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Details

Autor(en) / Beteiligte
Titel
Synthesis of pentameric chlorotin carboxylate clusters for high resolution EUV photoresists under small doses
Ist Teil von
  • Nanoscale advances, 2024-05, Vol.6 (11), p.2928-2944
Ort / Verlag
England: RSC
Erscheinungsjahr
2024
Quelle
EZB Free E-Journals
Beschreibungen/Notizen
  • This work reports the synthesis and characterization of a novel pentameric tin chloro cluster, (vinylSn) 3 Sn 2 Cl 5 O 2 (OH) 2 ( t -BuCO 2 ) 6 ( 1 ), and explores its application as an efficient negative-tone photoresist in a 1 : 2 weight ratio blend with [( n -BuSn) 12 O 14 (OH) 6 ](BF 4 ) 2 ( 2 ). Through e-beam lithography, a small high-resolution pattern (HP = 20 nm) is achieved for the blend photoresist ( 3 ) at a dose of 2080 μC cm −2 . Additionally, EUV lithography demonstrates the development of a high-resolution pattern (HP = 16 nm) at an EUV dose of 70 mJ cm −2 . Mechanistic studies by reflective FTIR indicate a significant decomposition of Sn-carbon and SnO 2 ( t -Bu) moieties starting at J = 35 mJ cm −2 , which is accompanied by growth of the Sn-O absorption intensity. A collapse of the cluster frameworks of clusters ( 1 ) and ( 2 ) is observed at J > 70 mJ cm −2 . High-resolution X-ray photoelectron spectroscopy (HRXPS) reveals that low EUV light predominantly decomposes Sn-butyl and Sn-Cl bonds. As EUV doses increase, primary photolytic reactions involve cleavage of Sn-butyl, Sn-O 2 CBu t , and Sn-vinyl bonds. Notably, the photolytic decomposition of Sn-Cl bonds is distinctive, with only two out of five bonds being cleaved, even at high EUV doses, resulting in a break in film growth at J = 27-35 mJ cm −2 in the EUV contrast curve. Moreover, HRXPS analysis suggests that radical propagation on the vinyltin end of the blend is unlikely, providing concise mechanistic insights into the photochemical processes governing the behavior of this advanced photoresist. This work reports the synthesis and characterization of a novel pentameric tin chloro cluster, (vinylSn) 3 Sn 2 Cl 5 O 2 (OH) 2 ( t -BuCO 2 ) 6 ( 1 ), and explores its application as an efficient negative-tone photoresist in a 1 : 2 weight ratio blend with [( n -BuSn) 12 O 14 (OH) 6 ](BF 4 ) 2 ( 2 ).
Sprache
Englisch
Identifikatoren
ISSN: 2516-0230
eISSN: 2516-0230
DOI: 10.1039/d4na00006d
Titel-ID: cdi_rsc_primary_d4na00006d
Format
Schlagworte
Chemistry

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