Microelectronic engineering, 2010-10, Vol.87 (10), p.1901-1906
2010
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Details
- Autor(en) / Beteiligte
- Titel
- Electrodepositing amorphous Ni-W alloys for MEMS
- Ist Teil von
- Microelectronic engineering, 2010-10, Vol.87 (10), p.1901-1906
- Ort / Verlag
- Amsterdam: Elsevier B.V
- Erscheinungsjahr
- 2010
- Quelle
- Alma/SFX Local Collection
- Beschreibungen/Notizen
- The wearing resistance and corrosion resistance of Ni-W alloy films is more excellent than that of Ni film. As a contrast, wearing resistance and corrosion resistance of Ni and NiW films are investigated in this paper. The results show that electrodeposited amorphous Ni-W alloy films have good wearing resistance and excellent corrosion resistance compared with electrodeposited Ni films. Moreover, the Ni-W alloy films still had good properties after heat treatment. The good wearing resistance and corrosion resistance of amorphous Ni-W alloy films are associated with crystal structure. The micro-spinneret is fabricated successfully with amorphous Ni-W alloys by UV-LIGA technology.
- Sprache
- Englisch
- Identifikatoren
- ISSN: 0167-9317eISSN: 1873-5568DOI: 10.1016/j.mee.2009.11.018Titel-ID: cdi_proquest_miscellaneous_753683237
- Format
- –
- Schlagworte
- Alloys, amorphous, Applied sciences, Condensed matter: structure, mechanical and thermal properties, Corrosion, Corrosion prevention, Corrosion resistance, Cross-disciplinary physics: materials science, rheology, Crystal structure, Electrodeposition, electroplating, Electronics, Exact sciences and technology, Heat treatment, Materials science, MEMS, Metals. Metallurgy, Methods of deposition of films and coatings, film growth and epitaxy, Micro- and nanoelectromechanical devices (mems/nems), Microelectromechanical systems, Microelectronics, Ni-W, Nickel, Nickel base alloys, Physics, Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices, Structure of solids and liquids, crystallography, Structure of specific crystalline solids, wearing resistance