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Monotonous alloying-driven band edge emission in two-dimensional hexagonal GaSeTe semiconductors for visible to near-infrared photodetection
Ist Teil von
Journal of materials chemistry. C, Materials for optical and electronic devices, 2023-02, Vol.11 (5), p.1772-1781
Erscheinungsjahr
2023
Quelle
Alma/SFX Local Collection
Beschreibungen/Notizen
This work reports molecular beam epitaxy (MBE) of two-dimensional (2D) GaSe
1−
x
Te
x
ternary alloys that have recently attracted a lot of interest in physics for prospective electronics and optoelectronics even though they face crucial challenges in their epitaxial technology. Disregarding a distinction in crystal phase symmetry of two end-terminals,
i.e.
, hexagonal-GaSe (h-GaSe) and monoclinic-GaTe (m-GaTe), the majority of hexagonal-GaSe
1−
x
Te
x
(h-GaSe
1−
x
Te
x
) phase on a GaN/sapphire platform is guaranteed under our specific growth conditions without a visible sign of phase transition. We have also proposed extracting the Te composition of the ternary alloy
via
the experimental in-plane lattice constant, which is consistent with those indicated from energy dispersion X-ray data. Fascinatingly, the experimental and predictable band emission
versus
Te content displays a continuous redshift from 1.78 eV (h-GaSe) to 1.25 eV (h-GaSe
0.4
Te
0.6
) then a reversible blueshift to 1.46 eV (h-GaTe). Importantly, benefiting from the presence of Te incorporated atoms, the photoresponse performance of the hexagonal ternary alloy has greatly enhanced in comparison to the h-GaSe binary in terms of photocurrent density (up to 1250 nA cm
−2
for h-GaSe
0.65
Te
0.35
at only 300 mV bias). Overall, the results pave a way for phase/physical engineering of the alloys through the MBE process and realizing self-powered wafer-scale photodetectors based on 2D Ga-based monochalcogenide epitaxial thin films.
This work reports molecular beam epitaxy of two-dimensional GaSe
1−
x
Te
x
ternary alloys that have recently attracted a lot of interest in physics and material sciences even though facing crucial challenges in their epitaxial technology.
Sprache
–
Identifikatoren
ISSN: 2050-7526
eISSN: 2050-7534
DOI: 10.1039/d2tc04252e
Titel-ID: cdi_rsc_primary_d2tc04252e
Format
–
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