separation between the n+ cathode and the inverted absorber surface, a substantial barrier to surface electron flow is formed. We demonstrate experimentally that the RSEMI process results in lower surface current, lower net dark current, much weaker dependence of the current on bias, and higher uniformity compared to mesas processed with a single deep etch. For the structure used, a shoulder width of 2 μm is sufficient to block surface currents.