Thin solid films, 2010-11, Vol.519 (2), p.818-822
2010
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Details
- Autor(en) / Beteiligte
- Titel
- Forming wrinkled stiff films on polymeric substrates at room temperature for stretchable interconnects applications
- Ist Teil von
- Thin solid films, 2010-11, Vol.519 (2), p.818-822
- Ort / Verlag
- Amsterdam: Elsevier B.V
- Erscheinungsjahr
- 2010
- Quelle
- Access via ScienceDirect (Elsevier)
- Beschreibungen/Notizen
- Periodically wrinkled stiff thin films on elastomeric substrates have been found extensive applications, such as in stretchable electronics. This paper presents a cost-effective and simple method to form wrinkled stiff SiO x thin films on polydimethylsiloxane (PDMS) substrates at room temperature by ultraviolet/ozone (UV/O) radiation on pre-strained PDMS. Systemic studies have been conducted to understand the dependence of the wavy profile on the PDMS pre-strain, UV/O exposure time, and PDMS modulus. The mechanics analysis has been verified to be quantitatively or qualitatively accurate by experimental comparisons. The wrinkled SiO x /PDMS system is stretchable and provides a wavy mold for stretchable electrodes. The constant electrical resistance during mechanical stretching shows the stretchability of this system.
- Sprache
- Englisch
- Identifikatoren
- ISSN: 0040-6090eISSN: 1879-2731DOI: 10.1016/j.tsf.2010.08.106Titel-ID: cdi_proquest_miscellaneous_831210288
- Format
- –
- Schlagworte
- Applied sciences, Condensed matter: structure, mechanical and thermal properties, Electrical resistance, Electrodes, Electronics, Exact sciences and technology, Materials, Molds, Other nonelectronic physical properties, Physical properties of thin films, nonelectronic, Physics, Polydimethylsiloxane, Silicon dioxide, Silicone resins, Stretchable electronics, Stretching, Surfaces and interfaces, thin films and whiskers (structure and nonelectronic properties), Thin films, Thins films, Wrinkle