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Deep UV Photochemistry of Chemisorbed Monolayers: Patterned Coplanar Molecular Assemblies
Ist Teil von
Science (American Association for the Advancement of Science), 1991-04, Vol.252 (5005), p.551-554
Ort / Verlag
Washington, DC: American Society for the Advancement of Science
Erscheinungsjahr
1991
Link zum Volltext
Quelle
MEDLINE
Beschreibungen/Notizen
Deep ultraviolet (UV) irradiation is shown to modify organosilane self-assembled monolayer (SAM) films by a photocleavage mechanism, which renders the surface amenable to further SAM modification. Patterned UV exposure creates alternating regions of intact SAM film and hydrophilic, reactive sites. The exposed regions can undergo a second chemisorption reaction to produce an assembly of SAMs in the same molecular plane with similar substrate attachment chemistry. The UV-patterned films are used as a template for selective buildup of fluorophores, metals, and biological cells.