Cai liao bao hu, 2010-04, Vol.43 (4), p.29-32
2010
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Details
- Autor(en) / Beteiligte
- Titel
- Current Status of Research and Development of Trivalent Chromium Plating
- Ist Teil von
- Cai liao bao hu, 2010-04, Vol.43 (4), p.29-32
- Erscheinungsjahr
- 2010
- Quelle
- Alma/SFX Local Collection
- Beschreibungen/Notizen
- A review was provided of the history, electroplating technology, cathodic reaction mechanism and existing problems in trivalent chromium electroplating. The existing problems were analyzed and discussed in the light of selection of electroplating system, complexing agent, anode and power source as well as the influence of pH value. Finally, the development of trivalent chromium electroplating was prospected.
- Sprache
- Chinesisch
- Identifikatoren
- ISSN: 1001-1560Titel-ID: cdi_proquest_miscellaneous_753640703
- Format
- –
- Schlagworte
- Anodes, Electroplating, Materials selection, pH, Power sources, Reaction mechanisms, Research and development, Trivalent chromium